Abstract: A universal clamping assembly for a key duplicating machine is described. The clamping assembly comprises a housing having a pair of opposed flat guide rail support surfaces and a sliding tip clamp is guidingly displaceable along each of the guide rail support surfaces and are urged against the tip of the key and key blank blades which are positioned on the guide rails. A pivoting clamp is displaceably engageable on a forward top edge of the respective key blades to apply a downward force on the key blades to ensure that the lower edge of the key blades is firmly resting against the guide rail support surfaces. A pair of cam operated side clamps is actuable to further clamp the blade on their sides at two distinct areas. The universal clamping assembly is capable of accommodating different key and key blank lengths, widths and thicknesses. The method of clamping the key and key blank is also described.

Abstract: A universal clamping assembly for a key duplicating machine is described. The clamping assembly comprises a housing having a pair of opposed flat guide rail support surfaces and a sliding tip clamp is guidingly displaceable along each of the guide rail support surfaces and are urged against the tip of the key and key blank blades which are positioned on the guide rails. A pivoting clamp is displaceably engageable on a forward top edge of the respective key blades to apply a downward force on the key blades to ensure that the lower edge of the key blades is firmly resting against the guide rail support surfaces. A pair of cam operated side clamps is actuable to further clamp the blade on their sides at two distinct areas. The universal clamping assembly is capable of accommodating different key and key blank lengths, widths and thicknesses. The method of clamping the key and key blank is also described.

Abstract: A universal clamping assembly for a key duplicating machine is described. The clamping assembly comprises a housing having a pair of opposed flat guide rail support surfaces and a sliding tip clamp is guidingly displaceable along each of the guide rail support surfaces and are urged against the tip of the key and key blank blades which are positioned on the guide rails. A pivoting clamp is displaceably engageable on a forward top edge of the respective key blades to apply a downward force on the key blades to ensure that the lower edge of the key blades is firmly resting against the guide rail support surfaces. A pair of cam operated side clamps is actuable to further clamp the blade on their sides at two distinct areas. The universal clamping assembly is capable of accommodating different key and key blank lengths, widths and thicknesses. The method of clamping the key and key blank is also described.

Abstract: A universal clamping assembly for a key duplicating machine is described. The clamping assembly comprises a housing having a pair of opposed flat guide rail support surfaces and a sliding tip clamp is guidingly displaceable along each of the guide rail support surfaces and are urged against the tip of the key and key blank blades which are positioned on the guide rails. A pivoting clamp is displaceably engageable on a forward top edge of the respective key blades to apply a downward force on the key blades to ensure that the lower edge of the key blades is firmly resting against the guide rail support surfaces. A pair of cam operated side clamps is actuable to further clamp the blade on their sides at two distinct areas. The universal clamping assembly is capable of accommodating different key and key blank lengths, widths and thicknesses. The method of clamping the key and key blank is also described.

Abstract: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.

Abstract: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.

Abstract: To enable high acceleration and high moving speed of a pattern support or a substrate table of a lithographic apparatus, one of the pattern support and the substrate table is supported by an actuator for relatively large displacements, whereas an actuator for accurately positioning is omitted. The other one of the pattern support and the substrate table is supported by an actuator assembly including an actuator for accurate positioning and an actuator for relatively large displacements. An alignment accuracy of a patterning device and a substrate is achieved by providing a control system that is adapted to position the other one of the pattern support and the substrate table such that a positioning error of the one of the pattern support and the substrate table is compensated by the positioning of the other one.

Abstract: A marine engine lower unit which contains the gear housing and skeg blade is exposed to damage below the water line due to structures striking the skeg. The Skeg-Boot is a component that totally encapsulates the skeg blade unit from the lower gear housing to the lower edge on the existing skeg unit. The component is a permanent preventative, permanent repair device and a component that enhances control performance and the aesthetic appearance of the marine engine. It has the capabilities of fitting a majority of marine engine sizes and styles. The Skeg-Boot requires no hardware fasteners to install and are not recommended for the component. The component has a dual purpose of also fitting on the lower units horizontal planes as a lift wing device that fits both sides, left to right, to further enhance engine control and performance.

Abstract: A planar motor is controlled by supplying a three-phase alternating current to a coil assembly. Each phase is supplied to one of three coils. The coils are positioned in a magnetic field generated by a magnet plate having alternating magnet poles at its surface for generating an alternating magnetic field. In operation, the phase of each current flowing through each coil determines the direction of a force generated due to the current in the magnetic field. For correct operation, the phase angle of each current is to be adapted to the local direction of the magnetic field by determining a commutation-offset angle. The commutation-offset angle is determined by generating a force in an unknown direction and varying the commutation-angle, and determining when the generated force is directed perpendicular to the magnet plate, while ensuring that the generated force does not exceed a horizontal friction force.

Abstract: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.

Abstract: A lithographic apparatus for immersion lithography is described in which a compensation controller controls actuators to apply forces to the substrate equal in magnitude and opposite in direction to forces which are applied to the substrate by a liquid supply system which supplies liquid between the projection system and the substrate.

Abstract: A lithographic projection apparatus wherein a liquid supply system provides a space between a projection system and a substrate with liquid. The liquid supply system comprises a member. A liquid seal is formed between the member and the substrate by a flow of liquid. In an embodiment, the liquid seal is formed by a flow of liquid from an inlet to an outlet of the member.