Abstract: A scanning system uses a multi-beam brush having a widely separated beams, a modulator that controls intensity of pixels in scan beams, an optical system that minimizes scan line bow at the expense of non-uniform scanning beam velocity, and a timing generator that generates a pixel clock signal having a variable period that compensates for the non-uniformity of pixel velocity. The wide separation of scan beams permits the modulator to turn beams on or off with a direction of brightening or darkening in the cross-section of the beams being opposite to the scanning direction. A novel arrangement of the beams in the brush permits a uniform indexing step size to uniformly expose an image region.

Abstract: An apparatus for etching a metal-containing material of a lithographic mask has a chamber with a support for supporting the mask inside the chamber. Over the metal-containing material, the mask comprises a resist layer having features with sidewalls. A gas distributor, gas energizer, and gas exhaust are provided. A controller is provided that is adapted to control one or more of the gas distributor, gas energizer, and gas exhaust to (i) deposit a sacrificial coating on the sidewalls of the features in the resist layer, and (ii) etch the metal-containing material of the mask. Coincidental etching of the sidewalls of the features in the resist layer overlying the metal-containing material is reduced by the sacrificial coating formed thereon.

Abstract: A scanning system uses a multi-beam brush having a widely separated beams, a modulator that controls intensity of pixels in scan beams, an optical system that minimizes scan line bow at the expense of non-uniform scanning beam velocity, and a timing generator that generates a pixel clock signal having a variable period that compensates for the non-uniformity of pixel velocity. The wide separation of scan beams permits the modulator to turn beams on or off with a direction of brightening or darkening in the cross-section of the beams being opposite to the scanning direction. A novel arrangement of the beams in the brush permits a uniform indexing step size to uniformly expose an image region.

Abstract: A scanning system uses a multi-beam brush having a widely separated beams, a modulator that controls intensity of pixels in scan beams, an optical system that minimizes scan line bow at the expense of non-uniform scanning beam velocity, and a timing generator that generates a pixel clock signal having a variable period that compensates for the non-uniformity of pixel velocity. The wide separation of scan beams permits the modulator to turn beams on or off with a direction of brightening or darkening in the cross-section of the beams being opposite to the scanning direction. A novel arrangement of the beams in the brush permits a uniform indexing step size to uniformly expose an image region.