Abstract: Plant for delivering a gas mixture to a silicon wafer doping unit comprising a source of a dopant gas (1), a source of a carrier gas (2), a mixer device (3) connected to the container of dopant gas (1) and to the source of carrier gas (2), a first flow regulator member (41) and a second flow regulator member (42) for regulating the flows of the dopant gas (1) and of the carrier gas (2) towards the mixer device (3), a control unit (5) for controlling the first and second flow regulator members (41, 42) so as to adjust the first flow rate setpoint (D1) and the second flow rate setpoint (D2) in proportions determined as a function of at least one target content (C1, C2) of dopant gas (1) and/or carrier gas (2) in the mixture, a buffer tank (7), a delivery line (6) for delivering the mixture to a doping unit (10) with a consumption flow rate (DC), at least one measurement sensor (8) for measuring a physical quantity, the variation of which is representative of a variation in the consumption flow rate (DC) and for

Abstract: A plant for delivering a gas mixture including a source of a first gas, a source of a second gas, a mixer device fluidically connected to the source of first gas and to the source of second gas. A first flow regulator member and a second flow regulator member, a control unit, a buffer tank, at least one measurement sensor configured to measure a physical quantity, the variation of which is representative of a variation in the consumption flow rate delivered by the delivery line and to provide a first measurement signal of said physical quantity.

Abstract: A method of distributing an electrically insulating liquefied gas mixture to high-voltage electrical equipment from a storage means containing an insulating gas mixture, including: heating the insulating gas mixture to a temperature such that the contents of the storage means are a homogeneous fluid; and withdrawing the insulating mixture resulting from step a) to fill high-voltage electrical equipment by raising the temperature of the mixture resulting from step a), wherein, during step b), a set value for regulation is applied at variable pressure, calculated in real time based on weighing the storage means, when the change in the set value of pressure is less than 0.2 bar per 1 kg/m3 of change in density, and then a set value for regulation is applied at constant temperature until the storage means is emptied of its content.

Abstract: The invention relates to a facility for supplying a working gas provided with an insulating chamber (3) and a door (3?) that is pivotable about a vertical axis in order to allow the opening and the closing of said chamber (3), including a device (9) for distributing a working gas having a monitoring and command unit (35, 35A) including means (45) for controlling the monitoring and command unit (35, 35A) which can be actuated by an operator of the distribution device (9, 9A), said controlling means (45) including a touchscreen (47) having command regions (60, 61, 62, 63, 64, 65, 66, 67, 68) associated with monitoring corresponding tasks, characterised in that said touchscreen is attached to a housing (47A) built into the door (3?), said housing (47A) being capable of and designed to pivot about a vertical axis (Y).

Abstract: A method of distributing an electrically insulating liquefied gas mixture to high-voltage electrical equipment from a storage means containing an insulating gas mixture, including: heating the insulating gas mixture to a temperature such that the contents of the storage means are a homogeneous fluid; and withdrawing the insulating mixture resulting from step a) to fill high-voltage electrical equipment by raising the temperature of the mixture resulting from step a), wherein, during step b), a set value for regulation is applied at variable pressure, calculated in real time based on weighing the storage means, when the change in the set value of pressure is less than 0.2 bar per 1 kg/m3 of change in density, and then a set value for regulation is applied at constant temperature until the storage means is emptied of its content.

Abstract: A facility for supplying a working gas, equipped with an isolation enclosure (3) and with a door (3?) pivotable about a vertical axis in order to enable said enclosure (3) to be opened and closed, comprising at least one source (5, 7) of a pressurized working gas, said source being arranged in the isolation enclosure (3), and comprising a device (9) for distributing a working gas, comprising a set of pipelines (15, 21, 23) linked to at least one working gas source (5, 7) and to at least one output pipeline (10, 10A) for routing the working gas to a consumer station (10B), functional components (25, 25A), in particular valves (27, 29, 27A, 29A) arranged in the pipelines (15, 21, 23) and used to regulate the flow of the working gas in said pipelines, and gas leak detectors (34, 34A), and a monitoring and control unit (35, 35A) comprising means (37) for communicating with said functional components (35, 35A), means (39) for monitoring tasks relating to said functional components (25, 25A), and means (45) for man

Abstract: An installation for supplying gas provided with an insulating chamber including a rear wall and two side wall as well as a door that pivots about a vertical axis in order to allow opening and closing of the chamber, the installation including two multifunctional blocks that house a fluid circuit and are attached to the rear wall inside the chamber.

Abstract: A gas distribution installation including a housing designed to receive at least one gas cylinder and having a gas input opening and a gas output opening; a system of gas ducts arranged in the housing to which the at least one gas cylinder is connected; a gas distribution system linked to the output opening allowing an equipment item to be supplied, and at least one communication port and a programmable logic controller, the logic controller being provided with a processor capable of processing data originating at least partly from a portable data storage and processing system distinct from the installation and wherein the data originating at least partly from a portable data storage and processing system distinct from the installation are used to manage control and/or maintenance parameters of the gas distribution system.

