Patents by Inventor Heqing Li

Heqing Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240153272
    Abstract: A method for detecting urine formed elements based on deep learning and context relation includes performing video capture on a labeled urine sample to obtain a labeled urine video; extracting an image from the labeled urine video to obtain single-frame image data with a time sequence n; and labeling position and category of a formed element on the single-frame image data to obtain a formed element dataset, and dividing the formed element dataset into a training set and a testing set. The method also includes constructing a urine formed element detection and classification model, and comparing and identifying functions, and using the training set and the testing set to train the model. The method further includes performing video capture on a to-be-detected urine sample in the visual field of the microscopic imaging device to obtain a to-be-detected urine video.
    Type: Application
    Filed: January 16, 2024
    Publication date: May 9, 2024
    Inventors: Bairui LI, Heqing LIAN
  • Patent number: 8034411
    Abstract: The present invention relates to a method of preventing abnormal large grains from being included in a NCD thin film during a hot filament CVD process by appropriately controlling the deposition condition regarding a temperature-measuring means, a deposition pressure, an electrical potential and/or the composition of a raw material gas flow.
    Type: Grant
    Filed: October 31, 2007
    Date of Patent: October 11, 2011
    Assignee: Korea Institute of Science and Technology
    Inventors: Heqing Li, Wook Seong Lee, Young Joon Baik, Jong-Keuk Park
  • Publication number: 20090074986
    Abstract: The present invention relates to a method of preventing abnormal large grains from being included in a NCD thin film during a hot filament CVD process by appropriately controlling the deposition condition regarding a temperature-measuring means, a deposition pressure, an electrical potential and/or the composition of a raw material gas flow.
    Type: Application
    Filed: October 31, 2007
    Publication date: March 19, 2009
    Applicant: Korea Institute of Science and Technology
    Inventors: Heqing Li, Wook Seong Lee, Young Joon Baik, Jong-Keuk Park