Abstract: A method for reducing M3D effects on imaging is described. The method includes identifying points within a source plane of the photolithography system that are associated with pattern shifts resulting from diffraction of light off a photomask under an angle of incidence between an imaging beam of radiation and the mask normal, determining pattern shifts associated with the identified source plane points, and modifying the source to reduce the determined pattern shifts.

Abstract: A method for reducing M3D effects on imaging is described. The method includes identifying points within a source plane of the photolithography system that are associated with pattern shifts resulting from diffraction of light off a photomask under an angle of incidence between an imaging beam of radiation and the mask normal, determining pattern shifts associated with the identified source plane points, and modifying the source to reduce the determined pattern shifts.

Abstract: A ground water flow device 1 has a support element 3 and a filter sheet 5. The filter sheet 5 has a first side 7 and a second side 9. Tubes 13 are provided with flow apertures 11 which are large enough to allow the passage of water and soil particles. The tubes 13 each have an inner space 17. The tubes 13 each hold one of the filter sheets 5 in their inner space 17. A first part of the flow apertures 11 is facing the first side 7 of the filter sheets 5 and a second part of the flow apertures 11 is facing the second side 9 of the filter sheets 5, defining in each tube 13 a flow path 19 for ground water from the first part of the flow apertures 11 through the filter sheet 5 to the second part of the flow apertures 11.

Abstract: Various implementations of the invention provide for generation of a high transmission phase shift mask layout through inverse lithography techniques. In various implementations of the present invention, a set of mask data having a plurality of pixels is generated. The transmission value associated with each pixel may then be determined through an inverse lithography technique. With various implementations of the invention, the inverse lithography technique identifies an objective function, minimizes the objective function in relation to a simulation of the optical lithographic process, such that the transmission value, which is greater than 6%, may be determined.

Abstract: Various implementations of the invention provide for generation of a high transmission phase shift mask layout through inverse lithography techniques. In various implementations of the present invention, a set of mask data having a plurality of pixels is generated. The transmission value associated with each pixel may then be determined through an inverse lithography technique. With various implementations of the invention, the inverse lithography technique identifies an objective function, minimizes the objective function in relation to a simulation of the optical lithographic process, such that the transmission value, which is greater than 6%, may be determined.

Abstract: Various implementations of the invention provide for generation of a high transmission phase shift mask layout through inverse lithography techniques. In various implementations of the present invention, a set of mask data having a plurality of pixels is generated. The transmission value associated with each pixel may then be determined through an inverse lithography technique. With various implementations of the invention, the inverse lithography technique identifies an objective function, minimizes the objective function in relation to a simulation of the optical lithographic process, such that the transmission value, which is greater than 6%, may be determined.

Abstract: A mask pattern for imaging a marker structure on a substrate with a lithographic apparatus, the marker structure being configured to determine optical alignment or overlay, includes constituent parts to define the marker structure. The constituent parts include a plurality of segments, each segment having substantially a size of a device feature and a segment shape. The mask pattern includes at least one assist feature located at a critical part of the segment shape. The at least one assist feature has substantially a size below a resolution of the lithographic projection and is configured to counteract optical aberrations or optical limitations generated in the lithographic projection at the critical part.

Abstract: A mask pattern for imaging a marker structure on a substrate with a lithographic apparatus, the marker structure being configured to determine optical alignment or overlay, includes constituent parts to define the marker structure. The constituent parts include a plurality of segments, each segment having substantially a size of a device feature and a segment shape. The mask pattern includes at least one assist feature located at a critical part of the segment shape. The at least one assist feature has substantially a size below a resolution of the lithographic projection and is configured to counteract optical aberrations or optical limitations generated in the lithographic projection at the critical part.

Abstract: A leak-free drinking beaker comprises a container as well as a lid closing the container, a drink opening which opens into the interior of the container, and a valve extending over the drink opening, which valve is held in the closed position under a certain pretension and can be released against said pretension under the influence of a pressure difference. The valve is a double-acting non-return valve and comprises a flexible valve element and two separate valve seats, the valve element and one of the valve seats has a blocking action in a direction opposed to the direction in which the valve element has a blocking action with the other valve seat.

Abstract: A gas turbine combustor burning LBTU fuel gas serves to be applied to the combustion system of a small turbogenerator. The combustion system is composed of a combustor outer case, a combustor liner, a combustor transition section, a radial swirler with adjustable blades and fuel supply passages. The small turbogenerator (10 KW) with the redesigned combustion system is integrated by a LBTU gas generator. A recirculation bubble with proper size and strength is aerodynamically formed by the interaction among the swirling air jet, inclined fuel jet and the primary jets. Since an adjustable swirler is installed, the swirl number of the swirling air jet can be modified to meet the requirements of combustion load sharing and burning different LBTU fuel gases. To eliminate the possible hot spots and thus reduce the pattern factor value, two rows of cooling jet holes are arranged in the rear section of the combustor.

Abstract: Calcia-partially-stabilized zirconia ceramic materials which contain between 3.3 and 4.7 percent of calcia by weight. Such materials have a fine-scale two-phase microstructure substantially consisting of metastable, tetragonal domains of a critical size within cubic matrix grains, which domains, in regions of high stress, irreversibly transform to normal monoclinic form upon stressing of the body.The materials are produced by firing a zirconia body containing between 3.3 and 4.7 percent by weight of calcia at a temperature between 1700.degree. C and 1950.degree. C and allowing the body to cool at an average rate of at least 175.degree. C per hour to a temperature within the range 1200.degree. to 1450.degree. C; followed by ageing with said temperature range for a time such that peak strength is obtained.

Abstract: A single-ended/push-pull converter with an input emitter-follower transistor having a d.c. blocking emitter impedance and a collector impedance. The signal voltage across the collector impedance produces a signal current of opposite phase in a second emitter follower transistor having an input impedance which equals the collector impedance of the first transistor. The input circuit of a current mirror is included in the emitter circuit of the second emitter follower transistor and the output circuit is connected in parallel with the d.c. blocking impedance to keep the collector currents in the two emitter followers equal and constant.