Abstract: An apparatus and method for the treatment of gaseous effluents involving contact with a liquid may include a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, wherein the chamber allows a gas to be treated. The chamber may also release residual gases following treatment involving contact with the liquid. The apparatus may also include a turbine that includes one or more stages which ensure improved contact between the gas and the liquid, the upper part of the turbine being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, a sensor for measuring the pH of the liquid.

Abstract: The invention relates to an apparatus for the treatment of gaseous effluents, such as those originating from the production of semi-conductors involving contact with a liquid. The inventive apparatus consists of: a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, said chamber comprising means for introducing a gas to be treated and means for releasing residual gases following treatment involving contact with the liquid; turbine-type gas/liquid contacting means comprising one or more stages which ensure improved contact between the gas and the liquid, the upper part of said means being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, means for measuring the pH of the liquid.

Abstract: The invention relates to an apparatus for the treatment of gaseous effluents, such as those originating from the production of semi-conductors involving contact with a liquid. The inventive apparatus consists of: a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, said chamber comprising means for introducing a gas to be treated and means for releasing residual gases following treatment involving contact with the liquid; turbine-type gas/liquid contacting means comprising one or more stages which ensure improved contact between the gas and the liquid, the upper part of said means being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, means for measuring the pH of the liquid.

Abstract: The invention concerns a system for treating gases such as PFC or HFC with plasma, comprising: (6) pumping means (6) whereof the outlet is at a pressure substantially equal to atmospheric pressure, plasma generator (8), at the pump output, to produce a plasma at atmospheric pressure.

Abstract: The invention relates to a method for destroying effluents issuing from a reactor, the said effluents being transported through at least one pump towards plasma means capable of destroying at least certain bonds in the molecules of the PFC or HFC type between the fluorine and the other elements of these molecules of the PFC or HFC type, in order to generate first species which are then converted to second gaseous, liquid or solid species before interaction of these second species with dry or wet purifying means. According to the invention, at least one reducing agent is injected upstream and/or downstream of the plasma, but upstream of the purifying means, in order to react with the first species created.

Abstract: The invention relates to a system for distributing chemical products in a factory producing flat screen semi-conductors or light-emitting diodes comprising means for storing said liquid products and means for the distribution and use thereof, wherein the liquid products are distributable from the storage means to the usage means by means of the distribution means.

Abstract: The invention relates to a method for the conversion of a gas or gas mixture and, in particular, a fluorinated gaseous effluent. According to the invention, at least one bond between two atoms of at least one molecule of the gas or gas mixture is broken under the influence of an electric and/or magnetic field to which the gas or gas mixture is subjected. The gas or gas mixture stream is injected through the electric and/or magnetic field in a non-rectilinear manner in order to increase the distance travelled by the gas molecules through the field and, in this way, increase the effectiveness of the conversion of the gas or gas mixture molecules.

Abstract: The invention relates to an apparatus for the treatment of gaseous effluents, such as those originating from the production of semi-conductors involving contact with a liquid. The inventive apparatus consists of: a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, said chamber comprising means for introducing a gas to be treated and means for releasing residual gases following treatment involving contact with the liquid; turbine-type gas/liquid contacting means comprising one or more stages which ensure improved contact between the gas and the liquid, the upper part of said means being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, means for measuring the pH of the liquid.

Abstract: The invention concerns a system for regulating the titer of a solution, which consists in adding in the solution a predetermined amount of a product contained in the solution in a time interval, called addition time interval, proportional to the product of the time coefficient D of degradation of said product in solution and to the total volume Vt of the solution at the time of the addition. The invention also concerns a device for controlling the regulation of the titer of a solution, said solution containing a product, comprising means (10) for controlling injection of a predetermined amount of said product into said solution according to a time interval, called addition time interval, proportional to the product of the time coefficient D of degradation of said product and to the total volume Vt of the solution at the time of addition.

Abstract: The invention concerns a system for treating gases such as PFC or HFC with plasma, comprising: (6) pumping means (6) thereof the outlet is at a pressure substantially equal to atmospheric pressure, means (8), at the pump output, to produce a plasmas at atmospheric pressure.

Abstract: Process for the on-site purification of an aqueous hydrogen peroxide solution, in which the solution is made to pass through a resin bed capable, at least partially, of adsorbing or absorbing the impurities present in the solution. The hydrogen peroxide solution is injected into the resin bed and passes through the latter at an approximately linear velocity preferably of between 10 m/h and 50 m/h and more preferably between 10 m/h and 20 m/h, while the resin bed is kept substantially compacted for at least 50% of the time during which the solution is being purified by coming into contact with the said resin.

Abstract: A process for producing a high-purity liquid chemical is provided. A chemical gas is successively purified over first and second purification columns by passing, countercurrently, a scrubbing solution of initially deionized high-purity water through the first and second purification columns, or by passing, countercurrently, a first scrubbing solution of initially deionized high-purity water through the first column and a second scrubbing solution of initially deionized water through the second column. Each of the scrubbing solutions gradually becomes a spent scrubbing solution loaded with impurity. A high-purity chemical gas leaves the second purification column with a low content of metallic elements. The high-purity chemical gas is subsequently dissolved in a liquid in a dissolution column including a top and a bottom. The liquid at the bottom of the dissolution column is collected and continuously recirculated, and is enriched with purified chemical gas, thereby forming a high-purity liquid chemical.