Patents by Inventor Hideaki Amano

Hideaki Amano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8734074
    Abstract: It is possible to compensate for waterproof with a simple structure, and to achieve a reduction in the number of parts and a reduction in the connecting operation time. There is a connecting member that connects a first member 100 to a second member 101, wherein the connecting member is a fastening screw 10, having a head 11 on one side thereof and having a threaded portion 12 on the other side thereof, which performs connecting by fastening, and a plurality of rows of annular grooves 13 are formed in a seat surface 11a of the head 11 around a shaft of the screw. In addition, the head side of the fastening screw 10 is provided with a neck having a larger diameter than the diameter of the threaded portion which is closely inserted into an insertion hole of the first member, and a plurality of rows of annular grooves 13 are formed on the outer circumference of the neck.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: May 27, 2014
    Assignee: Union Seimitsu Co., Ltd.
    Inventors: Hideaki Amano, Shunitirou Ozaki, Kenji Nakanishi
  • Publication number: 20130266397
    Abstract: It is possible to compensate for waterproof with a simple structure, and to achieve a reduction in the number of parts and a reduction in the connecting operation time. There is a connecting member that connects a first member 100 to a second member 101, wherein the connecting member is a fastening screw 10, having a head 11 on one side thereof and having a threaded portion 12 on the other side thereof, which performs connecting by fastening, and a plurality of rows of annular grooves 13 are formed in a seat surface 11a of the head 11 around a shaft of the screw.
    Type: Application
    Filed: March 8, 2013
    Publication date: October 10, 2013
    Applicant: UNION SEIMITSU Co., Ltd.
    Inventors: Hideaki AMANO, Shunitirou Ozaki, Kenji Nakanishi
  • Patent number: 8345371
    Abstract: An information storing device and an information processing device having a memory for registering a plurality of working modes at recording/reproduction and a switching circuit for selecting one of the plurality of working modes, which select the optimum working mode automatically or by an instruction of an operator according to power supply capacity of a device of higher rank to effect recording/reproduction.
    Type: Grant
    Filed: October 20, 2010
    Date of Patent: January 1, 2013
    Assignee: Hitachi Global Storage Technologies Japan, Ltd.
    Inventors: Yuichi Koizumi, Hideaki Amano, Katsuhiro Tsuneta, Koji Kodama
  • Publication number: 20110205664
    Abstract: An information storing device and an information processing device having a memory for registering a plurality of working modes at recording/reproduction and a switching circuit for selecting one of the plurality of working modes, which select the optimum working mode automatically or by an instruction of an operator according to power supply capacity of a device of higher rank to effect recording/reproduction.
    Type: Application
    Filed: October 20, 2010
    Publication date: August 25, 2011
    Applicant: HITACHI GLOBAL STORAGE TECHNOLOGIES JAPAN, LTD.
    Inventors: Yuichi KOIZUMI, Hideaki AMANO, Katsuhiro TSUNETA, Koji KODAMA
  • Patent number: 7982999
    Abstract: An information storing device and an information processing device having a memory for registering a plurality of working modes at recording/reproduction and a switching circuit for selecting one of the plurality of working modes, which select the optimum working mode automatically or by an instruction of an operator according to power supply capacity of a device of higher rank to effect recording/reproduction.
    Type: Grant
    Filed: February 7, 2005
    Date of Patent: July 19, 2011
    Assignee: Hitachi Global Storage Technologies Japan, Ltd.
    Inventors: Yuichi Koizumi, Hideaki Amano, Katsuhiro Tsuneta, Koji Kodama
  • Patent number: 7337745
    Abstract: A susceptor 24 includes a heater 38 disposed in a planar state, upper and lower ceramic-metal composites 40A and 40B disposed so as to sandwich the heater 38 from above and from below, and a ceramic electrostatic chuck 28 for attracting and holding an object to be treated, W. The electrostatic chuck is joined to an upper surface of the upper ceramic-metal composite 40A. The electrostatic chuck 28 has nearly the same coefficient of linear thermal expansion as that of the upper ceramic-metal composite 40A. Thus, peeling or cracking of the electrostatic chuck 28 due to the difference in thermal expansion and contraction between the electrostatic chuck 28 and the upper ceramic-metal composite 40A can be prevented.
    Type: Grant
    Filed: September 22, 2000
    Date of Patent: March 4, 2008
    Assignee: Tokyo Electron Limited
    Inventors: Mitsuaki Komino, Hideaki Amano, Shosuke Endo, Toshiaki Fujisato, Yasuharu Sasaki
  • Patent number: 7033444
    Abstract: An electrode structure used in a plasma processing apparatus which performs a predetermined process on an object (W) to be processed by using a plasma in a process chamber (26) in which a vacuum can be formed. An electrode unit (38) has a heater unit (44) therein. A cooling block (40) having a cooling jacket (58) is joined to the electrode unit (38) so as to cool the electrode unit. A heat resistant metal seal member (66A, 66B) seals an electrode-side heat transfer space (62, 64) formed between the electrode unit and the cooling block. Electrode-side heat transfer gas supply means (94) supplies a heat transfer gas to the electrode-side heat transfer space. Accordingly, a sealing characteristic of the electrode-side heat transfer space does not deteriorate even in a high temperature range such as a temperature higher than 200° C. and, for example, a range from 350° C. to 500° C., and the heat transfer gas does not leak.
