Patents by Inventor Hideaki Nagasaki

Hideaki Nagasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11920928
    Abstract: A system includes a first optical unit that emits light to a measurement target object and receives first interference light incident from the measurement target object, a second optical unit that emits the light to a reference object configured to have a constant optical path length with respect to a temperature fluctuation and receives second interference light incident from the reference object, a spectroscope connected to the first optical unit and the second optical unit and receives the first interference light and the second interference light to be incident, and a control unit connected to the spectroscope, and the control unit calculates a fluctuation rate of a measurement optical path length with respect to a reference optical path length under a predetermined temperature environment on the basis of the optical path length of the reference object calculated on the basis of the second interference light incident on the spectroscope under the predetermined temperature environment, and the reference op
    Type: Grant
    Filed: April 29, 2022
    Date of Patent: March 5, 2024
    Assignee: Tokyo Electron Limited
    Inventors: Kenji Nagai, Hideaki Nagasaki
  • Patent number: 11710614
    Abstract: A light interference system is provided. The light interference system includes a light source configured to generate a measurement light; a fiber configured to propagate therethrough the measurement light; and a measurement device. The fiber includes a single-mode fiber, a multimode fiber and a connector connecting the single-mode fiber and the multimode fiber. A tip end of the fiber is formed of the multimode fiber, and an end surface of the tip end of the fiber is configured to emit the measurement light to a measurement target object and receive a reflection light from the measurement target object. The measurement device is configured to measure physical property of the measurement target object based on the reflection light.
    Type: Grant
    Filed: March 12, 2021
    Date of Patent: July 25, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kenji Nagai, Hideaki Nagasaki, Satoshi Suzuki
  • Publication number: 20220357146
    Abstract: A system includes a first optical unit that emits light to a measurement target object and receives first interference light incident from the measurement target object, a second optical unit that emits the light to a reference object configured to have a constant optical path length with respect to a temperature fluctuation and receives second interference light incident from the reference object, a spectroscope connected to the first optical unit and the second optical unit and receives the first interference light and the second interference light to be incident, and a control unit connected to the spectroscope, and the control unit calculates a fluctuation rate of a measurement optical path length with respect to a reference optical path length under a predetermined temperature environment on the basis of the optical path length of the reference object calculated on the basis of the second interference light incident on the spectroscope under the predetermined temperature environment, and the reference op
    Type: Application
    Filed: April 29, 2022
    Publication date: November 10, 2022
    Applicant: Tokyo Electron Limited
    Inventors: Kenji NAGAI, Hideaki NAGASAKI
  • Publication number: 20220230856
    Abstract: According to an aspect of the present disclosure, there is provided a plasma processing system for performing plasma processing on a substrate, the plasma processing system including: a chamber to which a consumable member is attached inside; a vacuum transfer chamber connected to the chamber; a transfer device provided in the vacuum transfer chamber and configured to transfer the consumable member between the chamber and the transfer device; a measuring instrument provided outside the chamber in the plasma processing system and configured to detect a state of the consumable member; and a controller configured to control each element of the plasma processing system.
    Type: Application
    Filed: January 20, 2022
    Publication date: July 21, 2022
    Applicant: Tokyo Electron Limited
    Inventors: Ichiro SONE, Hideaki NAGASAKI
  • Patent number: 11264267
    Abstract: A substrate processing apparatus includes a stage, a light source, an optical assembly, a light receiver, and controller circuitry. The stage includes a first placing surface on which a substrate is to be placed, and a second placing surface that surrounds the first placing surface and on which a focus ring is to be placed. The optical assembly focuses light from the light source on a lower surface position, which is a position of a lower surface of the focus ring placed on the second placing surface. The light receiver receives light from the lower surface position. The controller circuitry detects at least one of a presence and an absence of the focus ring on the second placing surface, based on light received by the light receiver.
    Type: Grant
    Filed: March 10, 2020
    Date of Patent: March 1, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Takaharu Miyadate, Takashi Taira, Kenji Nagai, Hideaki Nagasaki
  • Publication number: 20210287876
    Abstract: A light interference system is provided. The light interference system includes a light source configured to generate a measurement light; a fiber configured to propagate therethrough the measurement light; and a measurement device. The fiber includes a single-mode fiber, a multimode fiber and a connector connecting the single-mode fiber and the multimode fiber. A tip end of the fiber is formed of the multimode fiber, and an end surface of the tip end of the fiber is configured to emit the measurement light to a measurement target object and receive a reflection light from the measurement target object. The measurement device is configured to measure physical property of the measurement target object based on the reflection light.
    Type: Application
    Filed: March 12, 2021
    Publication date: September 16, 2021
    Inventors: Kenji Nagai, Hideaki Nagasaki, Satoshi Suzuki
  • Publication number: 20200303235
    Abstract: A substrate processing apparatus includes a stage, a light source, an optical assembly, a light receiver, and controller circuitry. The stage includes a first placing surface on which a substrate is to be placed, and a second placing surface that surrounds the first placing surface and on which a focus ring is to be placed. The optical assembly focuses light from the light source on a lower surface position, which is a position of a lower surface of the focus ring placed on the second placing surface. The light receiver receives light from the lower surface position. The controller circuitry detects at least one of a presence and an absence of the focus ring on the second placing surface, based on light received by the light receiver.
    Type: Application
    Filed: March 10, 2020
    Publication date: September 24, 2020
    Applicant: Tokyo Electron Limited
    Inventors: Takaharu MIYADATE, Takashi Taira, Kenji Nagai, Hideaki Nagasaki