Abstract: A collimator, in combination with a source of curing radiation, for use in a process for curing a photosensitive resin disposed on a working surface and having a machine direction and a cross-machine direction perpendicular to said machine direction, is disclosed. The preferred collimator comprises a plurality of mutually parallel collimating elements spaced from one another in the machine direction between the source of radiation and the resin. Each of the collimating elements is substantially perpendicular to the working surface, and every two of the mutually adjacent collimating elements have a machine-directional clearance and a cross-machine-directional clearance therebetween. The collimating elements and the machine direction form an acute angle therebetween such that the machine-directional clearance is greater than the cross-machine directional clearance. This allows to provide a greater collimation of the curing radiation in the cross-machine direction relative to the machine direction.

Abstract: A collimator, in combination with a source of curing radiation and a working surface, for use in a process for curing a photosensitive resin disposed on the working surface having a machine direction and a cross-machine direction perpendicular to said machine direction, is disclosed. The collimator comprises a plurality of mutually parallel collimating elements spaced from one another in the cross-machine direction and disposed between the source of radiation and the resin. Each of the collimating elements is substantially perpendicular to the working surface, and every two of the mutually adjacent collimating elements have a machine-directional clearance and a cross-machine-directional clearance therebetween. The collimating elements and the machine direction form an acute angle therebetween such that the machine-directional clearance is greater than the cross-machine directional clearance.

Abstract: An apparatus for making paper. The apparatus comprises a felt and a pattern layer joined to the felt. The felt has a relatively high UV absorbance. Such a high UV absorbance prevents the actinic radiation applied to cure the pattern layer from scattering when the radiation penetrates the surface of the pattern layer. By limiting the scattering of radiation beneath the surface of the pattern layer, extraneous cured pattern layer material is minimized in the regions of the felt where it is desired not to have pattern layer material.