Patents by Inventor Herman Boom

Herman Boom has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 8427629
    Abstract: An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.
    Type: Grant
    Filed: August 30, 2010
    Date of Patent: April 23, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Carlo Cornelis Maria Luijten, Sjoerd Nicolaas Lambertus Donders, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Bob Streefkerk, Marcel Beckers, Herman Boom, Richard Moerman
  • Liquid filled lens element, lithographic apparatus comprising such an element and device manufacturing method
    Patent number: 8237912
    Abstract: A lens element, for use in a projection system, includes a concave side. The lens element further includes a membrane and a nozzle, the membrane at least covering the concave side of the lens element. The nozzle is arranged for supplying and/or removing a liquid and/or a gas in between the concave side and the membrane.
    Type: Grant
    Filed: March 8, 2011
    Date of Patent: August 7, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Herman Boom, Borgert Kruizinga, Martinus Hendrikus Antonius Leenders, Johannes Catharinus Hubertus Mulkens, Huibert Visser, Peter Julian Pollard
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120113402
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
    Type: Application
    Filed: November 3, 2011
    Publication date: May 10, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Theodorus Petrus Maria CADEE, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Comelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110273677
    Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
    Type: Application
    Filed: July 20, 2011
    Publication date: November 10, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Richard Joseph BRULS, Marcel Mathijs Theodore Marie DIERICHS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Erick Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Ronald Walther Jeanne SEVERIJNS, Sergei SHULEPOV, Herman BOOM, Timotheus Franciscus SENGERS
  • LIQUID FILLED LENS ELEMENT, LITHOGRAPHIC APPARATUS COMPRISING SUCH AN ELEMENT AND DEVICE MANUFACTURING METHOD
    Publication number: 20110194096
    Abstract: A lens element, for use in a projection system, includes a concave side. The lens element further includes a membrane and a nozzle, the membrane at least covering the concave side of the lens element. The nozzle is arranged for supplying and/or removing a liquid and/or a gas in between the concave side and the membrane.
    Type: Application
    Filed: March 8, 2011
    Publication date: August 11, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Herman BOOM, Borgert Kruizinga, Martinus Hendrikus Antonius Leenders, Johannes Catharinus Hubertus Mulkens, Huibert Visser, Peter Julian Pollard
  • Liquid filled lens element, lithographic apparatus comprising such an element and device manufacturing method
    Patent number: 7969549
    Abstract: A lens element, for use in a projection system, includes a concave side. The lens element further includes a membrane and a nozzle, the membrane at least covering the concave side of the lens element. The nozzle is arranged for supplying and/or removing a liquid and/or a gas in between the concave side and the membrane.
    Type: Grant
    Filed: June 30, 2006
    Date of Patent: June 28, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Herman Boom, Borgert Kruizinga, Martinus Hendrikus Antonius Leenders, Johannes Catharinus Hubertus Mulkens, Huibert Visser, Peter Julian Pollard
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100321650
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
    Type: Application
    Filed: August 26, 2010
    Publication date: December 23, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: THEODORUS PETRUS MARIA CADEE, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Mana Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Comelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100321651
    Abstract: An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.
    Type: Application
    Filed: August 30, 2010
    Publication date: December 23, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Carlo Cornelis Maria LUIJTEN, Sjoerd Nicolaas Lambertus Donders, Nicolaas Rudolf Kemper, Martinus Hendrickus Antonius Leenders, Erik Roelof Loopstra, Bob Streefkerk, Marcel Beckers, Herman Boom, Richard Moerman
  • Lithographic apparatus, device manufacturing method, and mask having a pellicle attached hereto
    Patent number: 7843552
    Abstract: The mechanical properties of a pellicle frame and/or the pellicle are optimized so that the mechanical effect of the frame and pellicle on the mask shape in use is optimum for imaging. In particular the pellicle frame assembly may be arranged to be mechanically neutral, i.e., the mask adopts the same shape with pellicle attached as it would without the pellicle.
    Type: Grant
    Filed: June 17, 2005
    Date of Patent: November 30, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Richard Joseph Bruls, Orlando Serapio Cicilia, Tammo Uitterdijk, Herman Boom
  • Lithographic apparatus and device manufacturing method
    Patent number: 7808614
    Abstract: An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.
