Patents by Inventor Herbert E. Litvak
Herbert E. Litvak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7580119Abstract: The present invention relates to monitoring chemicals in a process chamber using a spectrometer having a plasma generator, based on patterns over time of chemical consumption. The relevant patterns may include a change in consumption, reaching a consumption plateau, absence of consumption, or presence of consumption. In some embodiments, advancing to a next step in forming structures on the workpiece depends on the pattern of consumption meeting a process criteria. In other embodiments, a processing time standard is established, based on analysis of the relevant patterns. Yet other embodiments relate to controlling work on a workpiece, based on analysis of the relevant patterns. The invention may be either a process or a device including logic and resources to carry out a process.Type: GrantFiled: November 24, 2008Date of Patent: August 25, 2009Assignee: Lightwind CorporationInventors: Gary B. Powell, Herbert E. Litvak
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Publication number: 20090075403Abstract: The present invention relates to monitoring chemicals in a process chamber using a spectrometer having a plasma generator, based on patterns over time of chemical consumption. The relevant patterns may include a change in consumption, reaching a consumption plateau, absence of consumption, or presence of consumption. In some embodiments, advancing to a next step in forming structures on the workpiece depends on the pattern of consumption meeting a process criteria. In other embodiments, a processing time standard is established, based on analysis of the relevant patterns. Yet other embodiments relate to controlling work on a workpiece, based on analysis of the relevant patterns. The invention may be either a process or a device including logic and resources to carry out a process.Type: ApplicationFiled: November 24, 2008Publication date: March 19, 2009Applicant: Lightwind CorporationInventors: Gary B. Powell, Herbert E. Litvak
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Patent number: 7456939Abstract: The present invention relates to monitoring chemicals in a process chamber using a spectrometer having a plasma generator, based on patterns over time of chemical consumption. The relevant patterns may include a change in consumption, reaching a consumption plateau, absence of consumption, or presence of consumption. In some embodiments, advancing to a next step in forming structures on the workpiece depends on the pattern of consumption meeting a process criteria. In other embodiments, a processing time standard is established, based on analysis of the relevant patterns. Yet other embodiments relate to controlling work on a workpiece, based on analysis of the relevant patterns. The invention may be either a process or a device including logic and resources to carry out a process.Type: GrantFiled: June 30, 2006Date of Patent: November 25, 2008Assignee: Lightwind CorporationInventors: Gary B. Powell, Herbert E. Litvak
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Patent number: 7217371Abstract: The present invention relates to interfacing new sensors to incumbent controls. In particular, it relates to optically interfacing a new sensor, such as a spectrometer with plasma generator, to an incumbent electro-optical sensor. Logic and resources to control activation of the incumbent electro-optical sensor may be included. Particular aspects of the present invention are described in the claims, specification and drawings.Type: GrantFiled: July 26, 2004Date of Patent: May 15, 2007Assignee: Lightwind CorporationInventor: Herbert E. Litvak
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Patent number: 7072028Abstract: The present invention relates to monitoring chemicals in a process chamber using a spectrometer having a plasma generator, based on patterns over time of chemical consumption. The relevant patterns may include a change in consumption, reaching a consumption plateau, absence of consumption, or presence of consumption. In some embodiments, advancing to a next step in forming structures on the workpiece depends on the pattern of consumption meeting a process criteria. In other embodiments, a processing time standard is established, based on analysis of the relevant patterns. Yet other embodiments relate to controlling work on a workpiece, based on analysis of the relevant patterns. The invention may be either a process or a device including logic and resources to carry out a process.Type: GrantFiled: July 22, 2004Date of Patent: July 4, 2006Assignee: Lightwind CorporationInventors: Gary B. Powell, Herbert E. Litvak
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Patent number: 6612902Abstract: An invention is disclosed for end point triggering in a chemical mechanical polishing process. A sensor array is positioned beneath a polishing belt having an end point window. The polishing belt is then rotated during the CMP process, and a transverse position of the end point window is determined based on a portion of the sensor array covered by a particular portion of the polishing belt. The particular portion of the polishing belt can be the end point window, a trigger slot, or a portion of the polishing belt covered by a reflective material. The sensor array can optionally be a charged coupled device (CCD), or a linear array of sensors. In operation, the positional information is determined based on which sensors are covered by the particular portion of the polishing belt. The positional information is then communicated to a belt steering system, which corrects the transverse position of the end point window based on which sensors are covered by the particular portion of the polishing belt.Type: GrantFiled: March 29, 2001Date of Patent: September 2, 2003Assignee: Lam Research CorporationInventors: John M. Boyd, Herbert E. Litvak
