Patents by Inventor Herbert Lindner

Herbert Lindner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for purifying polycrystalline silicon
    Patent number: 9421584
    Abstract: Polysilicon fragments are purified to remove metal contaminates by contacting the fragments with a purifying liquid at a flow rate >100 mm/sec. Effective removal without abrasion is accomplished.
    Type: Grant
    Filed: November 7, 2014
    Date of Patent: August 23, 2016
    Assignee: WACKER CHEMIE AG
    Inventors: Hanns Wochner, Christian Gossmann, Herbert Lindner
  • METHOD FOR PURIFYING POLYCRYSTALLINE SILICON
    Publication number: 20150075559
    Abstract: Polysilicon fragments are purified to remove metal contaminates by contacting the fragments with a purifying liquid at a flow rate >100 mm/sec. Effective removal without abrasion is accomplished.
    Type: Application
    Filed: November 7, 2014
    Publication date: March 19, 2015
    Inventors: Hanns WOCHNER, Christian Gossmann, Herbert LINDNER
  • MEANS AND METHODS FOR DIAGNOSING ENDOMETRIOSIS
    Publication number: 20120190561
    Abstract: The present invention relates to means and methods for diagnosing or predicting endometriosis in a female subject. Particularly, the present invention relates to methods for determining the susceptibility to, predisposition for, presence of and/or risk of developing or suffering from endometriosis in a female subject. The present invention also relates to a kit useful for determining the risk of developing or suffering from endometriosis in a subject, a binding molecule specifically binding to the DBP GC*2 or DBP GC*1 allele product, and a binding molecule binding to the gene encoding the DBP GC*2 or GC*1 allele.
    Type: Application
    Filed: November 14, 2011
    Publication date: July 26, 2012
    Inventors: Ludwig Wildt, Beata Seeber, Klaus Faseral, George Golderer, Leopold Kremser, Herbert Lindner, Bettina Sarg
  • PROCESS FOR PURIFYING POLYCRYSTALLINE SILICON
    Publication number: 20110186087
    Abstract: Polysilicon is freed of metallic impurities without the use of HCl or H2O2 by a preliminary cleaning with NHO3, HF, and H2SiF6 and a main cleaning with HNO3 and HF, followed by hydrophilization. The main cleaning solution can be cycled to the process as a preliminary cleaning solution component.
    Type: Application
    Filed: August 8, 2008
    Publication date: August 4, 2011
    Applicant: WACKER CHEMIE AG
    Inventors: Hanns Wochner, Christian Gossmann, Herbert Lindner
  • METHOD FOR PURIFYING POLYCRYSTALLINE SILICON
    Publication number: 20100300495
    Abstract: Polysilicon fragments are purified to remove metal contaminates by contacting the fragments with a purifying liquid at a flow rate >100 mm/sec. Effective removal without abrasion is accomplished.
    Type: Application
    Filed: August 8, 2008
    Publication date: December 2, 2010
    Applicant: WACKER CHEMIE AG
    Inventors: Hanns Wochner, Christian Gossmann, Herbert Lindner
  • Method for cleaning a polysilicon fraction
    Patent number: 7736439
    Abstract: The present invention relates to a method for cleaning polycrystalline silicon fragments to a metal content of <100 ppbw, wherein a polysilicon fraction is added to an aqueous cleaning solution containing HF and H2O2, this aqueous cleaning solution is removed and the polycrystalline fraction thereby obtained is washed with highly pure water and subsequently dried.
    Type: Grant
    Filed: June 18, 2007
    Date of Patent: June 15, 2010
    Assignee: Wacker Chemie AG
    Inventors: Hanns Wochner, Christian Gossmann, Herbert Lindner
  • Method For Cleaning A Polysilicon Fraction
    Publication number: 20080006293
    Abstract: The present invention relates to a method for cleaning polycrystalline silicon fragments to a metal content of <100 ppbw, wherein a polysilicon fraction is added to an aqueous cleaning solution containing HF and H2O2, this aqueous cleaning solution is removed and the polycrystalline fraction thereby obtained is washed with highly pure water and subsequently dried.
    Type: Application
    Filed: June 18, 2007
    Publication date: January 10, 2008
    Applicant: WACKER CHEMIE AG
    Inventors: Hanns Wochner, Christian Gossmann, Herbert Lindner