Patents by Inventor Henry I. Smith

Henry I. Smith has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10046550
    Abstract: A system and method for creating three-dimensional nanostructures is disclosed. The system includes a substrate bonded to a carrier using a bonding agent. The bonding agent may be vaporizable or sublimable. The carrier may be a glass or glass-like substance. In some embodiments, the carrier may be permeable having one or a plurality of pores through which the bonding agent may escape when converted to a gaseous state with heat, pressure, light or other methods. A substrate is bonded to the carrier using the bonding agent. The substrate is then processed to form a membrane. This processing may include grinding, polishing, etching, patterning, or other steps. The processed membrane is then aligned and affixed to a receiving substrate, or a previously deposited membrane. Once properly attached, the bonding agent is then heated, depressurized or otherwise caused to sublimate or vaporize, thereby releasing the processed membrane from the carrier.
    Type: Grant
    Filed: May 23, 2016
    Date of Patent: August 14, 2018
    Assignee: Massachusetts Institute of Technology
    Inventors: Henry I. Smith, Corey P. Fucetola, Katherine A. Mirica, Jay J. Fucetola, Dakota S. Freeman
  • Publication number: 20160263882
    Abstract: A system and method for creating three-dimensional nanostructures is disclosed. The system includes a substrate bonded to a carrier using a bonding agent. The bonding agent may be vaporizable or sublimable. The carrier may be a glass or glass-like substance. In some embodiments, the carrier may be permeable having one or a plurality of pores through which the bonding agent may escape when converted to a gaseous state with heat, pressure, light or other methods. A substrate is bonded to the carrier using the bonding agent. The substrate is then processed to form a membrane. This processing may include grinding, polishing, etching, patterning, or other steps. The processed membrane is then aligned and affixed to a receiving substrate, or a previously deposited membrane. Once properly attached, the bonding agent is then heated, depressurized or otherwise caused to sublimate or vaporize, thereby releasing the processed membrane from the carrier.
    Type: Application
    Filed: May 23, 2016
    Publication date: September 15, 2016
    Inventors: Henry I. Smith, Corey P. Fucetola, Katherine A. Mirica, Jay J. Fucetola, Dakota S. Freeman
  • Patent number: 8143601
    Abstract: An imaging system is provided. The imaging system includes a sample to be scanned by the imaging system. An absorbance modulation layer (AML) is positioned in close proximity to the sample and is physically separate from the sample. One or more sub-wavelength apertures are generated within the AML, whose size is determined by the material properties of the AML and the intensities of the illuminating wavelengths. A light source transmits an optical signal through the one or more sub-wavelength apertures generating optical near-fields that are collected for imaging.
    Type: Grant
    Filed: August 6, 2008
    Date of Patent: March 27, 2012
    Assignee: Massachusetts Institute of Technology
    Inventors: Rajesh Menon, Henry I. Smith
  • Patent number: 8121162
    Abstract: A structure including a grating and a semiconductor nanocrystal layer on the grating, can be a laser. The semiconductor nanocrystal layer can include a plurality of semiconductor nanocrystals including a Group II-VI compound, the nanocrystals being distributed in a metal oxide matrix. The grating can have a periodicity from 200 nm to 500 nm.
    Type: Grant
    Filed: November 21, 2008
    Date of Patent: February 21, 2012
    Assignee: Massachusetts Institute of Technology
    Inventors: Hans J. Eisler, Vikram C. Sundar, Michael E. Walsh, Victor I. Klimov, Moungi G. Bawendi, Henry I. Smith
  • Patent number: 7714988
    Abstract: A lithography system is disclosed that provides an array of areas of imaging electromagnetic energy that are directed toward a recording medium. The reversible contrast-enhancement material is disposed between the recording medium and the array of areas of imaging electromagnetic energy.
    Type: Grant
    Filed: January 13, 2006
    Date of Patent: May 11, 2010
    Assignee: Massachusetts Institute of Technology
    Inventors: Rajesh Menon, Henry I. Smith
  • Patent number: 7713684
    Abstract: A lithography system is disclosed that provides an array of areas of imaging electromagnetic energy that are directed toward a recording medium. The reversible contrast-enhancement material is disposed between the recording medium and the array of areas of imaging electromagnetic energy.
    Type: Grant
    Filed: December 18, 2008
    Date of Patent: May 11, 2010
    Assignee: Massachusetts Institute of Technology
    Inventors: Rajesh Menon, Henry I. Smith
  • Patent number: 7666580
    Abstract: A lithography system is disclosed that includes an array of focusing elements for directing focused illumination toward a recording medium, and a reversible contrast-enhancement material disposed between the recording medium and the array of focusing elements.
