Abstract: Integrated glass ceramic spacecraft include a plurality of glass ceramic components including molded, tempered, annealed, and patterned glass ceramic components coupled together for forming a support structure or frame or housing through which is communicated optical signals through an optical communications grid and electrical signals through an electrical communications grid, with the optical communications grid and electrical communication grid forming a composite electrooptical communications grid for spacecraft wide intercommunications. The support structure multifunctions as a frame, a housing, a support, a thermal control system, and as part of an electrooptical communications grid while encapsulating a plurality of optical, electronic, electrical, and MEMS devices between which is communicated the electrical and optical signals over the electrooptical communication grid.

Abstract: An inflatable structure includes a plurality of inflation cells each have a respective internal gas generator connected to an external control processor for sequential inflation of the inflatable structure. Power and control lines feed through the inflation cells for powering the internal gas generator and for communicating control signals between the gas generators and the external control processor. A method of sequence inflation can use various types of exemplar gas generators, such as cellular containment evaporation gas generators and laser ablation gas generators.

Abstract: An inflatable structure includes a plurality of inflation cells each have a respective internal gas generator connected to an external control processor for sequential inflation of the inflatable structure. Power and control lines feed through the inflation cells for powering the internal gas generator and for communicating control signals between the gas generators and the external control processor. A method of sequence inflation can use various types of exemplar gas generators, such as cellular containment evaporation gas generators and laser ablation gas generators.

Abstract: The direct-write pulsed UV laser technique combined with the variable laser exposure fabrication method entails the precise variation of the laser irradiance during pattern formation in the photostructurable glass for variable laser exposing processing. The variable laser exposure patterning utilizes the dependence of the chemical etching rate on the controlled laser exposure dose for forming variable laser irradiated and crystallized regions of the exposed glass, that have variable etch rates that are dependent on the laser irradiance, resulting in the formation of high and low aspect ratio features in a common substrate that are realized during a single, maskless etch step.

Abstract: The direct-write pulsed UV laser technique combined with the variable laser exposure fabrication method entails the precise variation of the laser irradiance during pattern formation in the photostructurable glass for variable laser exposing processing. The variable laser exposure patterning utilizes the dependence of the chemical etching rate on the controlled laser exposure dose for forming variable laser irradiated and crystallized regions of the exposed glass, that have variable etch rates that are dependent on the laser irradiance, resulting in the formation of high and low aspect ratio features in a common substrate that are realized during a single, maskless etch step.

Abstract: An inflatable structure includes a plurality of inflation cells each have a respective internal gas generator connected to an external control processor for sequential inflation of the inflatable structure. Power and control lines feed through the inflation cells for powering the internal gas generator and for communicating control signals between the gas generators and the external control processor. A method of sequence inflation can use various types of exemplar gas generators, such as cellular containment evaporation gas generators and laser ablation gas generators.

Abstract: A laser direct write method creates true three dimensional structures within photocerams using an focused pulsed ultraviolet laser with a wavelength in a weakly absorbing region of the photoceram material. A critical dose of focused laser UV light selectively exposes embedded volumes of the material for subsequent selective etching. The photoceram material exposure is nonlinear with the laser fluence and the critical dose depends on the square of the per shot fluence and the number of pulses. The laser light is focused to a focal depth for selective volumetric exposure of the material within a focal volume within the remaining collateral volumes that is critically dosed for selecting etching and batch fabrication of highly defined embedded structures.