Abstract: The present disclosure generally relates to user interface for capturing and managing media (e.g., photo media, video media). In some examples, user interfaces for capturing media (e.g., photo media, video media) are described. In some examples, user interfaces for displaying camera controls and indicators are described. In some examples, user interfaces for adjusting media (e.g., photo media (e.g., a sequence of images, a single image), video media) are described. In some examples, user interfaces for managing the file format of media (e.g., photo, video media) are described. In some examples, user interfaces for storing media (photo media (e.g., a sequences of image, a single still image), video media) are described.

Abstract: An EUV radiation source that employs a low energy laser pre-pulse and a high energy laser main pulse. The pre-pulse generates a weak plasma in the target area that improves laser absorption of the main laser pulse to improve EUV radiation emissions. High energy ion flux is reduced by collisions in the localized target vapor cloud generated by the pre-pulse. Also, the low energy pre-pulse arrives at the target area 20–200 ns before the main pulse for maximum output intensity. The timing between the pre-pulse and the main pulse can be reduced below 160 ns to provide a lower intensity of the EUV radiation. In one embodiment, the pre-pulse is split from the main pulse by a suitable beam splitter having the proper beam intensity ratio, and the main pulse is delayed to arrive at the target area after the pre-pulse.

Abstract: An EUV radiation source (40) that includes a nozzle (42) positioned a far enough distance away from a target region (50) so that EUV radiation (56) generated at the target region (50) by a laser beam (54) impinging a target stream (46) emitted from the nozzle (42) is not significantly absorbed by target vapor proximate the nozzle (42). Also, the EUV radiation (56) does not significantly erode the nozzle (42) and contaminate source optics (34). In one embodiment, the nozzle (42) is more than 10 cm away from the target region (50).

Abstract: A laser-plasma EUV radiation source (10) that employs one or more approaches for preventing vaporization of material from a nozzle assembly (40) of the source (10) by electrical discharge from the plasma (30). The first approach includes employing an electrically isolating nozzle end, such as a glass capillary tube (46). The tube (46) extends beyond all of the conductive surfaces of the nozzle assembly (40) by a suitable distance so that the pressure around the closest conducting portion of the nozzle assembly (40) is low enough not to support arcing. A second approach includes providing electrical isolation of the conductive portions of the source (40) from the vacuum chamber wall. A third approach includes applying a bias potential (52) to the nozzle assembly (40) to raise the potential of the nozzle assembly (40) to the potential of the arc.

Abstract: A laser-plasma, EUV radiation source (10) that controls the target droplet delivery rate so that successive target droplets (66, 72) are not affected by the ionization of a preceding target droplet. A source nozzle (50) of the source (10) has an orifice (56) of a predetermined size that allows the droplets (54) to be emitted at a rate set by the target materials natural Rayleigh instability break-up frequency as generated by a piezoelectric transducer (58). The rate of the droplet generation is determined by these factors in connection with the pulse frequency of the excitation laser (14) so that buffer droplets (70) are delivered between the target droplets (66, 72). The buffer droplets (70) act to absorb radiation generated from the ionized target droplet (66) so that the next target droplet (72) is not affected.

Abstract: An EUV radiation source that employs a low energy laser pre-pulse and a high energy laser main pulse. The pre-pulse generates a weak plasma in the target area that improves laser absorption of the main laser pulse to improve EUV radiation emissions. High energy ion flux is reduced by collisions in the localized target vapor cloud generated by the pre-pulse. Also, the low energy pre-pulse arrives at the target area 20-200 ns before the main pulse for maximum output intensity. The timing between the pre-pulse and the main pulse can be reduced below 160 ns to provide a lower intensity of the EUV radiation. In one embodiment, the pre-pulse is split from the main pulse by a suitable beam splitter having the proper beam intensity ratio, and the main pulse is delayed to arrive at the target area after the pre-pulse.

Abstract: An EUV radiation source (40) that includes a nozzle (42) positioned a far enough distance away from a target region (50) so that EUV radiation (56) generated at the target region (50) by a laser beam (54) impinging a target stream (46) emitted from the nozzle (42) is not significantly absorbed by target vapor proximate the nozzle (42). Also, the EUV radiation (56) does not significantly erode the nozzle (42) and contaminate source optics (34). In one embodiment, the nozzle (42) is more than 10 cm away from the target region (50).