    Type: Grant
    Filed: December 17, 2008
    Date of Patent: February 23, 2010
    Assignee: Massachusetts Institute of Technology
    Inventors: Rajesh Menon, Henry I. Smith
  • Patent number: 7667819
    Abstract: A lithography system is disclosed that includes an array of focusing elements for directing focused illumination toward a recording medium, and a reversible contrast-enhancement material disposed between the recording medium and the array of focusing elements.
    Type: Grant
    Filed: June 16, 2005
    Date of Patent: February 23, 2010
    Assignee: Massachusetts Institute of Technology
    Inventors: Rajesh Menon, Henry I. Smith
  • Publication number: 20090253224
    Abstract: A structure including a grating and a semiconductor nanocrystal layer on the grating, can be a laser. The semiconductor nanocrystal layer can include a plurality of semiconductor nanocrystals including a Group II-VI compound, the nanocrystals being distributed in a metal oxide matrix. The grating can have a periodicity from 200 nm to 500 nm.
    Type: Application
    Filed: November 21, 2008
    Publication date: October 8, 2009
    Applicant: Massachusetts Institute of Technology
    Inventors: Hans J. Eisler, Vikram C. Sundar, Michael E. Walsh, Victor I. Klimov, Moungi G. Bawendi, Henry I. Smith
  • Publication number: 20090087798
    Abstract: A lithography system is disclosed that provides an array of areas of imaging electromagnetic energy that are directed toward a recording medium. The reversible contrast-enhancement material is disposed between the recording medium and the array of areas of imaging electromagnetic energy.
    Type: Application
    Filed: December 18, 2008
    Publication date: April 2, 2009
    Inventors: Rajesh Menon, Henry I. Smith
  • Publication number: 20090087797
    Abstract: A lithography system is disclosed that includes an array of focusing elements for directing focused illumination toward a recording medium, and a reversible contrast-enhancement material disposed between the recording medium and the array of focusing elements.
    Type: Application
    Filed: December 17, 2008
    Publication date: April 2, 2009
    Inventors: Rajesh Menon, Henry I. Smith
  • Publication number: 20090046299
    Abstract: An imaging system is provided. The imaging system includes a sample to be scanned by the imaging system. An absorbance modulation layer (AML) is positioned in close proximity to the sample and is physically separate from the sample. One or more sub-wavelength apertures are generated within the AML, whose size is determined by the material properties of the AML and the intensities of the illuminating wavelengths. A light source transmits an optical signal through the one or more sub-wavelength apertures generating optical near-fields that are collected for imaging.
    Type: Application
    Filed: August 6, 2008
    Publication date: February 19, 2009
    Inventors: Rajesh Menon, Henry I. Smith
  • Patent number: 7470473
    Abstract: A structure including a grating and a semiconductor nanocrystal layer on the grating, can be a laser. The semiconductor nanocrystal layer can include a plurality of semiconductor nanocrystals including a Group II-VI compound, the nanocrystals being distributed in a metal oxide matrix. The grating can have a periodicity from 200 nm to 500 nm.
    Type: Grant
    Filed: November 9, 2006
    Date of Patent: December 30, 2008
    Assignee: Massachusetts Institute of Technology
    Inventors: Hans J. Eisler, Vikram C. Sundar, Michael E. Walsh, Victor I. Klimov, Moungi G. Bawendi, Henry I. Smith
  • Patent number: 7417234
    Abstract: A method or system of spatial-phase locking a beam used in maskless lithography provides a fiducial grid with a single spatial-period, the fiducial grid being rotated at an angle with respect to a direction of scanning the beam; detects a signal generated in response to the beam being incident upon the fiducial grid; determines frequency components of the detected signal; and determines a two-dimensional location of the beam from phases of two determined fundamental frequency component. The method or system further determines a size of the beam from relative amplitudes of the determined fundamental and harmonic frequency components and/or determine a shape of the beam from relative amplitudes of the determined fundamental and harmonic frequency components. The method or system corrects a deflection of the beam in response to the determined two-dimensional location, and/or adjusts the size of the beam in response to the determined size, and/or adjusts the shape of the beam in response to the determined shape.
