Abstract: In a method for designing a mirror, a design formula of a reflecting surface is used which is derived based on conditions that: an intersection point between a sagittal light source ray and an incoming light ray to an MA point and an intersection point between a meridional light source ray and the incoming light ray to the MA point are represented by using L1sA and L1mA, respectively; an intersection point between an outgoing light ray from the MA point and a sagittal virtual collected light ray and an intersection point between the outgoing light ray from the MA point and a meridional virtual collected light ray are expressed by using L2sA and L2mA; an intersection point between a sagittal virtual light source ray and an incoming light ray to an MB point and an intersection point between a meridional virtual light source ray and the incoming light ray to the MB point are expressed by using L2sA and L2mA, and L; and an intersection point between an outgoing light ray from the MB point and the sagittal collect

Abstract: In a method for designing a mirror when any point on a reflecting surface is represented by M, coordinates of an intersection point between a sagittal light source ray and an incoming light ray to the M point and an intersection point between a meridional light source ray and the incoming light ray to the M point are expressed by using L1s and L1m, and coordinates of an intersection point between an outgoing light ray from the M point and a sagittal collected light ray and an intersection point between the outgoing light ray from the M point and a meridional collected light ray are expressed by using L2s and L2m. A mirror is designed using design formulas of a reflecting surface derived based on the coordinates and a condition that an optical path length from a light source position to a light collection position is constant with respect to any point on the reflecting surface for both the light collection in the sagittal direction and the light collection in the meridional direction.

Abstract: Provided is a local polishing technique suitable for corrective polishing. Press polishing is performed while supplying a polishing solution between a work and a work-polishing rotating tool locally pressed against the work, the polishing solution having abrasive grains composed of organic particles with an average particle size of 5 ?m or more dispersed in a liquid. The rotating tool is made of an elastic material.

Abstract: An object of the invention is to provide a novel optical design method for an X-ray focusing system capable of collecting all the fluxes, while applying an X-ray of a very small divergence angle to the entire surface of a rotating mirror. The method includes a step of determining the shape of a rotating mirror (3) provided with a reflection surface, the reflection surface being formed by rotating, by one turn around an optical axis (OA), a one-dimensional profile composed of an ellipse or a part of combination of the ellipse and a hyperbolic curve, the ellipse including a downstream focal point (F) serving as a light collecting point of the X-ray focusing system, and including an upstream focal point (F1) deviated from the optical axis (OA); and a step of determining the shape of a reflection surface of an annular focusing mirror (4).

Abstract: An object of the invention is to provide a novel optical design method for an X-ray focusing system capable of collecting all the fluxes, while applying an X-ray of a very small divergence angle to the entire surface of a rotating mirror. The method includes a step of determining the shape of a rotating mirror (3) provided with a reflection surface, the reflection surface being formed by rotating, by one turn around an optical axis (OA), a one-dimensional profile composed of an ellipse or a part of combination of the ellipse and a hyperbolic curve, the ellipse including a downstream focal point (F) serving as a light collecting point of the X-ray focusing system, and including an upstream focal point (F1) deviated from the optical axis (OA); and a step of determining the shape of a reflection surface of an annular focusing mirror (4).

Abstract: Provided are a method and an apparatus of precisely measuring the intensity profile of an x-ray nanobeam, which can measure x-rays having different wavelengths with one knife edge and can perform optimal measurements corresponding to the depth of focus of an x-ray beam and the conditions of other measurement devices, using a dark field measurement method which enables precise measurements of the profile of an x-ray beam using a knife edge and using diffracted and transmitted x-rays. The knife edge (4) is formed of a heavy metal which advances the phase of an x-ray passing therethrough and is fabricated in such a manner that the thickness may change in the longitudinal direction continuously or in a stepwise fashion.

Abstract: Provided are a method and an apparatus of precisely measuring the intensity profile of an x-ray nanobeam, which can measure x-rays having different wavelengths with one knife edge and can perform optimal measurements corresponding to the depth of focus of an x-ray beam and the conditions of other measurement devices, using a dark field measurement method which enables precise measurements of the profile of an x-ray beam using a knife edge and using diffracted and transmitted x-rays. The knife edge (4) is formed of a heavy metal which advances the phase of an x-ray passing therethrough and is fabricated in such a manner that the thickness may change in the longitudinal direction continuously or in a stepwise fashion.

