Abstract: Described is a process for the production of a zeolitic material having an LEV-type framework structure comprising YO2 and optionally comprising X2O3, wherein said process comprises (1) preparing a mixture comprising one or more sources for YO2, one or more solvents, and optionally comprising seed crystals; and (2) crystallizing the mixture obtained in step (1); wherein Y is a tetravalent element, and X is a trivalent element, and wherein the mixture crystallized in step (2) contains 3 wt.-% or less of one or more metals M based on 100 wt-% of YO2, preferably 1 wt.-% or less, more preferably 0.5 wt.-% or less, more preferably 0.1 wt.-% or less, more preferably 0.05 wt.-% or less, more preferably 0.01 wt.-% or less, more preferably 0.005 wt.-% or less, more preferably 0.001 wt.-% or less, more preferably 0.0005 wt.-% or less, more preferably 0.0001 wt.-% or less of one or more metals M based on 100 wt.

Abstract: The present invention relates to template-free clathraslls whose framework comprises essentially SO2, wherein the crystals of the ciathrasils have the platelet-like morphology of a sheet silicate. The present invention further relates to a process for preparing these template-free clathrasils and also to their use as absorbent, as seed crystals for the synthesis of ciathrasil membranes of the same zeolite type and in the form of dense layers which function as gas separation membranes having a molecular sieving action.

Abstract: A sheet silicate, a framework silicate, and a process of producing the same.

Abstract: The present invention relates to a tectosilicate having an X-ray diffraction pattern in which at least the following reflections occur: Intensity (%) Diffraction angle 2?/° [Cu K(alpha 1)] 100 ?9.8-10.2 24-34 11.0-11.4 ?9-19 15.5-15.9 12-22 19.4-19.6 19-29 19.6-19.8 100% relating to the intensity of the maximum peak in the X-ray diffraction pattern.

Abstract: The present invention relates to a process for the preparation of a silicate comprising at least silicon and oxygen, comprising (1) mixing of silicon dioxide and/or of a silicon dioxide precursor with an aqueous solution comprising at least one tetraalkylammonium compound comprising R1R2R3R4N+ and at least one base, wherein R1 and R2 are methyl and both R3 and R4 are n-propyl; (2) heating of the colloidal solution obtained according to (1) to a temperature in the range of from greater than the boiling point of the colloidal solution under the chosen pressure to 180° C. at atmospheric pressure to give a suspension comprising at least one silicate, wherein the silicate comprising at least silicon and oxygen is added as a crystallization auxiliary in (1).

Abstract: The present invention relates to a process for preparing at least one sheet silicate comprising Ga and/or Zn, and based thereon, a framework silicate, preferably of the RRO structure type, to the sheet silicate and framework silicate themselves and to the uses of the silicates, especially of the framework silicate, preferably as catalysts.

Abstract: The invention relates to a method for the hydrothermal production of a microporous membrane. According to said method, a colloidal solution comprising zeolite frameworks with 4-ring, 6-ring, and/or 8-ring pores which are provided as crystallites whose size ranges from 2 to 25 nm is applied to a porous substrate with the aid of a wet application technique. The applied layer is contacted with a hydrothermal liquid, and a nanocrystalline, microporous zeolite layer having an average pore diameter of 0.2 to 0.45 nm is synthesized at temperatures ranging between 50 and 250° C. and at an autogenous pressure. Such a microporous membrane comprising a porous substrate and at least one nanocrystalline zeolite layer that is disposed thereupon and has an average pore diameter of 0.2 to 0.45 nm is advantageously suitable for use as a separating device for gas phase separation, making it possible to separate particularly N2O2, N2/CO2, H2/CO2, or CO2/CH4 gas mixtures.

Abstract: The present invention relates to a process for the preparation of a silicate comprising at least silicon and oxygen, comprising (1) mixing of silicon dioxide and/or of a silicon dioxide precursor with an aqueous solution comprising at least one tetraalkylammonium compound comprising R1R2R3R4N+ and at least one base, wherein R1 and R2 are methyl and both R3 and R4 are n-propyl; (2) heating of the colloidal solution obtained according to (1) to a temperature in the range of from greater than the boiling point of the colloidal solution under the chosen pressure to 180° C. at atmospheric pressure to give a suspension comprising at least one silicate, wherein the silicate comprising at least silicon and oxygen is added as a crystallization auxiliary in (1).

Abstract: The present invention relates to a tectosilicate having an X-ray diffraction pattern in which at least the following reflections occur: Intensity (%) Diffraction angle 2?/° [Cu K(alpha 1)] 100 ?9.8-10.2 24-34 11.0-11.4 ?9-19 15.5-15.9 12-22 19.4-19.6 19-29 19.6-19.8 100% relating to the intensity of the maximum peak in the X-ray diffraction pattern.

Abstract: A crystalline solid comprising a boro-, alumino-, gallo-, titano-, vanado- or zincosilicate or a mixture thereof having the RUB-13 structure, which has a monoclinic space group and exhibits an X-ray diffraction pattern in which at least the following reflections (hkl) occur at the stated diffraction angles:______________________________________ h k l Intensity I/I.sub.o d-spacings (d.sub.hkl) ______________________________________ 0 2 0 very strong 10.26 0 1 1 very strong 9.79 -1 3 1 weak 4.98 0 4 1 medium 4.53 -2 0 1 medium 4.52 -1 1 2 medium 4.46 ______________________________________and their uses.