Patents by Inventor Hermann Bieg

Hermann Bieg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10663873
    Abstract: A mirror arrangement, in particular for a microlithographic projection exposure apparatus, includes at least one mirror element bearing a mirror surface provided for reflecting electromagnetic radiation, at least one carrier element including a head section, which is provided for receiving at least one mirror element, and also a seat section. The arrangement further includes a mount arrangement, for receiving the at least one carrier element. At least one insertion opening is in the mount arrangement. The seat section of the carrier element plunges into the insertion opening. In addition, the arrangement includes a channel device for guiding a heat transfer medium is formed in the mount arrangement in the region surrounding the seat section. A method for dissipating heat is provided.
    Type: Grant
    Filed: December 29, 2016
    Date of Patent: May 26, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Willi Heintel, Hermann Bieg
  • Patent number: 10606179
    Abstract: A projection exposure apparatus for semiconductor lithography has a mirror arrangement that is exposed to thermal loads in operation. The mirror arrangement includes a mirror carrier having an optically active surface arranged on a top surface of the mirror carrier. A cooling system is integrated into the mirror carrier. The cooling system has cooling lines through which a cooling fluid circulates. The cooling system is designed so that the thermal load introduced into the mirror carrier via the optically active surface is dissipated at least partially into a rear region remote from the top surface of the mirror carrier.
    Type: Grant
    Filed: March 28, 2019
    Date of Patent: March 31, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Hermann Bieg
  • Publication number: 20190219935
    Abstract: A projection exposure apparatus for semiconductor lithography has a mirror arrangement that is exposed to thermal loads in operation. The mirror arrangement includes a mirror carrier having an optically active surface arranged on a top surface of the mirror carrier. A cooling system is integrated into the mirror carrier. The cooling system has cooling lines through which a cooling fluid circulates. The cooling system is designed so that the thermal load introduced into the mirror carrier via the optically active surface is dissipated at least partially into a rear region remote from the top surface of the mirror carrier.
    Type: Application
    Filed: March 28, 2019
    Publication date: July 18, 2019
    Inventor: Hermann Bieg
  • Patent number: 10139733
    Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
    Type: Grant
    Filed: March 3, 2016
    Date of Patent: November 27, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hermann Bieg, Marcus Will, Thomas Bischoff, Yim-Bun Patrick Kwan, Uy-Liem Nguyen, Stefan Xalter, Michael Muehlbeyer
  • Publication number: 20170108788
    Abstract: A mirror arrangement, in particular for a microlithographic projection exposure apparatus, includes at least one mirror element bearing a mirror surface provided for reflecting electromagnetic radiation, at least one carrier element including a head section, which is provided for receiving at least one mirror element, and also a seat section. The arrangement further includes a mount arrangement, for receiving the at least one carrier element. At least one insertion opening is in the mount arrangement. The seat section of the carrier element plunges into the insertion opening. In addition, the arrangement includes a channel device for guiding a heat transfer medium is formed in the mount arrangement in the region surrounding the seat section. A method for dissipating heat is provided.
    Type: Application
    Filed: December 29, 2016
    Publication date: April 20, 2017
    Inventors: Willi Heintel, Hermann Bieg
  • Publication number: 20160282724
    Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
    Type: Application
    Filed: March 3, 2016
    Publication date: September 29, 2016
    Inventors: Hermann Bieg, Marcus Will, Thomas Bischoff, Yim-Bun Patrick Kwan, Uy-Liem Nguyen, Stefan Xalter, Michael Muehlbeyer
  • Patent number: 9341955
    Abstract: An optical module includes an aperture device and a support structure supporting the aperture device. The aperture device defines an aperture edge and an aperture plane. The aperture edge is adapted to define a geometry of a light beam passing the aperture device along an optical axis. The support structure is adapted to hold the aperture device in a defined manner when the aperture plane is inclined with respect to a horizontal plane. A temperature distribution prevails within the aperture device and at least one of the aperture device and the support structure is adapted to maintain at least one of a relative position of the aperture edge with respect to the optical axis and a geometry of the aperture edge substantially unaltered upon an introduction of a thermal energy into the aperture device, where the thermal energy being adapted to cause an alteration in the temperature distribution.
    Type: Grant
    Filed: February 13, 2014
    Date of Patent: May 17, 2016
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hermann Bieg, Uy-Liem Nguyen
  • Publication number: 20140160456
    Abstract: An optical module includes an aperture device and a support structure supporting the aperture device. The aperture device defines an aperture edge and an aperture plane. The aperture edge is adapted to define a geometry of a light beam passing the aperture device along an optical axis. The support structure is adapted to hold the aperture device in a defined manner when the aperture plane is inclined with respect to a horizontal plane. A temperature distribution prevails within the aperture device and at least one of the aperture device and the support structure is adapted to maintain at least one of a relative position of the aperture edge with respect to the optical axis and a geometry of the aperture edge substantially unaltered upon an introduction of a thermal energy into the aperture device, where the thermal energy being adapted to cause an alteration in the temperature distribution.