    Type: Grant
    Filed: December 19, 2008
    Date of Patent: October 5, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Carlo Cornelis Maria Luijten, Sjoerd Nicolaas Lambertus Donders, Nicolaas Rudolf Kemper, Martinus Hendrickus Antonius Leenders, Erik Roelof Loopstra, Bob Streefkerk, Marcel Beckers, Herman Boom, Richard Moerman
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100245791
    Abstract: Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.
    Type: Application
    Filed: June 11, 2010
    Publication date: September 30, 2010
    Inventors: Johannes Henricus Wilhelmus JACOBS, Igor Petrus Maria Bouchoms, Nicolaas Rudolf Kemper, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Joost Jeroen Ottens, Martinus Cornelis Maria Verhagen, Yücel Kök, Johannes Van Es, Herman Boom, Fraciscus Johannes Joseph Janssen
  • Lithographic apparatus and device manufacturing method having liquid evaporation control
    Patent number: 7804575
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
    Type: Grant
    Filed: August 17, 2005
    Date of Patent: September 28, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
  • Lithographic apparatus and device manufacturing method
    Patent number: 7751027
    Abstract: Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.
    Type: Grant
    Filed: June 16, 2006
    Date of Patent: July 6, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Henricus Wilhelmus Jacobs, Igor Petrus Maria Bouchoms, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Joost Jeroen Ottens, Martinus Cornelis Maria Verhagen, Yücel Kök, Johannes Van Es, Herman Boom, Franciscus Johannes Joseph Janssen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090207397
    Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
    Type: Application
    Filed: March 26, 2009
    Publication date: August 20, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090153823
    Abstract: An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.
    Type: Application
    Filed: December 19, 2008
    Publication date: June 18, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Carlo Cornelis Maria LUIJTEN, Sjoerd Nicolaas Lambertus Donders, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Bob Streefkerk, Marcel Beckers, Herman Boom, Richard Moerman
  • Lithographic apparatus and device manufacturing method
    Patent number: 7528929
    Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
    Type: Grant
    Filed: November 12, 2004
    Date of Patent: May 5, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
  • Lithographic apparatus and device manufacturing method
    Patent number: 7522261
    Abstract: An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.
    Type: Grant
    Filed: September 24, 2004
    Date of Patent: April 21, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Carlo Cornelis Maria Luijten, Sjoerd Nicolaas Lambertus Donders, Nicolaas Rudolf Kemper, Martinus Hendrickus Antonius Leenders, Erik Roelof Loopstra, Bob Streefkerk, Marcel Beckers, Herman Boom, Richard Moerman
  • Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle
    Publication number: 20080137049
    Abstract: A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.
    Type: Application
    Filed: February 5, 2008
    Publication date: June 12, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Christiaan Maria Jasper, Marcel Koenraad Marie Baggen, Richard Joseph Bruls, Orlando Serapio Cicilia, Hendrikus Alphonsus Ludovicus Van Dijck, Gerardus Carolus Johannus Hofmans, Albert Johannes Maria Jansen, Carlo Cornelis Maria Luijten, Willem Richard Pongers, Martijn Gerard Dominique Wehrens, Tammo Uitterdijk, Herman Boom, Marcel Johannes Louis Marie Demarteau
  • Liquid filled lens element, lithographic apparatus comprising such an element and device manufacturing method
    Publication number: 20080002168
    Abstract: A lens element, for use in a projection system, includes a concave side. The lens element further includes a membrane and a nozzle, the membrane at least covering the concave side of the lens element. The nozzle is arranged for supplying and/or removing a liquid and/or a gas in between the concave side and the membrane.
    Type: Application
    Filed: June 30, 2006
    Publication date: January 3, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Herman Boom, Borgert Kruizinga, Martinus Hendrikus Antonius Leenders, Johannes Catharinus Hubertus Mulkens, Huibert Visser, Peter Julian Pollard
  • Lithographic apparatus and device manufacturing method
    Publication number: 20070070315
    Abstract: Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.
    Type: Application
    Filed: June 16, 2006
    Publication date: March 29, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Jacobs, Igor Bouchoms, Nicolaas Kate, Nicolaas Kemper, Martinus Leenders, Erik Loopstra, Joost Ottens, Martinus Verhagen, Yucel Kok, Johannes Van Es, Herman Boom, Franciscus Janssen