Patents by Inventor Herman C. G. D. C. Meynen

Herman C. G. D. C. Meynen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD OF PREPARING A PATTERNED FILM WITH A DEVELOPING SOLVENT
    Publication number: 20120256303
    Abstract: A method of preparing a patterned film on a substrate includes applying a silicone composition onto a substrate to form a film of the silicone composition. A portion of the film is exposed to radiation to produce a partially exposed film having an exposed region and a non-exposed region. The partially exposed film is heated for a sufficient amount of time and at a sufficient temperature to substantially insolubilize the exposed region in a developing solvent that includes a siloxane component. The non-exposed region of the partially exposed film is removed with the developing solvent to reveal a film-free region on the substrate and to form the patterned film including the exposed region that remains on the substrate. The film-free regions is substantially free of residual silicone due to the presence of the siloxane component in the developing solvent.
    Type: Application
    Filed: June 12, 2012
    Publication date: October 11, 2012
    Inventors: Herman C.G.D.C. MEYNEN, Brian HARKNESS
  • Method of preparing a patterned film with a developing solvent
    Patent number: 8227181
    Abstract: A method of preparing a patterned film on a substrate includes applying a silicone composition onto a substrate to form a film of the silicone composition. A portion of the film is exposed to radiation to produce a partially exposed film having an exposed region and a non-exposed region. The partially exposed film is heated for a sufficient amount of time and at a sufficient temperature to substantially insolubilize the exposed region in a developing solvent that includes a siloxane component. The non-exposed region of the partially exposed film is removed with the developing solvent to reveal a film-free region on the substrate and to form the patterned film including the exposed region that remains on the substrate. The film-free regions is substantially free of residual silicone due to the presence of the siloxane component in the developing solvent.
    Type: Grant
    Filed: August 8, 2007
    Date of Patent: July 24, 2012
    Assignee: Dow Corning Corporation
    Inventors: Herman C. G. D. C. Meynen, Brian Harkness
  • Method of Preparing A Patterned Film With A Developing Solvent
    Publication number: 20100178472
    Abstract: A method of preparing a patterned film on a substrate includes applying a silicone composition onto a substrate to form a film of the silicone composition. A portion of the film is exposed to radiation to produce a partially exposed film having an exposed region and a non-exposed region. The partially exposed film is heated for a sufficient amount of time and at a sufficient temperature to substantially insolubilize the exposed region in a developing solvent that includes a siloxane component. The non-exposed region of the partially exposed film is removed with the developing solvent to reveal a film-free region on the substrate and to form the patterned film including the exposed region that remains on the substrate. The film-free regions is substantially free of residual silicone due to the presence of the siloxane component in the developing solvent.
    Type: Application
    Filed: August 8, 2007
    Publication date: July 15, 2010
    Inventors: Herman C.G.D.C. Meynen, Brian Harkness