Patents by Inventor Herbert A. Weakliem

Herbert A. Weakliem has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4873119
    Abstract: The invention provides a method for preparing amorphous semiconductors by (a) activating a semiconductane gas using a activator to produce mononuclear, reactive fragments or gaseous condensation products which serve as precursors for the deposition of an amorphous semiconductor; and (b) controlling the temperature of the activator and the flow rate and temperature of the semiconductane gas so that it does not completely decompose upon the activator.
    Type: Grant
    Filed: January 28, 1987
    Date of Patent: October 10, 1989
    Assignee: Chronar Corp.
    Inventors: Masud Akhtar, Herbert A. Weakliem
  • Patent number: 4675467
    Abstract: Directed energy conversion of semiconductors by the directed energy fusion of a selective region of a semiconductor layer to provide a conductive path through the layer. A conductive path is formed through a semiconductive layer through opposed electrodes by conversion of the semiconductive region, for example, by laser energy applied to change the structure in the region extending between the electrodes. The change in conductivity of the path is monitored and used to control the formation of the conductive path by controlling the directed energy source.
    Type: Grant
    Filed: April 5, 1986
    Date of Patent: June 23, 1987
    Assignee: Chronar Corp.
    Inventors: John E. Van Dine, Herbert A. Weakliem, Zoltan Kiss, Alan E. Delahoy
  • Patent number: 4450787
    Abstract: A glow discharge plasma reactor for deposition of thin films from a reactive RF glow discharge is provided with a screen positioned between the walls of the chamber and the cathode to confine the glow discharge region to within the region defined by the screen and the cathode. A substrate for receiving deposition material from a reactive gas is positioned outside the screened region. The screen is electrically connected to the system ground to thereby serve as the anode of the system. The energy of the reactive gas species is reduced as they diffuse through the screen to the substrate. Reactive gas is conducted directly into the glow discharge region through a centrally positioned distribution head to reduce contamination effects otherwise caused by secondary reaction products and impurities deposited on the reactor walls.
    Type: Grant
    Filed: May 29, 1984
    Date of Patent: May 29, 1984
    Assignee: RCA Corporation
    Inventors: Herbert A. Weakliem, John L. Vossen, Jr.