Abstract: An EUV radiation source that creates a stable solid filament target. The source includes a nozzle assembly having a condenser chamber for cryogenically cooling a gaseous target material into a liquid state. The liquid target material is filtered by a filter and sent to a holding chamber under pressure. The holding chamber allows entrained gas bubbles in the target material to be condensed into liquid prior to the filament target being emitted from the nozzle assembly. The target material is forced through a nozzle outlet tube to be emitted from the nozzle assembly as a liquid target stream. A thermal shield is provided around the outlet tube to maintain the liquid target material in the cryogenic state. The liquid target stream freezes and is vaporized by a laser beam from a laser source to generate the EUV radiation.

Abstract: A laser-plasma EUV radiation source (10) that employs one or more approaches for preventing vaporization of material from a nozzle assembly (40) of the source (10) by electrical discharge from the plasma (30). The first approach includes employing an electrically isolating nozzle end, such as a glass capillary tube (46). The tube (46) extends beyond all of the conductive surfaces of the nozzle assembly (40) by a suitable distance so that the pressure around the closest conducting portion of the nozzle assembly (40) is low enough not to support arcing. A second approach includes providing electrical isolation of the conductive portions of the source (40) from the vacuum chamber wall. A third approach includes applying a bias potential (52) to the nozzle assembly (40) to raise the potential of the nozzle assembly (40) to the potential of the arc.

Abstract: An EUV radiation source that creates a stable solid filament target. The source includes a nozzle assembly having a condenser chamber for cryogenically cooling a gaseous target material into a liquid state. The liquid target material is filtered by a filter and sent to a holding chamber under pressure. The holding chamber allows entrained gas bubbles in the target material to be condensed into liquid prior to the filament target being emitted from the nozzle assembly. The target material is forced through a nozzle outlet tube to be emitted from the nozzle assembly as a liquid target stream. A thermal shield is provided around the outlet tube to maintain the liquid target material in the cryogenic state. The liquid target stream freezes and is vaporized by a laser beam from a laser source to generate the EUV radiation.

Abstract: A laser-plasma, EUV radiation source (10) that controls the target droplet delivery rate so that successive target droplets (66, 72) are not affected by the ionization of a preceding target droplet. A source nozzle (50) of the source (10) has an orifice (56) of a predetermined size that allows the droplets (54) to be emitted at a rate set by the target materials natural Rayleigh instability break-up frequency as generated by a piezoelectric transducer (58). The rate of the droplet generation is determined by these factors in connection with the pulse frequency of the excitation laser (14) so that buffer droplets (70) are delivered between the target droplets (66, 72). The buffer droplets (70) act to absorb radiation generated from the ionized target droplet (66) so that the next target droplet (72) is not affected.

Abstract: A laser system which generates short duration pulses, such as under five nanoseconds at an energy level of up to a few milli-Joules per pulse (mJ/p) with near diffraction limited beam quality. A laser crystal is pumped (excited) by diode lasers. A resonator having at least two mirror surfaces defines a beam path passing through the laser crystal. The beam path in the resonator is periodically blocked by a first optical shutter permitting pump energy to build up in the laser crystal, except for a short period near the end of each pumping period. While the first optical shutter is open a second optical shutter blocks the light in the resonator except for periodic short intervals, the intervals being spaced such that at least one light pulse traveling at the speed of light in the resonator is able to make a plurality of transits through the resonator, increasing in intensity by extracting energy from the excited laser crystal on each transit.

Abstract: A solid state laser systems for generating highly monochromatic laser radiation at wavelengths of interest for advanced micro-lithography, particularly 248 nanometer and 193 nanometer wavelengths. At least one Nd:YAG laser produces a 1,064 nm laser beam consisting of narrow-linewidth pulses of infra-red laser radiation having a pulse duration of less than 30 nanoseconds, at a pulse rate preferably in excess of 500 pulses per second with pulse energy greater than 20 millijoules. This radiation is frequency doubled and frequency tripled to produce 532 nm and 355 nm pulsed laser beams. These beams are then further optically processed to generate the ultra-violet wavelength for micro-lithography at either 248 nm or 193 nm.

Abstract: A high average power, high brightness solid state laser system. We first produce a seed laser beam with a short pulse duration. A laser amplifier amplifies the seed beam to produce an amplified pulse laser beam which is tightly focused to produce pulses with brightness levels in excess of 10.sup.11 Watts/cm.sup.2. Preferred embodiments produce an amplified pulse laser beam having an average power in the range of 1 kW, an average pulse frequency of 12,000 pulses per second with pulses having brightness levels in excess of 10.sup.14 Watts/cm.sup.2 at a 20 .mu.m diameter spot which may be steered rapidly to simulate a larger spot size. Alternately, a kHz system with several (for example, seven) beams (from amplifiers arranged in parallel) can each be focused to 20 .mu.m and clustered to create effective spot sizes of 100 to 200 .mu.m. These beams are useful in producing X-ray sources for lithography.