    Type: Grant
    Filed: May 17, 2005
    Date of Patent: August 26, 2008
    Assignee: Massachusetts Institute of Technology
    Inventors: Jeffrey T. Hastings, James G. Goodberlet, Feng Zhang, Henry I. Smith
  • Patent number: 7405806
    Abstract: A maskless lithography system is disclosed that includes a spatial light modulator, first and second imaging areas, and first folding optics. The spatial light modulator receives illumination from an illumination source and provides a modulated illumination beam having a first cross-sectional line length in a length-wise direction and a first cross-sectional width in a width-wise direction that is substantially smaller than said first cross-sectional length. The first imaging area receives a first portion of the modulated illumination beam. The first folding optics provides a second portion of the modulated illumination beam that is adjacent the first portion of the modulated illumination beam in the length-wise direction at a second imaging area that is not adjacent the first imaging area in the length-wise direction.
    Type: Grant
    Filed: April 14, 2005
    Date of Patent: July 29, 2008
    Assignee: Massachusetts Institute of Technology
    Inventors: Rajesh Menon, Henry I. Smith
  • Patent number: 7348104
    Abstract: A method is disclosed for forming an array of focusing elements for use in a lithography system. The method involves varying an exposure characteristic over an area to create a focusing element that varies in thickness in certain embodiments. In further embodiments, the method includes the steps of providing a first pattern via lithography in a substrate, depositing a conductive absorber material on the substrate, applying an electrical potential to at least a first portion of the conductive absorber material, leaving a second portion of the conductive material without the electrical potential, and etching the second portion of the conductive material to provide a first pattern on the substrate that is aligned with the first portion of the conductive absorber material.
    Type: Grant
    Filed: October 2, 2003
    Date of Patent: March 25, 2008
    Assignee: Massachusetts Institute of Technology
    Inventors: Dario Gil, Jeffrey T. Hastings, James G. Goodberlet, Rajesh Menon, David J. Carter, Henry I. Smith
  • Patent number: 7303860
    Abstract: A micro-fabricated structure and method of forming a micro-fabricated structure are disclosed. The method includes the steps of forming a first pattern in a first photo-resist, transferring the first pattern in the first photo-resist to a mask layer, forming a second pattern in a second photo-resist, and transferring the second pattern in the second photo-resist to the mask layer. In various embodiments, the method may further include the steps of forming a first pattern in a first photo-resist, forming a second pattern in a second photo-resist, and transferring the first and second patterns to a target layer.
    Type: Grant
    Filed: December 6, 2002
    Date of Patent: December 4, 2007
    Assignee: Massachusetts Institute of Technology
    Inventors: Bernhard Vogeli, Timothy A. Savas, Henry I. Smith, Caroline A. Ross
  • Patent number: 7304318
    Abstract: A method is disclosed for creating a permanent pattern on a substrate. The method includes the steps of providing an array of photon sources, each of which provides a photon beam, providing an array of focusing elements, each of which focuses an associated photon beam from the array of photon sources onto a substrate, and creating a permanent pattern on a substrate using the array of focusing elements to respectively focus associated photon beams on the substrate.
    Type: Grant
    Filed: March 16, 2005
    Date of Patent: December 4, 2007
    Assignee: Massachusetts Institute of Technology
    Inventors: Dario Gil, Rajesh Menon, David Carter, Henry I. Smith, George Barbastathis
  • Patent number: 7193782
    Abstract: An optical manipulation system is disclosed that includes an array of focusing elements, which focuses the energy beamlets from an array of beamlet sources into an array of focal spots in order to individually manipulate a plurality of samples on an adjacent substrate.
    Type: Grant
    Filed: December 30, 2003
    Date of Patent: March 20, 2007
    Assignee: Massachusetts Institute of Technology
    Inventors: Rajesh Menon, Dario Gil, George Barbastathis, Henry I. Smith
  • Patent number: 7160673
    Abstract: A method is disclosed for forming an array of focusing elements for use in a lithography system. In accordance with an embodiment, the method includes the steps of providing a master element that includes at least one diffractive pattern at a first location with respect to a target surface, illuminating the master element to produce a first diffractive pattern on the target surface at the first location, moving the master element with respect to the target surface to a second location with respect to the target surface, and illuminating the master element to produce a second diffractive pattern on the target surface at the second location.
    Type: Grant
    Filed: October 2, 2003
    Date of Patent: January 9, 2007
    Assignee: Massachusetts Institute of Technology
    Inventors: Rajesh Menon, Dario Gil, David J. Carter, George Barbastathis, Henry I. Smith