Abstract: Disclosed is a device for dispensing a gas phase of at least one solid precursor, said device comprising a container intended to contain a solid phase of said precursor, a first heating means configured to heat at least one part of the container and/or of the solid phase so as to form a gas phase of said precursor in the container, and dispensing means fluidically connected to the container and configured to dispense the gas phase from the container to a point of use. According to the invention, the device comprises a chamber which has an internal volume within which are the container and said dispensing means, said device also comprising a second heating means configured to heat at least one part of the internal volume of the chamber.

Abstract: Plant for delivering a gas mixture to a silicon wafer doping unit comprising a source of a dopant gas (1), a source of a carrier gas (2), a mixer device (3) connected to the container of dopant gas (1) and to the source of carrier gas (2), a first flow regulator member (41) and a second flow regulator member (42) for regulating the flows of the dopant gas (1) and of the carrier gas (2) towards the mixer device (3), a control unit (5) for controlling the first and second flow regulator members (41, 42) so as to adjust the first flow rate setpoint (D1) and the second flow rate setpoint (D2) in proportions determined as a function of at least one target content (C1, C2) of dopant gas (1) and/or carrier gas (2) in the mixture, a buffer tank (7), a delivery line (6) for delivering the mixture to a doping unit (10) with a consumption flow rate (DC), at least one measurement sensor (8) for measuring a physical quantity, the variation of which is representative of a variation in the consumption flow rate (DC) and for

Abstract: A plant for delivering a gas mixture including a source of a first gas, a source of a second gas, a mixer device fluidically connected to the source of first gas and to the source of second gas. A first flow regulator member and a second flow regulator member, a control unit, a buffer tank, at least one measurement sensor configured to measure a physical quantity, the variation of which is representative of a variation in the consumption flow rate delivered by the delivery line and to provide a first measurement signal of said physical quantity.

Abstract: The invention relates to a system for distributing chemical products in a factory producing flat screen semi-conductors or light-emitting diodes comprising means for storing said liquid products and means for the distribution and use thereof, wherein the liquid products are distributable from the storage means to the usage means by means of the distribution means.

Abstract: The invention relates to a method for the conversion of a gas or gas mixture and, in particular, a fluorinated gaseous effluent. According to the invention, at least one bond between two atoms of at least one molecule of the gas or gas mixture is broken under the influence of an electric and/or magnetic field to which the gas or gas mixture is subjected. The gas or gas mixture stream is injected through the electric and/or magnetic field in a non-rectilinear manner in order to increase the distance travelled by the gas molecules through the field and, in this way, increase the effectiveness of the conversion of the gas or gas mixture molecules.

Abstract: The invention concerns a system for treating gases such as PFC or HFC with plasma, comprising: (6) pumping means (6) thereof the outlet is at a pressure substantially equal to atmospheric pressure, means (8), at the pump output, to produce a plasmas at atmospheric pressure.

Abstract: System for diluting an ultrapure concentrated chemical including: (i) a first tank which contains the chemical in concentrated form having a predetermined purity P, (ii) a supply of ultrapure water of purity at least equal to P, (iii) a second tank for mixing the concentrated chemical with the ultrapure water to obtain a solution of diluted chemical whose purity is at least equal to P, (iv) a structure for adjusting the titre of the solution of diluted, chemical to a desired final concentration.

Abstract: An apparatus for delivering abrasive suspensions includes a reservoir containing an abrasive suspension, a loop for delivering the abrasive suspension to a point of use, the loop being connected to the reservoir, a pumping arrangement for circulating the abrasive suspension in the loop and for ensuring its return into the reservoir, the loop and the reservoir being arranged for recovering the abrasive suspension after circulation in the loop at a recovery point of the reservoir, and a control system for controlling the pumping arrangement so as to maintain a continuous circulation of the suspension.