    Type: Grant
    Filed: September 22, 2000
    Date of Patent: April 25, 2006
    Assignee: Tokyo Electron Limited
    Inventors: Mitsuaki Komino, Yasuharu Sasaki, Kyo Tsuboi, Hideaki Amano
  • Publication number: 20050146806
    Abstract: An information storing device and an information processing device having a memory for registering a plurality of working modes at recording/reproduction and a switching circuit for selecting one of the plurality of working modes, which select the optimum working mode automatically or by an instruction of an operator according to power supply capacity of a device of higher rank to effect recording/reproduction.
    Type: Application
    Filed: February 7, 2005
    Publication date: July 7, 2005
    Inventors: Yuichi Koizumi, Hideaki Amano, Katsuhiro Tsuneta, Koji Kodama
  • Patent number: 6893329
    Abstract: An abrasive tape is supplied to a tape head by a tape supply unit and taken up from the tape head by a tape take-up unit. The tape head presses the abrasive tape against a surface of an object under polish, which is rotated by a rotating unit. A tape head pressuring unit utilizes a voice coil motor, for example. Since the tape head pressuring unit generates a pressuring force for pressuring the tape head using the electromagnetic force, it is able to set a minute pressuring force by controlling a drive signal, and to obtain the fine adjustment of the pressuring force easily by controlling the electric signal. Therefore, it becomes possible to press the abrasive tape against the surface of the object under polish with a desired low pressure.
    Type: Grant
    Filed: September 5, 2003
    Date of Patent: May 17, 2005
    Assignee: Hitachi High-Tech Electronics Engineering Co., Ltd.
    Inventors: Fujio Tajima, Hideaki Amano, Teruaki Tokutomi, Takahisa Ishida, Kazuyuki Sonobe, Yasunori Fukuyama, Tsutomu Nagakura, Noritake Shizawa, Takeshi Sato
  • Patent number: 6865048
    Abstract: An information storing device and an information processing device having a memory for registering a plurality of working modes at recording/reproduction and a switching circuit for selecting one of the plurality of working modes, which select the optimum working mode automatically or by an instruction of an operator according to power supply capacity of a device of higher rank to effect recording/reproduction.
    Type: Grant
    Filed: April 3, 2003
    Date of Patent: March 8, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Yuichi Koizumi, Hideaki Amano, Katsuhiro Tsuneta, Koji Kodama
  • Publication number: 20040198181
    Abstract: An abrasive tape is supplied to a tape head by a tape supply unit and taken up from the tape head by a tape take-up unit. The tape head presses the abrasive tape against a surface of an object under polish, which is rotated by a rotating unit. A tape head pressuring unit utilizes a vice voice coil motor, for example. Since the tape head pressuring unit generates a pressuring force for pressuring the tape head using the electromagnetic force, it is able to set a minute pressuring force by controlling a drive signal, and to obtain the fine adjustment of the pressuring force easily by controlling the electric signal. Therefore, it becomes possible to press the abrasive tape against the surface of the object under polish with a desired low pressure.
    Type: Application
    Filed: September 5, 2003
    Publication date: October 7, 2004
    Applicant: Hitachi Electronics Engineering Co. Ltd.
    Inventors: Fujio Tajima, Hideaki Amano, Teruaki Tokutomi, Takahisa Ishida, Kazuyuki Sonobe, Yasunori Fukuyama, Tsutomu Nagakura, Noritake Shizawa, Takeshi Sato
  • Patent number: 6767429
    Abstract: In a plasma CVD apparatus for applying a film deposition process to a semiconductor wafer (W), a wafer placement stage (3) is provided at a center of a vacuum chamber (2). The placement stage (3) is mounted to a side wall (63) via a support part (6). An exhaust port (9) having a diameter equal to or smaller than a diameter of the placement stage (3) is provided under the placement stage (3). A center axis (C1) of the exhaust port (9) is displaced from a center axis of the placement stage (3) in a direction opposite to an extending direction of the support part (6), thereby achieving an efficient exhaust.
    Type: Grant
    Filed: November 9, 2001
    Date of Patent: July 27, 2004
    Assignee: Tokyo Electron Limited
    Inventor: Hideaki Amano
  • Patent number: 6730369
    Abstract: The vacuum processing chambers 31 of the plasma processing units 3A and 3B are connected to the transfer chamber 2 and the wafer W in the positioned state is transferred from the transfer chamber 2 to the mounting stages 4 in the vacuum processing chambers 31. The volume and length of the wave guide 5 are the same between the plasma processing units 3A and 3B. The location relationship of the wave guide 5 to the transfer directions M1 and M2 of the transfer arm 61 is the same between the plasma processing units 3A and 3B. As a result, the location relationship of the wave guide 5 to the wafer W mounted on the mounting stage 4 in a predetermined direction is the same between the plasma processing units 3A and 3B.
