Patents by Inventor Henryk Fiedorowicz

Henryk Fiedorowicz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus
    Patent number: 6469310
    Abstract: A radiation source of a radiation system of a lithographic projection apparatus includes a primary jet nozzle 10 constructed and arranged to eject a primary gas or liquid 15 in a first direction; a supply 11 for the primary gas or liquid which is to be brought into an excited energy state when ejected from the primary nozzle 10 and is to emit ultraviolet electromagnetic radiation when falling back to a lower energy state; an exciting mechanism such as a laser 30 for bringing the primary gas or liquid into the excited energy state; a secondary jet nozzle 20 constructed and arranged to eject a secondary gas or liquid 25 in the first direction and positioned aside, possibly enclosing, the primary jet nozzle 10; and a supply 21 for the secondary gas or liquid.
    Type: Grant
    Filed: December 17, 1999
    Date of Patent: October 22, 2002
    Assignee: ASML Netherlands B.V.
    Inventors: Henryk Fiedorowicz, Frederik Bijkerk, Cornelis C. De Bruijn, Andrzej Bartnik
  • Radiation source for use in lithographic projection apparatus
    Patent number: 6452194
    Abstract: A radiation source of a radiation system of a lithographic projection apparatus comprises electrodes for creating a discharge in a space between them such that the discharge collapses into a pinch volume. The collapsing discharge creates a highly ionized, high temperature plasma in the pinch volume. A working fluid is ejected from a jet nozzle into the pinching volume and is thereby raised to a high temperature state and emits extreme ultraviolet radiation.
    Type: Grant
    Filed: December 14, 2000
    Date of Patent: September 17, 2002
    Assignee: ASML Netherlands B.V.
    Inventors: Frederik Bijkerk, Henryk Fiedorowicz, Cornelis C. de Bruijn, Andrzej Bartnik, Konstantin N. Koshelev, Vadim Y. Banine
  • Radiation source for use in lithographic projection apparatus
    Publication number: 20010004104
    Abstract: A radiation source of a radiation system of a lithographic projection apparatus comprises electrodes for creating a discharge in a space between them such that the discharge collapses into a pinch volume. The collapsing discharge creates a highly ionized, high temperature plasma in the pinch volume. A working fluid is ejected from a jet nozzle into the pinching volume and is thereby raised to a high temperature state and emits extreme ultraviolet radiation.
    Type: Application
    Filed: December 14, 2000
    Publication date: June 21, 2001
    Inventors: Frederik Bijkerk, Henryk Fiedorowicz, Cornelis C. de Bruijn, Andrzej Bartnik, Konstantin Y. Koshelev, Vadim Y. Banine