Patents by Inventor Hideaki Doi

Hideaki Doi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4975223
    Abstract: An optical material of a high refractive index is formed of a copolymer obtained by copolymerizing 3-40 wt. % of 4-isopropenylbiphenyl, 30-97 wt. % of a monofunctional aromatic monomer represented by the following formula (I) or (II) and 0-67 wt. % of another monomer copolymerizable with 4-isopropenylbiphenyl and the monofunctional aromatic monomer. ##STR1## wherein R means a hydrogen atom or methyl group, X denotes ##STR2## in which n stands for an integer of 0-3, Y is a halogen atom other than a fluorine atom, or a methyl, hydroxyl or methoxy group, and m stands for an integer of 0-3, with the proviso that Y may be different from each other when m is 2 or 3.
    Type: Grant
    Filed: February 3, 1989
    Date of Patent: December 4, 1990
    Assignee: Kureha Kagaku Kogyo Kabushiki Kaisha
    Inventors: Hideaki Doi, Teruo Sakagami
  • Patent number: 4962541
    Abstract: Disclosed is a pattern test apparatus for detecting a fault on the basis of comparison/collation between a test reference pattern and a test target pattern, the apparatus being arranged such that a picture element area is defined by a circle with a predetermined radius on a reference matter having at test reference pattern, and when the number of the picture elements located on the reference pattern is larger than the number of the picture elements located outside the reference pattern, a part of the reference pattern corresponding to a picture element located in the center of the circle is deleted. By such an arrangement, the test reference pattern can be made analogous to the real test target pattern regardless of the shape thereof, so that misjudgment of a normal test target pattern for a fault pattern can be prevented.
    Type: Grant
    Filed: February 10, 1988
    Date of Patent: October 9, 1990
    Assignees: Hitachi, Ltd., Hitachi video engineering, Incorporated
    Inventors: Hideaki Doi, Yasuhiko Hara, Akira Sase, Satoshi Shinada
  • Patent number: 4908871
    Abstract: A printed wiring board circuit-pattern inspection system including a two-dimensionally movable table on which a reference printed wiring board and a printed wiring board to be inspected are placed one after another; an image pickup unit which picks up an image of a circuit-pattern on a printed wiring board by scanning the circuit-pattern in two dimensions, and converting the image into a video signal, a binary pixel forming unit which transforms the video signal into binary pattern data, synchronous signal generator which generates a synchronous signal in synchronism with the scanning operation, a first buffer memory which stores binary pattern data, compressed pattern data memory which stores compressed binary pattern data of a whole reference printed wiring board, data compander which compresses and expands binary pattern, in accordance with the synchronous signal, a second buffer memory which stores, binary pattern data compressed by the data compander and the binary data retrieved from the compressed patt
    Type: Grant
    Filed: April 20, 1987
    Date of Patent: March 13, 1990
    Assignee: Hitachi, Ltd.
    Inventors: Yasuhiko Hara, Hideaki Doi, Koichi Karasaki, Akira Sase
  • Patent number: 4628531
    Abstract: A pattern checking apparatus carries out the detection of candidate defects through a primary selection with a sensitivity high enough to detect any existing defect, and then carries out a detailed analysis by a controlling processor for a pattern including the periphery of the detected candidate defect through a secondary selection in which a candidate defect which is not a defect in a practical sense is removed from candidates, so that only real defects are detected.
    Type: Grant
    Filed: February 27, 1984
    Date of Patent: December 9, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Keiichi Okamoto, Kozo Nakahata, Yukio Matsuyama, Hideaki Doi, Susumu Aiuchi, Mineo Nomoto
  • Patent number: 4504631
    Abstract: The photoresist material comprises a polymer having chloromethyl groups introduced therein and containing 2-isopropenylnaphthalene as one component, an average substitution degree of the chloromethyl groups based on the polymer is within a range of 0.2 to 5.The photoresist material has a high glass transition point, a high sensitivity to radiation and an excellent dry etching resistance, whereby it is suitably used for the manufacture of a semiconductor element using radiation and provides a good resolution on etching.
    Type: Grant
    Filed: May 31, 1983
    Date of Patent: March 12, 1985
    Assignee: Kureha Kagaku Kogyo Kabushiki Kaisha
    Inventors: Hideaki Doi, Kenichi Kokubun, Teruo Sakagami, Naohiro Murayama
  • Patent number: 4341837
    Abstract: A laminar thermoplastic resin structure comprising a plurality of thermoplastic resin layers is obtained by bonding thermoplastic resin layers with a layer, or layers, of a maleic acid-modified block copolymer of a conjugated diene and an aromatic vinyl monomer interposed therebetween.The laminar structure thus obtained possesses a high bonding strength at elevated temperatures, and also excellent processability since the bonding layer per se is of thermoplastic nature. Thus, this laminar structure is particularly suitable as a material for use at elevated temperatures, for example, a packaging material for retort sterilization or a pipe for conducting hot fluids.
    Type: Grant
    Filed: August 7, 1979
    Date of Patent: July 27, 1982
    Assignee: Kureha Kagaku Kogyo Kabushiki Kaisha
    Inventors: Takayuki Katsuto, Shunzo Endo, Hideaki Doi, Naohiro Murayama