Patents by Inventor Herman Gene Hockenhull

Herman Gene Hockenhull has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5874368
    Abstract: A process for the low pressure chemical vapor deposition of silicon nitride from ammonia and a silane of the formula: (t-C.sub.4 H.sub.9 NH).sub.2 SiH.sub.2 provides improved properties of the resulting film for use in the semiconductor industry.
    Type: Grant
    Filed: October 2, 1997
    Date of Patent: February 23, 1999
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Ravi Kumar Laxman, David Allen Roberts, Arthur Kenneth Hochberg, Herman Gene Hockenhull, Felicia Diane Kaminsky