Patents by Inventor Hidekazu Takekoshi
Hidekazu Takekoshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11342157Abstract: A charged particle beam inspection apparatus includes a movable stage, configured to hold a substrate placed on the movable stage; a stage control circuit, configured to continuously move the movable stage in a direction opposite to a first direction; a deflection control circuit, configured to control a deflector to collectively deflect multiple beams to an N×N? small region group including N small regions, the collective deflection includes performing tracking deflection of the multiple beams and collectively deflecting the multiple beams to a new group of N×N? small regions and sequentially perform a first and a second step, a detector configured to detect secondary electrons emitted from the substrate due to irradiation of the substrate with the multiple beams, and combinations of a value of N and a value of M are set such that the greatest common divisor of the value of N and the value of M is 1.Type: GrantFiled: December 18, 2020Date of Patent: May 24, 2022Assignee: NuFlare Technology, Inc.Inventor: Hidekazu Takekoshi
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Publication number: 20210202206Abstract: A charged particle beam inspection apparatus includes a movable stage, configured to hold a substrate placed on the movable stage; a stage control circuit, configured to continuously move the movable stage in a direction opposite to a first direction; a deflection control circuit, configured to control a deflector to collectively deflect multiple beams to an N×N? small region group including N small regions, the collective deflection includes performing tracking deflection of the multiple beams and collectively deflecting the multiple beams to a new group of N×N? small regions and sequentially perform a first and a second step, a detector configured to detect secondary electrons emitted from the substrate due to irradiation of the substrate with the multiple beams, and combinations of a value of N and a value of M are set such that the greatest common divisor of the value of N and the value of M is 1.Type: ApplicationFiled: December 18, 2020Publication date: July 1, 2021Applicant: NuFlare Technology, Inc.Inventor: Hidekazu TAKEKOSHI
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Patent number: 10896801Abstract: A multiple-electron-beam-image acquisition apparatus includes an electromagnetic lens to receive and refract multiple electron beams, an aberration corrector, disposed in a magnetic field of the electromagnetic lens, to correct aberration of the multiple electron beams, an aperture-substrate, disposed movably at the upstream of the aberration corrector with respect to an advancing direction of the multiple electron beams, to selectively make an individual beam of the multiple electron beams pass therethrough independently, a movable stage to dispose thereon the aberration corrector, a stage control circuit, using an image caused by the individual beam selectively made to pass, to move the stage to align the position of the aberration corrector to the multiple electron beams having been relatively aligned with the electromagnetic lens, and a detector to detect multiple secondary electron beams emitted because the target object surface is irradiated with multiple electron beams having passed through the aberratType: GrantFiled: May 22, 2019Date of Patent: January 19, 2021Assignee: NuFlare Technology, Inc.Inventors: Kazuhiko Inoue, Yoshihiro Izumi, Hidekazu Takekoshi
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Patent number: 10665422Abstract: An electron beam image acquisition apparatus includes a deflector to deflect an electron beam, a deflection control system to control the deflector, a measurement circuitry to measure, while moving a stage for placing thereon a substrate on which a figure pattern is formed, an edge position of a mark pattern arranged on the stage by scanning the mark pattern with an electron beam, a delay time calculation circuitry to calculate, using information on the edge position, a deflection control delay time which is a delay time to start deflection control occurring in the deflection control system, a correction circuitry to correct, using the deflection control delay time, a deflection position of the electron beam, and an image acquisition mechanism to include the deflector and acquire an image of the figure pattern at a corrected deflection position on the substrate.Type: GrantFiled: September 17, 2018Date of Patent: May 26, 2020Assignee: NUFLARE TECHNOLOGY, INC.Inventor: Hidekazu Takekoshi
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Publication number: 20190362928Abstract: A multiple-electron-beam-image acquisition apparatus includes an electromagnetic lens to receive and refract multiple electron beams, an aberration corrector, disposed in a magnetic field of the electromagnetic lens, to correct aberration of the multiple electron beams, an aperture-substrate, disposed movably at the upstream of the aberration corrector with respect to an advancing direction of the multiple electron beams, to selectively make an individual beam of the multiple electron beams pass therethrough independently, a movable stage to dispose thereon the aberration corrector, a stage control circuit, using an image caused by the individual beam selectively made to pass, to move the stage to align the position of the aberration corrector to the multiple electron beams having been relatively aligned with the electromagnetic lens, and a detector to detect multiple secondary electron beams emitted because the target object surface is irradiated with multiple electron beams having passed through the aberratType: ApplicationFiled: May 22, 2019Publication date: November 28, 2019Applicant: NuFlare Technology, Inc.Inventors: Kazuhiko INOUE, Yoshihiro IZUMI, Hidekazu TAKEKOSHI
