Patents by Inventor Henry Ivers

Henry Ivers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170248118
    Abstract: Wind Sail Turbines end the fossil fuel age and supply abundant, clean, and very inexpensive electricity (power). The new Wind Sail Turbines produce roughly 10-Fold to 50-Fold more power than existing wind turbines in the same wind path. This patent has the effect of replacing most of the science that is the basis of current Wind Science and current wind turbines. This patent changes the scientific understanding of how to effectively utilize wind and/or water flows to produce energy. Rotor blades, wings, and sails etc. are not airfoils working primarily from lift. These 3 devices are sails that work due to wind collisions. Therefore, sails are newly defined scientifically by the application of the New Wind Power Formula.
    Type: Application
    Filed: February 24, 2017
    Publication date: August 31, 2017
    Inventor: Henry Ivers
  • Patent number: 6726996
    Abstract: A diffusion barrier that has a low dielectric constant, k, yet resistant to oxygen and/or moisture permeability is provided. The diffusion barrier includes a dielectric stack having at least two or more dielectric films, each film having a dielectric constant of about 8 or less, wherein the dielectric stack comprises alternating films composed of a high-permeability material and a low-permeability material. A semiconductor structure including substrate having at least one wiring region and the inventive diffusion barrier formed on a surface of the substrate is also provided.
    Type: Grant
    Filed: May 16, 2001
    Date of Patent: April 27, 2004
    Assignee: International Business Machines Corporation
    Inventors: Edward Paul Barth, Stephan A. Cohen, Chester Dziobkowski, John Anthony Fitzsimmons, Stephen McConnell Gates, Thomas Henry Ivers, Sampath Purushothaman, Darryl D. Restaino, Horatio Seymour Wildman
  • Publication number: 20020172811
    Abstract: A diffusion barrier that has a low dielectric constant, k, yet resistant to oxygen and/or moisture permeability is provided. The diffusion barrier includes a dielectric stack having at least two or more dielectric films, each film having a dielectric constant of about 8 or less, wherein the dielectric stack comprises alternating films composed of a high-permeability material and a low-permeability material. A semiconductor structure including substrate having at least one wiring region and the inventive diffusion barrier formed on a surface of the substrate is also provided.
    Type: Application
    Filed: May 16, 2001
    Publication date: November 21, 2002
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Edward Paul Barth, Stephan A. Cohen, Chester Dziobkowski, John Anthony Fitzsimmons, Stephen McConnell Gates, Thomas Henry Ivers, Sampath Purushothaman, Darryl D. Restaino, Horatio Seymour Wildman