Patents by Inventor Hidehiro Yanagawa

Hidehiro Yanagawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100154711
    Abstract: Films are formed on a plurality of substrates through a batch process while preventing formation of films on the rear surfaces of the substrates. For this, a substrate processing apparatus comprises a reaction vessel, supports, a support holder, and an induction heating device. The reaction vessel is configured to process substrates therein. The supports are made of a conductive material and having a disk shape, and each of the supports is configured to accommodate a substrate in its concave part in a state where the substrate is horizontally positioned with a top surface of the substrate being exposed. The concave part is formed concentrically with a circumference of the support, and a difference between radii of the support and the concave part is greater than a distance between neighboring two of the supports held by the support holder. The support holder is configured to hold at least the supports horizontally in multiple stages.
    Type: Application
    Filed: December 22, 2009
    Publication date: June 24, 2010
    Applicant: HITACHI-KOKUSAI ELECTRIC INC.
    Inventors: Kiyohisa ISHIBASHI, Fumihide IKEDA, Masaaki UENO, Takahiro MAEDA, Yasuhiro INOKUCHI, Yasuo KUNII, Hidehiro YANAGAWA
  • Patent number: 7198447
    Abstract: A semiconductor device producing apparatus is disclosed. The apparatus includes a carrier-holding stage for placing a carrier; first, second and third stages each for holding first and second boats one at a time, each boat holding one or more substrates; a boat transfer mechanism for transferring the boats among the first, second and third stages; and a substrate transfer mechanism for transferring the substrate(s) from the carrier to the boat held by the first stage. A controller controls the first stage, the boat transfer mechanism and the substrate transfer mechanism so that the boat transfer mechanism transfers one of the boats from the second stage to the first stage, the substrate transfer mechanism then transfers the substrate(s) from the carrier to the boat held by the first stage, and the first stage then moves the boat into the processing chamber for processing.
    Type: Grant
    Filed: February 6, 2003
    Date of Patent: April 3, 2007
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Kazuhiro Morimitsu, Tatsuhisa Matsunaga, Masanori Kaneko, Kouichi Noto, Hidehiro Yanagawa, Masaki Matsushima
  • Publication number: 20040052618
    Abstract: A semiconductor device producing apparatus comprises a carrier-holding stage at which a carrier is to be placed which accommodates a substrate or substrates; a processing chamber in which the substrate or the substrates are processed; a first stage which is to hold first and second boats one at a time which are respectively to hold the substrate or the substrates and which first stage is to move the first and second boats one at a time into and out from the processing chamber; a second stage which is to hold the first and second boats one at a time; a third stage which is to hold the first and second boats one at a time; a boat transfer mechanism which transfers the first and second boats between the first, second and third stages; a substrate transfer mechanism which transfers the substrate or substrates from the carrier placed at the carrier-holding stage to either one of the first and second boats which is held by the first stage; and a controller which controls the first stage; the boat transfer mechanism
    Type: Application
    Filed: February 6, 2003
    Publication date: March 18, 2004
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Tatsuhisa Matsunaga, Hidehiro Yanagawa, Masaki Matsushima
  • Patent number: 6641350
    Abstract: A substrate processing equipment comprises two pod supporting stages and two independently operable pod door openers. Each pod supporting stage is capable of placing thereon a pod for containing substrates therein. Each pod door openers having means for permitting access to the substrates inside the pod placed on a corresponding pod supporting stage.
    Type: Grant
    Filed: April 16, 2001
    Date of Patent: November 4, 2003
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Takanobu Nakashima, Tatsuhisa Matsunaga, Hidehiro Yanagawa
  • Publication number: 20020012581
    Abstract: In a CVD apparatus in which a first boat and a second boat are used, the boat detection unit and the boat identifying detection unit of the boat detection device of boat identification means are installed on a waiting plate on which a transfer process is performed by the substrate transfer device with one boat mounted thereon. Two detected bodies corresponding to the boat detection unit and the boat identifying detection unit are projected on the first boat 21A and only one detected body corresponding to the boat detection unit is projected on the second boat. If two detected bodies are detected, the boat detection device determines the boat to be the first boat and, if only one detected body is detected, the boat detection device determines the boat to be the second boat.
    Type: Application
    Filed: July 26, 2001
    Publication date: January 31, 2002
    Applicant: Hitachi Kokusai Electric Inc.
    Inventors: Shigeru Odake, Kazuhiro Morimitsu, Hidehiro Yanagawa
  • Publication number: 20010038783
    Abstract: A substrate processing equipment comprises two pod supporting stages and two independently operable pod door openers. Each pod supporting stage is capable of placing thereon a pod for containing substrates therein. Each pod door openers having means for permitting access to the substrates inside the pod placed on a corresponding pod supporting stage.
    Type: Application
    Filed: April 16, 2001
    Publication date: November 8, 2001
    Applicant: Hitachi Kokusai Electric Inc.
    Inventors: Takanobu Nakashima, Tatsuhisa Matsunaga, Hidehiro Yanagawa
  • Patent number: 5902103
    Abstract: A vertical furnace for use in a semiconductor manufacturing apparatus, which comprises a heater, an outer tube, an inner tube, all being disposed concentrically in a multi-layered fashion, a boat adapted to be introduced into the inner tube with a wafer loaded thereon, and a boat cover disposed internally of the inner tube concentrically therewith. The boat cover is comprised of a boat cover body and an auxiliary cover plate connected to said boat cover body with a given gap therebetween, the boat cover body having a predetermined number of slit apertures extending in a generator direction thereof, the auxiliary cover plate being disposed to cover the slit apertures. The introduced reactive gas flows in branched streams, one flowing through the inside of the boat cover and the other flowing in past the boat cover, whereby the film deposited on the wafer is improved in uniformity and homogeneity.
    Type: Grant
    Filed: December 23, 1996
    Date of Patent: May 11, 1999
    Assignee: Kokusai Electric Co., Ltd.
    Inventors: Kiyohiko Maeda, Satoshi Kakizaki, Tomoshi Taniyama, Hidehiro Yanagawa, Ken-ichi Suzaki
  • Patent number: 5277215
    Abstract: A plurality of airtight chambers are connected through blocking means, which can communicate or shut off the chambers, and at least one of the airtight chambers is used as a processing chamber. One of the adjacent airtight chambers is replaced by a replacement gas, and the replacement gas is supplied to the other of the adjacent airtight chambers. When pressure difference or pressure in the two adjacent airtight chambers is below a predetermined value, the adjacent two airtight chambers are communicated, and pressure in the two airtight chambers is equalized.
    Type: Grant
    Filed: January 21, 1993
    Date of Patent: January 11, 1994
    Assignee: Kokusai Electric Co., Ltd.
    Inventors: Hidehiro Yanagawa, Hiroyuki Nishiuchi, Masakazu Shimada, Mitsuhiro Hirano, Tomoshi Taniyama, Kazumi Nikaido, Yoshikazu Hisajima, Michio Sato
  • Patent number: RE43023
    Abstract: A substrate processing equipment comprises two pod supporting stages and two independently operable pod door openers. Each pod supporting stage is capable of placing thereon a pod for containing substrates therein. Each pod door openers having means for permitting access to the substrates inside the pod placed on a corresponding pod supporting stage.
    Type: Grant
    Filed: March 15, 2010
    Date of Patent: December 13, 2011
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Takanobu Nakashima, Tatsuhisa Matsunaga, Hidehiro Yanagawa