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Patent number: 10373798Abstract: A multi charged particle beam inspection apparatus includes a plurality of sensors, arranged inside or on a periphery of a secondary electron image acquisition mechanism, to measure a plurality of interfering factors, a determination circuit to determine, for each interfering factor, whether change exceeding a corresponding threshold is a first case which returns to the original state within a predetermined time period, or a second case which does not return to the original state even if the predetermined time period has passed, and a comparison circuit to input a reference image of a region corresponding to the secondary electron image acquired, and compare the secondary electron image with the reference image, wherein in the case where change of the second case occurs, the secondary electron image acquisition mechanism suspends the acquisition operation of the secondary electron image, and calibrates a change amount of the multiple charged particle beams.Type: GrantFiled: February 22, 2018Date of Patent: August 6, 2019Assignee: NUFLARE TECHNOLOGY, INC.Inventor: Hidekazu Takekoshi
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Patent number: 10345724Abstract: According to one aspect of the present invention, a method of correcting a position of a stage mechanism, includes generating a two-dimensional map of a distortion amount at a position of a stage by applying a distortion amount of a position in a first direction of the stage at each of measured positions in a second direction as a distortion amount of a position in the first direction of the stage at each position in the second direction at each position in the first direction and by applying a distortion amount of a position in the second direction of the stage at each of measured positions in the first direction as a distortion amount of a position in the second direction of the stage at each position in the first direction at each position in the second direction; and correcting position data by using the two-dimensional map.Type: GrantFiled: December 7, 2017Date of Patent: July 9, 2019Assignee: NUFLARE TECHNOLOGY, INC.Inventors: Rieko Nishimura, Hidekazu Takekoshi
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Publication number: 20190096631Abstract: An electron beam image acquisition apparatus includes a deflector to deflect an electron beam, a deflection control system to control the deflector, a measurement circuitry to measure, while moving a stage for placing thereon a substrate on which a figure pattern is formed, an edge position of a mark pattern arranged on the stage by scanning the mark pattern with an electron beam, a delay time calculation circuitry to calculate, using information on the edge position, a deflection control delay time which is a delay time to start deflection control occurring in the deflection control system, a correction circuitry to correct, using the deflection control delay time, a deflection position of the electron beam, and an image acquisition mechanism to include the deflector and acquire an image of the figure pattern at a corrected deflection position on the substrate.Type: ApplicationFiled: September 17, 2018Publication date: March 28, 2019Applicant: NUFLARE TECHNOLOGY, INC.Inventor: Hidekazu Takekoshi
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Publication number: 20180286630Abstract: A multi charged particle beam inspection apparatus includes a plurality of sensors, arranged inside or on a periphery of a secondary electron image acquisition mechanism, to measure a plurality of interfering factors, a determination circuit to determine, for each interfering factor, whether change exceeding a corresponding threshold is a first case which returns to the original state within a predetermined time period, or a second case which does not return to the original state even if the predetermined time period has passed, and a comparison circuit to input a reference image of a region corresponding to the secondary electron image acquired, and compare the secondary electron image with the reference image, wherein in the case where change of the second case occurs, the secondary electron image acquisition mechanism suspends the acquisition operation of the secondary electron image, and calibrates a change amount of the multiple charged particle beams.Type: ApplicationFiled: February 22, 2018Publication date: October 4, 2018Applicant: NUFLARE TECHNOLOGY, INC.Inventor: Hidekazu Takekoshi
