Patents by Inventor Hermen Pen

Hermen Pen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of calibrating a lithographic apparatus and device manufacturing method
    Publication number: 20070058152
    Abstract: In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using normal and reversed meanders. The two data sets can then be used to eliminate effects due to wafer cooling.
    Type: Application
    Filed: September 12, 2005
    Publication date: March 15, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Koen Jacobus Zaal, Antonius De Kort, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Hermen Pen
  • Lithographic method
    Publication number: 20070052940
    Abstract: In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using, for example, normal and reversed meanders. The two data sets can then be used to eliminate effects due to substrate cooling.
    Type: Application
    Filed: September 6, 2006
    Publication date: March 8, 2007
    Applicant: ASML Netherlands B. V.
    Inventors: Koen Jacobus Zaal, Antonius De Kort, Frederik De Jong, Koen Goorman, Boris Menchtchikov, Hermen Pen