Patents by Inventor Hide Ueno

Hide Ueno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180209034
    Abstract: Provided is a target material which suppresses contamination of a gate electrode during sputtering and which is used to form a gate electrode capable of achieving stable TFT characteristics. This target material contains a total of 50 atom % or more of one or more elements (M) selected from among the group consisting of W, Nb, Ta, Ni, Ti and Cr, with the remainder comprising Mo and unavoidable impurities, wherein a content of K, which is one of the unavoidable impurities, is preferably 0.4 to 20.0 ppm by mass and a content of W as the element (M) is preferably 10 to 50 atom %.
    Type: Application
    Filed: July 26, 2016
    Publication date: July 26, 2018
    Applicant: Hitachi Metals, Ltd.
    Inventors: Masashi KAMINADA, Kazuya SAITOH, Yuu TAMADA, Hide UENO
  • Publication number: 20110143168
    Abstract: Disclosed is a Co—Fe alloy for soft magnetic films used in perpendicular magnetic recording media, etc., which maintains high soft magnetic properties and has excellent weather resistance. Disclosed is a Co—Fe alloy for soft magnetic films, which is a Co—Fe alloy the composition formula of which is expressed at atomic ratio as ((Co100?X—FeX)100?Y—NiY)100?(a+b+c)-Mla-M2b-Tic, where 5?X?80, 0?Y?25, 2?a?6, 2?b?10, and 0.5?c?10, the remainder of which is composed of unavoidable impurities, and wherein the element M1 in the aforementioned composition formula is one or two or more elements selected from (Zr, Hf, Y), and the element M2 in the aforementioned composition formula is one or two or more elements selected from (Ta, Nb).
    Type: Application
    Filed: October 30, 2009
    Publication date: June 16, 2011
    Applicant: HITACHI METALS, LTD.
    Inventors: Tomonori Ueno, Jun Fukuoka, Hide Ueno, Mitsuharu Fujimoto
  • Patent number: 7381282
    Abstract: A Co alloy target comprising 1 to 10 atomic % of Zr and 1 to 10 atomic % of Nb and/or Ta, the balance being unavoidable impurities and Co, is produced by rapidly solidifying a melt of the Co alloy to produce an alloy powder, classifying the alloy powder to maximum particle size of 500 ?m or less, and pressure-sintering the classified alloy powder.
    Type: Grant
    Filed: April 5, 2005
    Date of Patent: June 3, 2008
    Assignee: Hitachi Metals, Ltd.
    Inventors: Tomonori Ueno, Hide Ueno, Hiroshi Takashima, Mitsuharu Fujimoto
  • Publication number: 20080083616
    Abstract: The present invention relates to a Co—Fe—Zr based alloy target material for forming a soft magnetic film of the Co—Fe—Zr based alloy used in a perpendicular magnetic recording medium, and provides a Co—Fe—Zr based alloy target material having a low magnetic permeability and good sputtering characteristics and a process for producing this target material. A Co—Fe—Zr based alloy sputtering target material represented by the compositional formula based on the atomic ratio: (Cox—Fe100-X)100-(Y+Z)—ZrY-MZ (20?X?70, 2?Y?15 and 2?Z?10) in which the element(s) M is one or more elements selected from the group consisting of Ti, V, Nb, Ta, Cr, Mo, W, Si, Al and Mg, wherein a phase composed of HCP-Co and an alloy phase composed mainly of Fe are finely dispersed in the microstructure of the target material.
    Type: Application
    Filed: October 9, 2007
    Publication date: April 10, 2008
    Applicant: HITACHI METALS, LTD.
    Inventors: Jun Fukuoka, Hiroshi Takashima, Tomonori Ueno, Mitsuharu Fujimoto, Hide Ueno
  • Patent number: 7141208
    Abstract: An Fe—Co—B alloy target, in which the largest inscribed circle depictable in regions containing no boride phases in its cross-sectional microstructure has a diameter of 30 ?m or less. Its composition is represented by (FeXCo100?X)100?YBY (by atomic percentage), wherein 5?X?95, and 5?Y?30.
    Type: Grant
    Filed: April 28, 2004
    Date of Patent: November 28, 2006
    Assignee: Hitachi Metals, Ltd.
    Inventors: Hide Ueno, Tomonori Ueno, Shinichiro Yokoyama
  • Publication number: 20050223848
    Abstract: A Co alloy target comprising 1 to 10 atomic % of Zr and 1 to 10 atomic % of Nb and/or Ta, the balance being unavoidable impurities and Co, is produced by rapidly solidifying a melt of the Co alloy to produce an alloy powder, classifying the alloy powder to maximum particle size of 500 ?m or less, and pressure-sintering the classified alloy powder.
    Type: Application
    Filed: April 5, 2005
    Publication date: October 13, 2005
    Inventors: Tomonori Ueno, Hide Ueno, Hiroshi Takashima, Mitsuharu Fujimoto
  • Publication number: 20050011308
    Abstract: An Fe—Co—B alloy target, in which the largest inscribed circle depictable in regions containing no boride phases in its cross-sectional microstructure has a diameter of 30 ?m or less. Its composition is represented by (FeXCo100?X)100?YBY (by atomic percentage), wherein 5?X?95, and 5?Y?30.
    Type: Application
    Filed: April 28, 2004
    Publication date: January 20, 2005
    Inventors: Hide Ueno, Tomonori Ueno, Shinichiro Yokoyama
  • Publication number: 20020106297
    Abstract: The invention relates to a Co-base target made of a sintered powder, having a restrained amount of oxygen, and a producing method thereof. The target contains from more than 10 to not more than 25 at % of B and not more than 100 ppm of oxygen. It may contain 30≧Pt≧5 at%, 30≧Cr≧10 at%, 10≧Ta>0 at% and/or 30≧Ni>0 at%. It may contain also from more than 0 (zero) to not more than 15 at% in total of one or more elements selected from the group consisting of Ti, Zr, Hf, V, Nb, Mo, W, Cu, Ag, Au, Ru, Rh, Pd, Os, Ir and rare earth elements. The target is produced by melting a Co-base alloy together with an additive B in an amount of from more than 10 to not more than 25 at% whereby deoxidizing, rapidly cooling the molten metal to produce an alloy powder and sintering the alloy powder.
    Type: Application
    Filed: November 29, 2001
    Publication date: August 8, 2002
    Applicant: HITACHI METALS, LTD.
    Inventors: Tomonori Ueno, Hideo Murata, Shigeru Taniguchi, Hide Ueno