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Patent number: 6426232Abstract: In a process of selectively removing material from an exposed layer carried by a substrate, a technique for determining endpoint by monitoring the intensity of a radiation beam that is passed through the substrate an any intervening layers to be reflected off the layer being processed. This monitoring technique is used during photoresist developing, wet etching, and mechanical planarization and polishing during the manufacture of integrated circuits on semiconductor wafers, flat panel displays on glass substrates, and similar articles. Planarization and polishing processes are alternately monitored by monitoring temperature.Type: GrantFiled: June 15, 1998Date of Patent: July 30, 2002Assignee: Luxtron CorporationInventor: Herbert E. Litvak
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Patent number: 6413147Abstract: In a process of selectively removing material from an exposed layer carried by a substrate, a technique for determining endpoint by monitoring the intensity of a radiation beam that is passed through the substrate and any intervening layers to be reflected off the layer being processed. This monitoring technique is used during photoresist developing, wet etching, and mechanical planarization and polishing during the manufacture of integrated circuits on semiconductor wafers, flat panel displays on glass substrates and similar articles. Planarization and polishing processes are alternatively monitored by monitoring temperature.Type: GrantFiled: February 14, 2000Date of Patent: July 2, 2002Inventor: Herbert E. Litvak
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Patent number: 6254459Abstract: A wafer polishing device with movable window can be used for in-situ monitoring of a wafer during CMP processing. During most of the CMP operation, the window remains below a polishing surface of a polishing device to protect the window from the deleterious effects of the polishing process. When the window moves into position between the wafer and a measurement sensor, the window is moved closer to the polishing surface. In this position, at least some polishing agent collected in the recess above the window is removed, and an in-situ measurement can be taken with reduced interference from the polishing agent. After the window is positioned away from the wafer and measurement sensor, the window moves farther away from the wafer and polishing surface. With such a movable window, the limitations of current polishing devices are overcome.Type: GrantFiled: December 6, 1999Date of Patent: July 3, 2001Assignee: Lam Research CorporationInventors: Rajeev Bajaj, Herbert E. Litvak, Rahul K. Surana, Stephen C. Jew, Jiri Pecen
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Patent number: 6110752Abstract: In a process of selectively removing material from an exposed layer carried by a substrate, a technique for determining endpoint by monitoring the intensity of a radiation beam that is passed through the substrate and any intervening layers to be reflected off the layer being processed. This monitoring technique is used during photoresist developing, wet etching, and mechanical planarization and polishing during the manufacture of integrated circuits on semiconductor wafers, flat panel displays on glass substrates, and similar articles. Planarization and polishing processes are alternatively monitored by monitoring temperature.Type: GrantFiled: August 27, 1997Date of Patent: August 29, 2000Assignee: Luxtron CorporationInventor: Herbert E. Litvak
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Patent number: 6077452Abstract: In a process of selectively removing material from an exposed layer carried by a substrate, a technique for determining endpoint by monitoring the intensity of a radiation beam that is passed through the substrate and any intervening layers to be reflected off the layer being processed. This monitoring technique is used during photoresist developing, wet etching, and mechanical planarization and polishing during the manufacture of integrated circuits on semiconductor wafers, flat panel displays on glass substrates, and similar articles. Planarization and polishing processes are alternatively monitored by monitoring temperature.Type: GrantFiled: April 14, 1999Date of Patent: June 20, 2000Assignee: Luxtron CorporationInventor: Herbert E. Litvak
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Patent number: 6068539Abstract: A wafer polishing device with movable window can be used for in-situ monitoring of a wafer during CMP processing. During most of the CMP operation, the window remains below a polishing surface of a polishing device to protect the window from the deleterious effects of the polishing process. When the window moves into position between the wafer and a measurement sensor, the window is moved closer to the polishing surface. In this position, at least some polishing agent collected in the recess above the window is removed, and an in-situ measurement can be taken with reduced interference from the polishing agent. After the window is positioned away from the wafer and measurement sensor, the window moves farther away from the wafer and polishing surface. With such a movable window, the limitations of current polishing devices are overcome.Type: GrantFiled: March 10, 1998Date of Patent: May 30, 2000Assignee: Lam Research CorporationInventors: Rajeev Bajaj, Herbert E. Litvak, Rahul K. Surana, Stephen C. Jew, Jiri Pecen
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Patent number: 6010538Abstract: In an apparatus for removing material from an article, such as an exposed surface of an intermediate integrated circuit structure, by planarizing, polishing, etching or the like, a sensor is mechanically coupled to a moving carrier of the article for directing through the article to its first side an electromagnetic radiation beam having a wavelength band to which the structure is substantially transparent. The beam is detected after interacting with the article, such as being reflected from its exposed surface, and resulting information of the state of the processing of the exposed surface is transmitted from the moving carrier to a stationary receiver by radiation without the use of any physical transmission media such as wires or optical fibers. Multiple sensors mounted on the moving article carrier provide information of the uniformity of the processing across the exposed article surface.Type: GrantFiled: January 11, 1996Date of Patent: January 4, 2000Assignee: Luxtron CorporationInventors: Mei H. Sun, Herbert E. Litvak, Huey M. Tzeng, Daniel E. Glenn, Earl M. Jensen, Frank J. Hausman, Lin Jun Zhou
