Patents by Inventor HERRE TJERK STEENSTRA

HERRE TJERK STEENSTRA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SENSOR SUBSTRATE, APPARATUS, AND METHOD
    Publication number: 20250029811
    Abstract: The embodiments of the present disclosure provide a sensor substrate for a charged particle optical device and/or a charged particle assessment apparatus, the sensor substrate comprising: at least one distance sensor configured to generate a measurement signal representative of a distance between the distance sensor and a facing surface of a target; and at least one charged particle optical component.
    Type: Application
    Filed: October 4, 2024
    Publication date: January 23, 2025
    Applicant: ASML Netherlands B.V.
    Inventors: Arthur Eduard OVERLACK, Ronald KROON, Richard Michel VAN LEEUWEN, Andre Luis RODRIGUES MANSANO, Herre Tjerk STEENSTRA, Erwin Robert Alexander VISSER
  • DETECTOR INSPECTION DEVICE, DETECTOR ASSEMBLY, DETECTOR ARRAY, APPARATUS, AND METHOD
    Publication number: 20240339291
    Abstract: The embodiments of the present disclosure provides a detector inspection device for interrogating at least part of a detector comprised in a charged particle-optical assessment apparatus, the detector inspection device comprising: a coupler configured to be positioned proximate to a detector element of a detector; and a device controller configured to apply a stimulating signal to the coupler to stimulate a response signal in the detector for interrogating at least part of the detector.
    Type: Application
    Filed: June 13, 2024
    Publication date: October 10, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Herre Tjerk STEENSTRA, Marco Jan-Jaco WIELAND, Alexius Otto LOOIJE, Richard Michel VAN LEEUWEN, Erwin Robert Alexander VISSER, Andre Luis RODRIGUES MANSANO, Gretchen Renée VAN T VEEN, Duije SEEKLES, Roelof Albert MARISSEN
  • Control system and method for lithography apparatus
    Patent number: 10096450
    Abstract: A method for initializing a first operation in a first module at a first start time value in a first time base, the method comprising generating a clock signal, generating a second time base in the first module based on the clock signal, determining a second sync value in the second time base, determining a first sync value in the first time base corresponding to a second sync value in the second time base, determining a start trigger value in the second time base based on the first sync value and the start time value in the first time base, and initializing the first operation in the first module based on the start trigger value and a current value of the second time base in the first module.
    Type: Grant
    Filed: December 28, 2015
    Date of Patent: October 9, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventor: Herre Tjerk Steenstra
  • CONTROL SYSTEM AND METHOD FOR LITHOGRAPHY APPARATUS
    Publication number: 20170186582
    Abstract: A method for initializing a first operation in a first module at a first start time value in a first time base, the method comprising generating a clock signal, generating a second time base in the first module based on the clock signal, determining a second sync value in the second time base, determining a first sync value in the first time base corresponding to a second sync value in the second time base, determining a start trigger value in the second time base based on the first sync value and the start time value in the first time base, and initializing the first operation in the first module based on the start trigger value and a current value of the second time base in the first module.
    Type: Application
    Filed: December 28, 2015
    Publication date: June 29, 2017
    Inventor: HERRE TJERK STEENSTRA