    Type: Application
    Filed: February 13, 2014
    Publication date: June 12, 2014
    Applicant: Carl Zeiss SMT GmbH
    Inventors: Hermann Bieg, Uy-Liem Nguyen
  • Patent number: 8687169
    Abstract: An optical module includes an aperture device and a support structure supporting the aperture device. The aperture device defines an aperture edge and an aperture plane. The aperture edge is adapted to define a geometry of a light beam passing the aperture device along an optical axis. The support structure is adapted to hold the aperture device in a defined manner when the aperture plane is inclined with respect to a horizontal plane. A temperature distribution prevails within the aperture device and at least one of the aperture device and the support structure is adapted to maintain at least one of a relative position of the aperture edge with respect to the optical axis and a geometry of the aperture edge substantially unaltered upon an introduction of a thermal energy into the aperture device, where the thermal energy being adapted to cause an alteration in the temperature distribution.
    Type: Grant
    Filed: September 30, 2010
    Date of Patent: April 1, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hermann Bieg, Uy-Liem Nguyen
  • Patent number: 8570676
    Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.
    Type: Grant
    Filed: March 11, 2011
    Date of Patent: October 29, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen
  • Publication number: 20120075611
    Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
    Type: Application
    Filed: November 30, 2011
    Publication date: March 29, 2012
    Applicant: Carl Zeiss SMT GmbH
    Inventors: Hermann Bieg, Thomas Bischoff, Uy-Liem Nguyen, Stefan Xalter, Marcus Will, Yim-Bun Patrick Kwan, Michael Muehlbeyer
  • Patent number: 8089707
    Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
    Type: Grant
    Filed: February 4, 2010
    Date of Patent: January 3, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hermann Bieg, Marcus Will, Thomas Bischoff, Yim-Bun Patrick Kwan, Uy-Liem Nguyen, Stefan Xalter, Michael Muehlbeyer
  • Patent number: 8009343
    Abstract: An optical imaging device (PL), in particular an objective for semiconductor lithography, is provided with at least one system diaphragm. The system diaphragm comprises a multiplicity of mobile plates, which are rotatably mounted. The plates have a spherical curvature.
    Type: Grant
    Filed: July 2, 2004
    Date of Patent: August 30, 2011
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Bernhard Gellrich, Thomas Bischoff, Hermann Bieg, Martin Huber, Francois Henzelin, Gerhard Szekely, Uy-Liem Nguyen, Martin E. Humphries
  • Publication number: 20110181857
    Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.
    Type: Application
    Filed: March 11, 2011
    Publication date: July 28, 2011
    Applicant: CARL ZEISS SMT AG
    Inventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen
  • Patent number: 7929227
    Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.
    Type: Grant
    Filed: July 2, 2010
    Date of Patent: April 19, 2011
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen
  • Publication number: 20110063595
    Abstract: An optical module includes an aperture device and a support structure supporting the aperture device. The aperture device defines an aperture edge and an aperture plane. The aperture edge is adapted to define a geometry of a light beam passing the aperture device along an optical axis. The support structure is adapted to hold the aperture device in a defined manner when the aperture plane is inclined with respect to a horizontal plane. A temperature distribution prevails within the aperture device and at least one of the aperture device and the support structure is adapted to maintain at least one of a relative position of the aperture edge with respect to the optical axis and a geometry of the aperture edge substantially unaltered upon an introduction of a thermal energy into the aperture device, where the thermal energy being adapted to cause an alteration in the temperature distribution.
    Type: Application
    Filed: September 30, 2010
    Publication date: March 17, 2011
    Applicant: CARL ZEISS SMT AG
    Inventors: Hermann Bieg, Uy-Liem Nguyen
  • Publication number: 20100271607
    Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.
    Type: Application
    Filed: July 2, 2010
    Publication date: October 28, 2010
    Applicant: CARL ZEISS SMT AG
    Inventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen
  • Patent number: 7791826
    Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.
    Type: Grant
    Filed: January 26, 2006
    Date of Patent: September 7, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen
  • Patent number: 7763870
    Abstract: An optical system for radiation in the EUV wavelength range, in particular a projection exposure apparatus, having at least one vacuum vessel, including: at least one EUV-reflective optical element arranged in an optical path, and a holder which includes at least one sample element, the sample element having an optical surface which is exposed to incident EUV-radiation outside of the optical path, the sample element being sensitive to chemical alterations under influence of the incident EUV-radiation which also affect the optical element. The optical system further includes at least one detection unit for online detection of the contamination status of the sample element during exposure of the sample element to the incident EUV-radiation.
    Type: Grant
    Filed: September 14, 2007
    Date of Patent: July 27, 2010
    Assignees: Carl Zeiss SMT AG, ASML Netherlands B.V.
    Inventors: Dirk Heinrich Ehm, Hermann Bieg, Hans-Juergen Mann, Stephan Muellender, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn
  • Publication number: 20100134777
    Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
    Type: Application
    Filed: February 4, 2010
    Publication date: June 3, 2010
    Applicant: CARL ZEISS SMT AG
    Inventors: Hermann Bieg, Thomas Bischoff, Uy-Liem Nguyen, Stefan Xalter, Marcus Will, Yim-Bun Patrick Kwan, Michael Muehlbeyer