    Type: Grant
    Filed: September 7, 2000
    Date of Patent: May 4, 2004
    Assignee: Tokyo Electron Limited
    Inventor: Hideaki Amano
  • Publication number: 20030218820
    Abstract: An information storing device and an information processing device having a memory for registering a plurality of working modes at recording/reproduction and a switching circuit for selecting one of the plurality of working modes, which select the optimum working mode automatically or by an instruction of an operator according to power supply capacity of a device of higher rank to effect recording/reproduction.
    Type: Application
    Filed: April 3, 2003
    Publication date: November 27, 2003
    Applicant: Hitachi, Ltd.
    Inventors: Yuichi Koizumi, Hideaki Amano, Katsuhiro Tsuneta, Koji Kodama
  • Patent number: 6563658
    Abstract: An information storing device and an information processing device having a memory for registering a plurality of working modes at recording/reproduction and a switching circuit for selecting one of the plurality of working modes, which select the optimum working mode automatically or by an instruction of an operator according to power supply capacity of a device of higher rank to effect recording/reproduction.
    Type: Grant
    Filed: August 30, 2002
    Date of Patent: May 13, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Yuichi Koizumi, Hideaki Amano, Katsuhiro Tsuneta, Koji Kodama
  • Patent number: 6557166
    Abstract: Correction of a program which resides on a main storage and which is simultaneously callable by a plurality of command processors is performed by minimizing the stop time of a computer system without reloading a program. A particular command processor calls a correction execution program which corrects a program in accordance with a program correction command. The correction execution program reads program correction information, sets correction execution declaration information in all entries of other command processor in the correction execution declaration area of the main storage and after clearing all entries, the correction execution program corrects the program in accordance with the program correction information. The correction execution program sets correction completion reporting information in all entries for all of the other command processors in the correction completion reporting area of the main storage.
    Type: Grant
    Filed: December 29, 2000
    Date of Patent: April 29, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Makiko Shinohara, Hideaki Amano
  • Publication number: 20030026030
    Abstract: An information storing device and an information processing device having a memory for registering a plurality of working modes at recording/reproduction and a switching circuit for selecting one of the plurality of working modes, which select the optimum working mode automatically or by an instruction of an operator according to power supply capacity of a device of higher rank to effect recording/reproduction.
    Type: Application
    Filed: August 30, 2002
    Publication date: February 6, 2003
    Applicant: Hitachi, Ltd.
    Inventors: Yuichi Koizumi, Hideaki Amano, Katsuhiro Tsuneta, Koji Kodama
  • Patent number: 6493013
    Abstract: In the information recording an reproducing method and apparatus according to the present invention, a piece of picture image information is recorded as an analog quantity or a digital quantity an information carrying medium in a planar manner at a high density, charge potential is read for outputting electric signals to correspond to the recorded picture image information and then the outputted signals are printed out by means of various display unit or output device, with high quality and high resolution as well as ease processing of the information. The information carrying medium provides a long period of storage of information and enables stored picture image information to be repeatedly reproduced with a picture quality according to need.
    Type: Grant
    Filed: March 7, 1997
    Date of Patent: December 10, 2002
    Assignee: Dainippon Printing Co., Ltd.
    Inventors: Hiroyuki Obata, Takashi Aono, Hiroshi Mohri, Masato Koike, Hideaki Amano, Norikazu Saito, Makoto Matsuo, Minoru Utsumi, Chihaya Ogusu, Shunsuke Mukasa, Yoshiaki Kudo
  • Patent number: 6476994
    Abstract: An information storing device and an information processing device having a memory for registering a plurality of working modes at recording/reproduction and a switching circuit for selecting one of the plurality of working modes, which select the optimum working mode automatically or by an instruction of ah operator according to power supply capacity of a device of higher rank to effect recording/reproduction.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: November 5, 2002
    Assignee: Hitachi, Ltd.
    Inventors: Yuichi Koizumi, Hideaki Amano, Katsuhiro Tsuneta, Koji Kodama
  • Publication number: 20020134308
    Abstract: In a plasma CVD apparatus for applying a film deposition process to a semiconductor wafer (W), a wafer placement stage (3) is provided at a center of a vacuum chamber (2). The placement stage (3) is mounted to a side wall (63) via a support part (6). An exhaust port (9) having a diameter equal to or smaller than a diameter of the placement stage (3) is provided under the placement stage (3). A center axis (Cl) of the exhaust port (9) is displaced from a center axis of the placement stage (3) in a direction opposite to an extending direction of the support part (6), thereby achieving an efficient exhaust.
    Type: Application
    Filed: November 9, 2001
    Publication date: September 26, 2002
    Inventor: Hideaki Amano