Patents by Inventor Henry R. Voelker

Henry R. Voelker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Hybrid electron beam and optical lithography method
    Patent number: 4717644
    Abstract: A complete lithographic exposure pattern is formed in accordance with this invention by forming part of the complete pattern with electron beam radiation and forming the remaining part with light radiation. The electron beam exposure pattern part delineates all of the edges of the desired complete pattern while the optical exposure pattern part fills in any remaining regions, together forming the desired complete exposure pattern. Since all edges are delineated by electron beam radiation, any radiation sensitive layer exposed to the complete pattern will develop edges characteristic of an electron beam pattern exposure.Electron beam exposure system thruput is improved because the whole pattern is not exposed by electron beam.
    Type: Grant
    Filed: December 20, 1982
    Date of Patent: January 5, 1988
    Assignee: International Business Machines Corporation
    Inventors: Fletcher Jones, Henry R. Voelker