Patents by Inventor HEUNG-KOOK KO

HEUNG-KOOK KO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming pattern of semiconductor device from which various types of pattern defects are removed
    Patent number: 10242921
    Abstract: The method includes classifying sample pattern data into a standard normal group and a standard weak group based on a first criterion. The method further includes extracting a normal group determination function by calculating an image parameter with respect to each piece of sample pattern data included in the standard normal group, and extracting a weak group determination function by calculating the image parameter with respect to each piece of sample pattern data included in the standard weak group. The method also includes classifying the object pattern data into a normal group and a weak group by calculating the image parameter with respect to object pattern data based on a first proximity between the normal group determination function and the object pattern data and a second proximity between the weak group determination function and the object pattern data.
    Type: Grant
    Filed: November 18, 2016
    Date of Patent: March 26, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sang-Wook Park, Heung-Kook Ko, No-Young Chung
  • METHOD OF FORMING PATTERN OF SEMICONDUCTOR DEVICE FROM WHICH VARIOUS TYPES OF PATTERN DEFECTS ARE REMOVED
    Publication number: 20170148689
    Abstract: The method includes classifying sample pattern data into a standard normal group and a standard weak group based on a first criterion. The method further includes extracting a normal group determination function by calculating an image parameter with respect to each piece of sample pattern data included in the standard normal group, and extracting a weak group determination function by calculating the image parameter with respect to each piece of sample pattern data included in the standard weak group. The method also includes classifying the object pattern data into a normal group and a weak group by calculating the image parameter with respect to object pattern data based on a first proximity between the normal group determination function and the object pattern data and a second proximity between the weak group determination function and the object pattern data.
    Type: Application
    Filed: November 18, 2016
    Publication date: May 25, 2017
    Inventors: SANG-WOOK PARK, HEUNG-KOOK KO, NO-YOUNG CHUNG