Abstract: A method of distributing an electrically insulating liquefied gas mixture to high-voltage electrical equipment from a storage means containing an insulating gas mixture, including: heating the insulating gas mixture to a temperature such that the contents of the storage means are a homogeneous fluid; and withdrawing the insulating mixture resulting from step a) to fill high-voltage electrical equipment by raising the temperature of the mixture resulting from step a), wherein, during step b), a set value for regulation is applied at variable pressure, calculated in real time based on weighing the storage means, when the change in the set value of pressure is less than 0.2 bar per 1 kg/m3 of change in density, and then a set value for regulation is applied at constant temperature until the storage means is emptied of its content.

Abstract: The invention relates to a facility for supplying a working gas provided with an insulating chamber (3) and a door (3?) that is pivotable about a vertical axis in order to allow the opening and the closing of said chamber (3), including a device (9) for distributing a working gas having a monitoring and command unit (35, 35A) including means (45) for controlling the monitoring and command unit (35, 35A) which can be actuated by an operator of the distribution device (9, 9A), said controlling means (45) including a touchscreen (47) having command regions (60, 61, 62, 63, 64, 65, 66, 67, 68) associated with monitoring corresponding tasks, characterised in that said touchscreen is attached to a housing (47A) built into the door (3?), said housing (47A) being capable of and designed to pivot about a vertical axis (Y).

Abstract: An apparatus and method for the treatment of gaseous effluents involving contact with a liquid may include a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, wherein the chamber allows a gas to be treated. The chamber may also release residual gases following treatment involving contact with the liquid. The apparatus may also include a turbine that includes one or more stages which ensure improved contact between the gas and the liquid, the upper part of the turbine being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, a sensor for measuring the pH of the liquid.

Abstract: The invention relates to an apparatus for the treatment of gaseous effluents, such as those originating from the production of semi-conductors involving contact with a liquid. The inventive apparatus consists of: a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, said chamber comprising means for introducing a gas to be treated and means for releasing residual gases following treatment involving contact with the liquid; turbine-type gas/liquid contacting means comprising one or more stages which ensure improved contact between the gas and the liquid, the upper part of said means being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, means for measuring the pH of the liquid.

Abstract: The invention relates to an apparatus for the treatment of gaseous effluents, such as those originating from the production of semi-conductors involving contact with a liquid. The inventive apparatus consists of: a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, said chamber comprising means for introducing a gas to be treated and means for releasing residual gases following treatment involving contact with the liquid; turbine-type gas/liquid contacting means comprising one or more stages which ensure improved contact between the gas and the liquid, the upper part of said means being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, means for measuring the pH of the liquid.

Abstract: The invention concerns a system for treating gases such as PFC or HFC with plasma, comprising: (6) pumping means (6) whereof the outlet is at a pressure substantially equal to atmospheric pressure, plasma generator (8), at the pump output, to produce a plasma at atmospheric pressure.

Abstract: The invention relates to a method for destroying effluents issuing from a reactor, the said effluents being transported through at least one pump towards plasma means capable of destroying at least certain bonds in the molecules of the PFC or HFC type between the fluorine and the other elements of these molecules of the PFC or HFC type, in order to generate first species which are then converted to second gaseous, liquid or solid species before interaction of these second species with dry or wet purifying means. According to the invention, at least one reducing agent is injected upstream and/or downstream of the plasma, but upstream of the purifying means, in order to react with the first species created.

Abstract: The invention relates to an apparatus for the treatment of gaseous effluents, such as those originating from the production of semi-conductors involving contact with a liquid. The inventive apparatus consists of: a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, said chamber comprising means for introducing a gas to be treated and means for releasing residual gases following treatment involving contact with the liquid; turbine-type gas/liquid contacting means comprising one or more stages which ensure improved contact between the gas and the liquid, the upper part of said means being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, means for measuring the pH of the liquid.

Abstract: The invention concerns a system for regulating the titer of a solution, which consists in adding in the solution a predetermined amount of a product contained in the solution in a time interval, called addition time interval, proportional to the product of the time coefficient D of degradation of said product in solution and to the total volume Vt of the solution at the time of the addition. The invention also concerns a device for controlling the regulation of the titer of a solution, said solution containing a product, comprising means (10) for controlling injection of a predetermined amount of said product into said solution according to a time interval, called addition time interval, proportional to the product of the time coefficient D of degradation of said product and to the total volume Vt of the solution at the time of addition.

Abstract: Process for the on-site purification of an aqueous hydrogen peroxide solution, in which the solution is made to pass through a resin bed capable, at least partially, of adsorbing or absorbing the impurities present in the solution. The hydrogen peroxide solution is injected into the resin bed and passes through the latter at an approximately linear velocity preferably of between 10 m/h and 50 m/h and more preferably between 10 m/h and 20 m/h, while the resin bed is kept substantially compacted for at least 50% of the time during which the solution is being purified by coming into contact with the said resin.

Abstract: A process for producing a high-purity liquid chemical is provided. A chemical gas is successively purified over first and second purification columns by passing, countercurrently, a scrubbing solution of initially deionized high-purity water through the first and second purification columns, or by passing, countercurrently, a first scrubbing solution of initially deionized high-purity water through the first column and a second scrubbing solution of initially deionized water through the second column. Each of the scrubbing solutions gradually becomes a spent scrubbing solution loaded with impurity. A high-purity chemical gas leaves the second purification column with a low content of metallic elements. The high-purity chemical gas is subsequently dissolved in a liquid in a dissolution column including a top and a bottom. The liquid at the bottom of the dissolution column is collected and continuously recirculated, and is enriched with purified chemical gas, thereby forming a high-purity liquid chemical.