Patents by Inventor Heraldo L. Botelho

Heraldo L. Botelho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHODS FOR THE REDUCTION AND ELIMINATION OF PARTICULATE CONTAMINATION WITH CVD OF AMORPHOUS CARBON
    Publication number: 20070286965
    Abstract: A method is provided for forming an amorphous carbon layer, deposited on a dielectric material such as oxide, nitride, silicon carbide, carbon doped oxide, etc., or a metal layer such as tungsten, aluminum or poly-silicon. The method includes the use of chamber seasoning, variable thickness of seasoning film, wider spacing, variable process gas flows, post-deposition purge with inert gas, and post-deposition plasma purge, among others, to make the deposition of an amorphous carbon film at low deposition temperatures possible without any defects or particle contamination.
    Type: Application
    Filed: June 8, 2006
    Publication date: December 13, 2007
    Inventors: Martin Jay Seamons, Wendy H. Yeh, Sudha S. R. Rathi, Heraldo L. Botelho
  • Methods for the reduction and elimination of particulate contamination with CVD of amorphous carbon
    Patent number: 7094442
    Abstract: A method is provided for forming an amorphous carbon layer, deposited on a dielectric material such as oxide, nitride, silicon carbide, carbon doped oxide, etc., or a metal layer such as tungsten, aluminum or poly-silicon. The method includes the use of chamber seasoning, variable thickness of seasoning film, wider spacing, variable process gas flows, post-deposition purge with inert gas, and post-deposition plasma purge, among others, to make the deposition of an amorphous carbon film at low deposition temperatures possible without any defects or particle contamination.
    Type: Grant
    Filed: July 13, 2004
    Date of Patent: August 22, 2006
    Assignee: Applied Materials, Inc.
    Inventors: Martin Jay Seamons, Wendy H. Yeh, Sudha S. R. Rathi, Heraldo L. Botelho