Abstract: A high precision posture control method for sustaining the posture of an X-ray optical element constantly at 1 ?rad or less. A longitudinal condensation mirror and a lateral condensation mirror, each having a condensation plane band consisting of an elliptical reflective surface, are arranged perpendicularly to each other to form a K-B mirror arrangement. Fresnel mirrors are respectively constituted of a pair of planar reflective surfaces formed in the vicinities of the incident side end and the exit side end of the condensation plane band of each condensation mirror. Interference fringe by the Fresnel mirror of each condensation mirror is independently monitored at a position insusceptible to a condensation beam by the condensation plane band, and variation in interference fringe is detected electrically and its detection signal is used as a feedback signal for posture control of each condensation mirror.

Abstract: An X-ray condensing method and its device are provided with an X-ray mirror that has a wavefront adjustable function to finely adjust a wavefront of a reflecting X-ray, measure an X-ray intensity distribution in the vicinity of a focus, measure an X-ray intensity distribution in the vicinity of the X-ray mirror or use a known X-ray intensity distribution of an incident X-ray, calculate a complex amplitude distribution at the reflective surface by using a phase restoration method from the X-ray intensity distribution in the vicinity of the focus and the X-ray intensity distribution in the vicinity of the reflective surface, calculate a wavefront aberration of an X-ray condensing optical system from the complex amplitude distribution, and control the reflective surface of the X-ray mirror with the wavefront adjustable function so that the wavefront aberration is minimized.

Abstract: An X-ray condensing method and its device are provided with an X-ray mirror that has a wavefront adjustable function to finely adjust a wavefront of a reflecting X-ray, measure an X-ray intensity distribution in the vicinity of a focus, measure an X-ray intensity distribution in the vicinity of the X-ray mirror or use a known X-ray intensity distribution of an incident X-ray, calculate a complex amplitude distribution at the reflective surface by using a phase restoration method from the X-ray intensity distribution in the vicinity of the focus and the X-ray intensity distribution in the vicinity of the reflective surface, calculate a wavefront aberration of an X-ray condensing optical system from the complex amplitude distribution, and control the reflective surface of the X-ray mirror with the wavefront adjustable function so that the wavefront aberration is minimized.

Abstract: A high precision posture control method for sustaining the posture of an X-ray optical element constantly at 1 ?rad or less. A longitudinal condensation mirror (5) and a lateral condensation mirror, each having a condensation plane band (7) consisting of an elliptical reflective surface, are arranged perpendicularly to each other to form a K-B mirror arrangement. Fresnel mirrors are respectively constituted of a pair of planar reflective surfaces (9, 10) formed in the vicinities of the incident side end and the exit side end of the condensation plane band of each condensation mirror. Interference fringe (13) by the Fresnel mirror of each condensation mirror is independently monitored at a position insusceptible to a condensation beam by the condensation plane band, and variation in interference fringe is detected electrically and its detection signal is used as a feedback signal for posture control of each condensation mirror.

Abstract: To provide a method for measuring a plane mirror or a curved surface mirror close to plane mirror for condensing hard X-rays or soft X-rays used in a radiation light facility, especially an elliptical or tubular object having a steep profile exceeding 1×10?4 rad, ultra precisely with a precision on nano order or sub-nano order. Overall profile is measured by using overall profile data obtained from a Fizeau interferometer and stitching a plurality of micromeasurement data from a Michelson microinterferometer.

Abstract: To provide a method for measuring a plane mirror or a curved surface mirror close to plane mirror for condensing hard X-rays or soft X-rays used in a radiation light facility, especially an elliptical or tubular object having a steep profile exceeding 1×10?4 rad, ultra precisely with a precision on nano order or sub-nano order. Overall profile is measured by using overall profile data obtained from a Fizeau interferometer and stitching a plurality of micromeasurement data from a Michelson microinterferometer.