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Patent number: 5946082Abstract: An improved method for minimizing interferences from random noise and correlated fluctuations which obscure electrical signals converted from optical emissions. In particular, an improved method for the removal of interferences from optical emission signals during endpoint determination in dry etching processes for the fabrication of micro-electronic devices which derives information in the presence of random noise, correlated fluctuations and periodic modulations of the plasma by maximizing the signal to random noise ratio and minimizing the obscuring effects of correlated fluctuation.Type: GrantFiled: June 16, 1998Date of Patent: August 31, 1999Assignee: Luxtron CorporationInventors: Herbert E. Litvak, Steven C. Leach, Edward G. Rodgers
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Patent number: 5891352Abstract: In a process of selectively removing material from an exposed layer carried by a substrate, a technique for determining endpoint by monitoring the intensity of a radiation beam that is passed through the substrate and any intervening layers to be reflected off the layer being processed. This monitoring technique is used during photoresist developing, wet etching, and mechanical planarization and polishing during the manufacture of integrated circuits on semiconductor wafers, flat panel displays on glass substrates, and similar articles. Planarization and polishing processes are alternatively monitored by monitoring temperature.Type: GrantFiled: June 11, 1997Date of Patent: April 6, 1999Assignee: Luxtron CorporationInventor: Herbert E. Litvak
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Patent number: 5786886Abstract: An improved method for minimizing interferences from random noise and correlated fluctuations which obscure electrical signals converted from optical emissions. In particular, an improved method for the removal of interferences from optical emission signals during endpoint determination in dry etching processes for the fabrication of micro-electronic devices which derives information in the presence of random noise, correlated fluctuations and periodic modulations of the plasma by maximizing the signal to random noise ratio and minimizing the obscuring effects of correlated fluctuation.Type: GrantFiled: May 8, 1995Date of Patent: July 28, 1998Assignee: Luxtron CorporationInventors: Herbert E. Litvak, Steven C. Leach, Edward G. Rodgers
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Patent number: 5695660Abstract: In a process of selectively removing material from an exposed layer carried by a substrate, a technique for determining endpoint by monitoring the intensity of a radiation beam that is passed through the substrate and any intervening layers to be reflected off the layer being processed. This monitoring technique is used during photoresist developing, wet etching, and mechanical planarization and polishing during the manufacture of integrated circuits on semiconductor wafers, flat panel displays on glass substrates, and similar articles. Planarization and polishing processes are alternatively monitored by monitoring temperature.Type: GrantFiled: March 14, 1996Date of Patent: December 9, 1997Assignee: Luxtron CorporationInventor: Herbert E. Litvak
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Patent number: 5499733Abstract: In a process of selectively removing material from an exposed layer carried by a substrate, a technique for determining endpoint by monitoring the intensity of a radiation beam that is passed through the substrate and any intervening layers to be reflected off the layer being processed. This monitoring technique is used during photoresist developing, wet etching, and mechanical planarization and polishing during the manufacture of integrated circuits on semiconductor wafers, flat panel displays on glass substrates, and similar articles. Planarization and polishing processes are alternatively monitored by monitoring temperature.Type: GrantFiled: September 16, 1993Date of Patent: March 19, 1996Assignee: Luxtron CorporationInventor: Herbert E. Litvak
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Patent number: 5414504Abstract: An improved method for minimizing interferences from random noise and correlated fluctuations which obscure electrical signals converted from optical emissions. In particular, an improved method for the removal of interferences from optical emission signals during endpoint determination in dry etching processes for the fabrication of microelectronic devices which derives information in the presence of random noise, correlated fluctuations and periodic modulations of the plasma by maximizing the signal to random noise ratio and minimizing the obscuring effects of correlated fluctuation.Type: GrantFiled: February 19, 1993Date of Patent: May 9, 1995Assignee: Xinix, Inc.Inventors: Herbert E. Litvak, Steven C. Leach, Edward G. Rodgers
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Patent number: 5308447Abstract: Techniques of monitoring and controlling removal or forming of layers of material, such as employed in the manufacture of flat panel displays and integrated circuit wafers. Examples of material removal include the development of a photoresist layer and etching of layers of other material according to a pattern across the surface of the layer. The material removal process is terminated in response to detecting when breakthrough occurs in a preselected number of individual regions across the surface of the layer. A measure of uniformity of processing across the layer surface is obtained from monitoring removal of material in such individual surface regions, and can be used to control the process to improve such uniformity.Type: GrantFiled: June 9, 1992Date of Patent: May 3, 1994Assignee: Luxtron CorporationInventors: Russell E. Lewis, Richard E. Howard, Herbert E. Litvak