Abstract: Systems, methods, and/or processes for agricultural parameter determination are provided. One or more can include or use processing circuitry configured to: manage one or more land parcels for agricultural parameter optimization (such as soil organic carbon optimization); and determine one or more agricultural parameters of at least a portion of one land parcel (such as an alleyway between commodity crops) during a first time period without sampling the portion of the one land parcel. Systems, methods, and/or processes for increasing soil organic carbon are also provided.

Abstract: The invention relates to a device for introducing a carrier gas and liquid compounds or a liquid solution into an evaporation chamber, comprising a mixing chamber, including at least:—a first inlet for the admission of said compounds or said solution,—a second inlet for the admission of the carrier gas,—and an outlet connected to an inlet of an injector, so that a mixture of carrier gas and droplets of said compounds or of said solution is periodically injected, through a single injector outlet, into the evaporation chamber.

Abstract: The invention relates to a device for introducing a carrier gas and liquid compounds or a liquid solution into an evaporation chamber, comprising a mixing chamber, including at least:—a first inlet for the admission of said compounds or said solution,—a second inlet for the admission of the carrier gas,—and an outlet connected to an inlet of an injector, so that a mixture of carrier gas and droplets of said compounds or of said solution is periodically injected, through a single injector outlet, into the evaporation chamber.

Abstract: The invention relates to a device for introducing (1) a carrier gas (2) and liquid compounds (3) or a liquid solution into an evaporation chamber (4), comprising a mixing chamber (10), including at least: —a first inlet (8) for the admission of said compounds or said solution (3), —a second inlet (9) for the admission of the carrier gas (2), —and an outlet (13) connected to an inlet of an injector (14), so that a mixture of carrier gas and droplets of said compounds or of said solution is periodically injected, through a single injector outlet (14), into the evaporation chamber (4).

Abstract: A device for injecting into a chamber at least one precursor comprises at least one tank containing the precursor, means for keeping the tank at a higher pressure than that of the chamber, and at least one injector connected to the tank. It also comprises a device for measuring the mean flowrate, arranged between the tank and the injector and a mechanical low-pass filter arranged between the device for measuring the flowrate and the injector. The control circuit comprises outputs respectively connected to the tank and to the injector for controlling said pressure and/or the injection time and/or the injection frequency, in such a way as to periodically inject droplets of precursor into the chamber. The control circuit also comprises a regulation input connected to the output of the device for measuring the mean flowrate, in such a way as to control said pressure and/or the injection time and/or the injection frequency in order to keep the mean flowrate at a predetermined set-point.

Abstract: The invention relates to the deposition of thin silver films on various substrates, particularly superconductor substrates. The method consists of CVD deposition of silver on a substrate with the aid of a silver precursor solution. The silver precursor is an RCO2Ag silver carboxylate, wherein R is a linear or branched radical having 3-7 carbon atoms, used in the form of an organic liquid solution. The precursor concentration of the solution ranges from 0.01 to 0.6 mol/l. The organic liquid comprises an amine and/or a nitrile and, optionally, a solvent whose evaporation temperature is lower than the decomposition temperature of the precursor. The percentage by volume of the amine and/or nitrile in the organic liquid is more than 0.1%.

Abstract: The invention relates to a device for introducing (1) a carrier gas (2) and liquid compounds (3) or a liquid solution into an evaporation chamber (4), comprising a mixing chamber (10), including at least: —a first inlet (8) for the admission of said compounds or said solution (3), —a second inlet (9) for the admission of the carrier gas (2), —and an outlet (13) connected to an inlet of an injector (14), so that a mixture of carrier gas and droplets of said compounds or of said solution is periodically injected, through a single injector outlet (14), into the evaporation chamber (4).

Abstract: A device for evaporation of a solution based on solvent and compounds or solutes inside an enclosure comprises different evaporation zones separated by separating partitions into several distinct elementary chambers enabling fractionated evaporation via outlets generating a plurality of separate vapor flows specific to each constituent. The solution is injected into the first chamber subjected to the lowest temperature so as to impregnate a porous mobile element that passes through the different partitions, being successively in contact with said chambers heated to increasing temperatures. A neutral carrier gas is injected in the vicinity of the partitions for control of the pressure losses of the gas flows between the different chamber.

Abstract: The invention relates to the deposition of thin silver films on various substrates, particularly superconductor substrates. The method consists of CVD deposition of silver on a substrate with the aid of a silver precursor solution. The silver precursor is an RCO2Ag silver carboxylate, wherein R is a linear or branched radical having 3-7 carbon atoms, used in the form of an organic liquid solution. The precursor concentration of the solution ranges from 0.01 to 0.6 mol/l. The organic liquid comprises an amine and/or a nitrile and, optionally, a solvent whose evaporation temperature is lower than the decomposition temperature of the precursor. The percentage by volume of the amine and/or nitrile in the organic liquid is more than 0.1%.

Abstract: A device for evaporation of a solution based on solvent and compounds or solutes inside an enclosure comprises different evaporation zones separated by separating partitions into several distinct elementary chambers enabling fractionated evaporation via outlets generating a plurality of separate vapor flows specific to each constituent. The solution is injected into the first chamber subjected to the lowest temperature so as to impregnate a porous mobile element that passes through the different partitions, being successively in contact with said chambers heated to increasing temperatures. A neutral carrier gas is injected in the vicinity of the partitions for control of the pressure losses of the gas flows between the different chamber.

Abstract: An apparatus for liquid delivery of a chemical vapour deposition CVD installation comprises an inlet head equipped with at least one injector having an inlet for delivery of liquid precursors or precursors in solution. A vector gas injection circuit is rendered active simultaneously with injection of the liquid, the vector gas being directed to the vicinity of the injector after being heated. Each injector is cooled individually by water or coolant flow. The evaporation chamber comprises heating resistances for the change of liquid/vapor state of the precursors, and deviation means arranged so that the distance covered by the droplets and vapours of the precursors is greater than the distance in a straight line between the nozzle of the injector and the outlet tube.