Abstract: A laser system which generates pulses with a duration in the range of about 60 to 300 ps at an energy level of up to a few milli-Joules per pulse (mJ/p) with near diffraction limited beam quality. A laser crystal is pumped (excited) by diode lasers. A resonator having at least two mirror surfaces defines a beam path passing through the laser crystal. The beam path in the resonator is periodically blocked by a first optical shutter permitting pump energy to build up in the laser crystal, except for a short period near the end of each pumping period. While the first optical shutter is open a second optical shutter blocks the light in the resonator except for periodic subnano-second intervals, the intervals being spaced such that at least one light pulse traveling at the speed of light in the resonator is able to make a plurality of transits through the resonator, increasing in intensity by extracting energy from the excited laser crystal on each transit.

Abstract: An improved high average power, high brightness laser system. The laser system comprises an XeCI excimer amplifier, an XeCI excimer preamplifier, a means for generating a picosecond seed pulse tailored for the XeCI preamplifier and the XeCI amplifier and a means for focusing the output pulse laser beam onto a spot smaller in area than 100.times.10.sup.-6 cm.sup.2. We first produce a seed laser beam consisting of a series of bunches of short duration pulses with a bunch frequency in excess of 100 pulses per second. These seed laser pulses are produced by a Nd:YAG pumped dye laser oscillator with a cavity dumper. The pulses in the beam are preamplified in a multipass preamplifier and the pulses are then multiplexed in a pulse train generator into a larger number of lower power pulses.

Abstract: A high average power, high brightness solid state laser system. We first produce seed laser beam with a short pulse duration and frequency in excess of 1,000 pulses per second. A laser amplifier amplifies the seed pulse beam to produce an amplified pulse laser beam which is focused to produce pulses with brightness levels in excess of 10.sup.11 Watts/cm.sup.2. Preferred embodiments produce an amplified pulse laser beam having an average power in the range of 1 kW, an average pulse frequency of 12,000 pulses per second with pulses having brightness levels in excess of 10.sup.14 Watts/cm.sup.2 at a 20 .mu.m diameter spot which is steered rapidly to simulate a larger spot size. These beams are useful in producing X-ray sources for lithography.In one preferred embodiment, the seed beam is produced in a mode locked Nd:YAG oscillator pumped by a diode array with the frequency of the pulses being reduced by an electro-optic modulator.

Abstract: A high average power, high brightness solid state laser system. A laser produces a first pulse laser beam with a high pulse frequency. A pulse spacing selector removes from the first pulse laser beam more than 80 percent of the pulses to produce a second pulse laser beam having a series of periodically spaced short pulses in excess of 1,000 pulses per second. A laser amplifier amplifies the second pulse train to produce an amplified pulse laser beam which is focused to produce pulses with brightness levels in excess of 10.sup.11 Watts/cm.sup.2. A preferred embodiment produces an amplified pulse laser beam having an average power in the range of 1 KW, an average pulse frequency of 12,000 pulses per second with pulses having brightness levels in excess of 10.sup.14 Watts/cm.sup.2 at a 20 .mu.m diameter spot which is steered rapidly to simulate a larger spot size. These beams are useful in producing X-ray sources for lithography.

Abstract: A laser plasma X-ray source for use in photolithography is disclosed wherein an electro-optical shutter is used to trim the output pulse from a master oscillator to a desired duration. The pulse is then split into several pieces which travel along various optical delay paths so that the pieces pass sequentially through a laser power amplifier. After amplification, the pieces are reassembled and then focussed at the plasma target. In a first embodiment, polarization and angle coding methods are used to distinguish each pulse piece at it travels along the delay paths. In a second embodiment, polarization coding is replaced by additional angle coding transverse to the plane of the angles of the first embodiment. An expander/reducer lens assembly is used in both embodiments to reduce the angles between the beam paths and allow more beams to fit closely to the laser amplifier gain region.

Abstract: A laser plasma X-ray source for use in photolithography is disclosed wherein an electro-optical shutter is used to trim the output pulse from a master oscillator to a desired duration. The pulse is then split into several pieces which travel along various optical delay paths so that the pieces pass sequentially through a laser power amplifier. After amplification, the pieces are reassembled and then focussed at the plasma target. In a first embodiment, polarization and angle coding methods are used to distinguish each pulse piece as it travels along the delay paths. In a second embodiment, polarization coding is replaced by additional angle coding transverse to the plane of the angles of the first embodiment. An expander/reducer lens assembly is used in both embodiments to reduce the angles between the beam paths and allow more beams to fit closely to the laser amplifier gain region.