Patents by Inventor Hidehiko Fujimura

Hidehiko Fujimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020042240
    Abstract: A method for manufacturing an airtight vessel seals an evacuation tube after evacuating the inside of the vessel using the evacuation tube. A getter previously disposed in the vessel is activated followed by fusing a part of the evacuation tube to seal the vessel while heating the vessel.
    Type: Application
    Filed: May 11, 1999
    Publication date: April 11, 2002
    Inventors: HIDEHIKO FUJIMURA, TORU ARUGA, MASAAKI OGURA
  • Patent number: 5858450
    Abstract: In formation of thin films on both surfaces of a substrate such as a lens or the like, a pair of cluster beam evaporation sources are provided in mutually separate manner in a film forming chamber. The substrate is disposed between the pair of cluster beam evaporation sources. The cluster beam evaporation source includes a crucible which is arranged to be inclined toward the substrate, or which has a nozzle on a lateral face opposed to the substrate.
    Type: Grant
    Filed: January 10, 1997
    Date of Patent: January 12, 1999
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hidehiko Fujimura, Mitsuharu Sawamura, Makoto Kameyama, Akihiko Yokoyama
  • Patent number: 5582879
    Abstract: In a method of manufacturing a thin film, evaporated particles are generated by a vapor source and are clustered. The clustered evaporated particles are deposited onto a substrate in a vacuum atmosphere without ionizing the particles. A partial pressure of water in the vacuum atmoshpere is controlled to not more than 5.times.10.sup.-6 Torr. A temperature of the substrate is maintained to be 150.degree. C. or lower. A film according to this method has a high adhesion characteristics and a high mechanical strength without heating the substrate to a high temperature and without damaging the substrate by ions.
    Type: Grant
    Filed: November 4, 1994
    Date of Patent: December 10, 1996
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hidehiko Fujimura, Mitsuharu Sawamura, Makoto Kameyama, Akihiko Yokoyama