Patents by Inventor Heraldo L. Bothelho

Heraldo L. Bothelho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Maintenance of photoresist activity on the surface of dielectric arcs for 90 nm feature sizes
    Patent number: 8211626
    Abstract: We have determined that it is necessary to remove hydroxyl groups from the surface of a DARC over which a CAR photoresist is applied, to reduce poisoning of the photoresist during imaging. The poisoning is reduced by treating the surface of the DARC film with a hydrogen or helium-containing plasma which is capable of removing the hydroxyl groups.
    Type: Grant
    Filed: December 13, 2006
    Date of Patent: July 3, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Sang H. Ahn, Sudha Rathi, Heraldo L. Bothelho
  • Reduction in photoresist footing undercut during development of feature sizes of 120NM or less
    Patent number: 8088563
    Abstract: We have traced the detachment of photoresist during development of patterned features in the range of about 90 nm and smaller to a combination of the reduced “foot print” of the pattern on the underlying substrate and to the contact angle between the underlying substrate surface and the developing reagent. By maintaining a contact angle of about 30 degrees or greater, the detachment of the photoresist from the underlying substrate can be avoided for photoresists including feature sizes in the range of about 90 nm. We have achieved an increased contact angle between the DARC surface and a water-based CAR photoresist developer while simultaneously reducing CAR poisoning by treating the surface of the DARC after film formation.
    Type: Grant
    Filed: November 21, 2006
    Date of Patent: January 3, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Sang H. Ahn, Sudha Rathi, Heraldo L. Bothelho