Abstract: A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provided power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.

Abstract: Preferably, obtaining internal and external thermal measurement values of a sealed process chamber allows a control system to generate a control signal based on a comparison of the internal and external thermal measurement values to the predetermined value. The control signal is provided to a fluid handling system, wherein the fluid handling system modulates flow of a first fluid around the exterior of the sealed process chamber. The control signal is further provided to a closed loop heat exchange system, wherein the closed loop heat exchange system modulates flow of a second fluid within an interior cavity of the sealed process chamber based on the control signal. The control signal is still further provided to an open loop heat exchange system, wherein the open loop heat exchange system modulates flow of a third fluid within the interior of cavity of the sealed process chamber.

Abstract: Preferably, obtaining internal and external thermal measurement values of a sealed process chamber allows a control system to generate a control signal based on a comparison of the internal and external thermal measurement values to the predetermined value. The control signal is provided to a fluid handling system, wherein the fluid handling system modulates flow of a first fluid around the exterior of the sealed process chamber. The control signal is further provided to a closed loop heat exchange system, wherein the closed loop heat exchange system modulates flow of a second fluid within an interior cavity of the sealed process chamber based on the control signal. The control signal is still further provided to an open loop heat exchange system, wherein the open loop heat exchange system modulates flow of a third fluid within the interior of cavity of the sealed process chamber.

Abstract: A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provided power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.

Abstract: A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provides power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.

Abstract: Preferably, a frame supporting a containment chamber, a sealed process chamber confined within the containment chamber, a heat source module disposed between the containment chamber and the process chamber, and a fluid inlet box with a flow adjustment structure, the fluid inlet box in fluidic communication with an exterior of the sealed process chamber, the flow adjustment structure controls fluid flow around the exterior of the sealed process chamber. Preferentially, a thermal sensor is disposed within and contactingly adjacent a wall of the sealed thermal chamber, the thermal sensor measures an internal temperature value of the sealed process chamber, and a controller communicating with the flow adjustment structure and the thermal sensor, the controller sets a flow position of the flow adjustment structure to regulate fluid flow through the fluid inlet box, and around the exterior of the sealed process chamber in response to the measured internal temperature value.

Abstract: Preferably, obtaining internal and external thermal measurement values of a sealed process chamber allows a control system to generate a control signal based on a comparison of the internal and external thermal measurement values to the predetermined value. The control signal is provided to a fluid handling system, wherein the fluid handling system modulates flow of a first fluid around the exterior of the sealed process chamber. The control signal is further provided to a closed loop heat exchange system, wherein the closed loop heat exchange system modulates flow of a second fluid within an interior cavity of the sealed process chamber based on the control signal. The control signal is still further provided to an open loop heat exchange system, wherein the open loop heat exchange system modulates flow of a third fluid within the interior of cavity of the sealed process chamber.

Abstract: A frame supporting a containment chamber, the containment chamber is preferably configured to enclose and confine a process chamber. A heat source module is disposed between the containment chamber and the process chamber, while a thermal regulation cavity is maintained between the heat source module and the process chamber. Preferably, at least one fluid inlet box is in fluidic communication with the thermal regulation cavity, in which the fluid inlet box provides a plate valve that mitigates the flow of fluids from the thermal regulation cavity through the fluid inlet box and to an environment external to the thermal regulation cavity. Additionally, the preferred fluid inlet box further includes a flow adjustment structure interacting with the plate valve to control fluid flow from the environment external to the thermal regulation cavity past the plate valve and into thermal regulation cavity.

Abstract: A process chamber that provides an interior surface and an exterior surface is confined within a containment chamber. Secured to the containment chamber is a collar that communicates with the process chamber. A seal formed between the process chamber and the collar, includes at least an adjustable backing ring encircling the exterior surface of the process chamber, a preload ring secured to the collar, and a sealing structure encircling the process chamber and positioned between the adjustable backing ring and the preload ring. The adjustable backing ring is adjustably secured a predetermined distance from the preload ring, based on a perimeter dimension of the process chamber, to form the seal between the process chamber and the collar.

Abstract: A frame supporting a containment chamber, the containment chamber is preferably configured to enclose and confine a process chamber. A heat source module is disposed between the containment chamber and the process chamber, while a collar communicates with the process chamber and is secured to the process chamber. Preferably, a heat source door is in fluidic communication with the process chamber, and includes at least a top hat section secured to a main body portion, an over center latch secured to the top hat section and interacting with the collar, the over center latch mitigates an inadvertent opening of the process chamber, and a lamp feed-through is preferably secured to the main body portion and supports a heat source device.

Abstract: A frame supporting a containment chamber, the containment chamber is preferably configured to enclose and confine a process chamber. A heat source module is disposed between the containment chamber and the process chamber, while a thermal regulation cavity is maintained between the heat source module and the process chamber. Preferably, at least one fluid inlet box is in fluidic communication with the thermal regulation cavity, in which the fluid inlet box provides a plate valve that mitigates the flow of fluids from the thermal regulation cavity through the fluid inlet box and to an environment external to the thermal regulation cavity. Additionally, the preferred fluid inlet box further includes a flow adjustment structure interacting with the plate valve to control fluid flow from the environment external to the thermal regulation cavity past the plate valve and into thermal regulation cavity.