Patents by Inventor Hideharu Itaya

Hideharu Itaya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor treating apparatus and cleaning method of the same
    Publication number: 20030037802
    Abstract: A ruthenium film, an osmium film, and an oxide thereof, deposited or adhered on the inside of a semiconductor treating apparatus are effectively removed. To accomplish this, an oxygen-atom donating gas and a halogen gas are supplied to the apparatus, whereby a reaction product deposited or adhered on the inside of the apparatus can be rapidly and effectively removed. In addition, to providing a stable operation, the formation of a thin film with high qualities and the production of a semiconductor device with a high yield are also realized.
    Type: Application
    Filed: July 23, 2002
    Publication date: February 27, 2003
    Applicant: Hitachi, Ltd.
    Inventors: Miwako Nakahara, Toshiyuki Arai, Satoshi Yamamoto, Tsukasa Ohoka, Atsushi Sano, Hideharu Itaya, Harunobu Sakuma