Abstract: Embodiments of the present invention provide a novel and non-obvious method, system and computer program product for uniform references to artifacts in a software configuration management tool. In one embodiment, a data processing system configured to resolve artifact references can include a software configuration management tool and uniform reference resolution logic coupled to the tool. In this regard, the uniform reference logic can be programmed to resolve a path name to a referenced artifact by processing a uniform reference specifying the referenced artifact.

Abstract: A metal sheet (58) to be etched into lead frames has an emulsion coating (60) on its top and bottom. A bottom glass plate (56) has a mask pattern (64) defining the pattern of metal from the sheet (58) that is to remain after etching to form the lead frame. The pattern (64) has a first line width d1. A top glass plate (62) has a corresponding mask pattern (66) also defining the pattern of metal from the sheet (58) that is to remain after etching to form the lead frame. The mask pattern (66) has a second line width d2 that is less than the first line width. The emulsion coating (60) on the sheet (58) is exposed through the mask plates (56) and (62), and the emulsion coating is developed in a conventional manner to give photoresist patterns (64a) and (b 66a) or (64b) and (66b) on the metal sheet (58).