Abstract: A scanning system can include an illuminator, configured to produce an illuminating beam, and a fixation unit, configured to mechanically support a sample to be measured within the illuminating beam. The illuminating beam can reflect off the sample to produce reflected light. The system can further include a sensor, positioned angularly away from the illuminator, configured to receive the reflected light. The illuminating beam can include a wavelength spectrum having a FWHM less than 100 nm. In some examples, the fixation unit can be positioned based, in part, on a position of the illuminator and the sensor. In some examples, the sensor can include at least one imaging element that produces an image of the sample. In some examples, the illuminating beam can include a calibration pattern. In some examples, the illuminating beam and the reflected light can be angularly separated between ten degrees and fifteen degrees.

Abstract: A scanning system can include an illuminator, configured to produce an illuminating beam, and a fixation unit, configured to mechanically support a sample to be measured within the illuminating beam. The illuminating beam can reflect off the sample to produce reflected light. The system can further include a sensor, positioned angularly away from the illuminator, configured to receive the reflected light. The illuminating beam can include a wavelength spectrum having a FWHM less than 100 nm. In some examples, the fixation unit can be positioned based, in part, on a position of the illuminator and the sensor. In some examples, the sensor can include at least one imaging element that produces an image of the sample. In some examples, the illuminating beam can include a calibration pattern. In some examples, the illuminating beam and the reflected light can be angularly separated between ten degrees and fifteen degrees.

Abstract: A scanning system can include an illuminator, configured to produce an illuminating beam, and a fixation unit, configured to mechanically support a sample to be measured within the illuminating beam. The illuminating beam can reflect off the sample to produce reflected light. The system can further include a sensor, positioned angularly away from the illuminator, configured to receive the reflected light. The illuminating beam can include a wavelength spectrum having a FWHM less than 100 nm. In some examples, the fixation unit can be positioned based, in part, on a position of the illuminator and the sensor. In some examples, the sensor can include at least one imaging element that produces an image of the sample. In some examples, the illuminating beam can include a calibration pattern. In some examples, the illuminating beam and the reflected light can be angularly separated between ten degrees and fifteen degrees.