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Publication number: 20180210353Abstract: According to one aspect of the present invention, a method of correcting a position of a stage mechanism, includes generating a two-dimensional map of a distortion amount at a position of a stage by applying a distortion amount of a position in a first direction of the stage at each of measured positions in a second direction as a distortion amount of a position in the first direction of the stage at each position in the second direction at each position in the first direction and by applying a distortion amount of a position in the second direction of the stage at each of measured positions in the first direction as a distortion amount of a position in the second direction of the stage at each position in the first direction at each position in the second direction; and correcting position data by using the two-dimensional map.Type: ApplicationFiled: December 7, 2017Publication date: July 26, 2018Applicant: NUFLARE TECHNOLOGY, INC.Inventors: Rieko Nishimura, Hidekazu Takekoshi
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Patent number: 8421040Abstract: A writing apparatus includes a writing unit configured to write a first pattern onto a first mask substrate and a second pattern being complementary to the first pattern onto a second mask substrate using a charged particle beam, and an addition unit configured to add a positional deviation amount of the first pattern having been written on the first mask substrate to a writing position of the second pattern, wherein the writing unit writes the second pattern at the writing position on the second mask substrate, where the positional deviation amount of the first pattern has been added.Type: GrantFiled: August 4, 2009Date of Patent: April 16, 2013Assignee: NuFlare Technology, Inc.Inventor: Hidekazu Takekoshi
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Patent number: 8030626Abstract: An average write speed M is calculated by averaging write speeds for blocks of a tentative block size La, and write speed variation ? of the blocks with respect to the average write speed M is calculated (Step S12). A maximum speed Vmax is calculated by accelerating and then decelerating (or decelerating and then accelerating) a stage when moving the stage by the width of one of the blocks of the tentative block size La (Step S13). When the relationship “Vmax?M??” does not hold, the tentative block size La is increased (Step S15). When the relationship “Vmax?M??” holds, the tentative block size La is set as an optimal block size Lb (Step S16).Type: GrantFiled: February 12, 2010Date of Patent: October 4, 2011Assignee: NuFlare Technology, Inc.Inventor: Hidekazu Takekoshi
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Publication number: 20100200773Abstract: An average write speed M is calculated by averaging write speeds for blocks of a tentative block size La, and write speed variation ? of the blocks with respect to the average write speed M is calculated (Step S12). A maximum speed Vmax is calculated by accelerating and then decelerating (or decelerating and then accelerating) a stage when moving the stage by the width of one of the blocks of the tentative block size La (Step S13). When the relationship “Vmax?M??” does not hold, the tentative block size La is increased (Step S15). When the relationship “Vmax?M??” holds, the tentative block size La is set as an optimal block size Lb (Step S16).Type: ApplicationFiled: February 12, 2010Publication date: August 12, 2010Applicant: NuFlare Technology, Inc.Inventor: Hidekazu TAKEKOSHI
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Publication number: 20100032588Abstract: A writing apparatus includes a writing unit configured to write a first pattern onto a first mask substrate and a second pattern being complementary to the first pattern onto a second mask substrate using a charged particle beam, and an addition unit configured to add a positional deviation amount of the first pattern having been written on the first mask substrate to a writing position of the second pattern, wherein the writing unit writes the second pattern at the writing position on the second mask substrate, where the positional deviation amount of the first pattern has been added.Type: ApplicationFiled: August 4, 2009Publication date: February 11, 2010Applicant: NuFlare Technology, Inc.Inventor: Hidekazu TAKEKOSHI
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Publication number: 20090032738Abstract: A charged particle beam writing apparatus includes a dividing unit configured to virtually divide a writing region of a target workpiece into a plurality of small regions along a writing direction, a calculating unit configured to calculate a writing speed of each of the plurality of small regions by using a linear programming and a writing unit configured to write a desired pattern in each of the plurality of small regions at the writing speed calculated for each of the plurality of small regions by using a charged particle beam.Type: ApplicationFiled: June 27, 2008Publication date: February 5, 2009Applicant: NuFlare Technology, Inc.Inventor: Hidekazu TAKEKOSHI
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Publication number: 20080299490Abstract: A charged particle beam writing apparatus includes a stage on which a first mask substrate and a second mask substrate are arranged side by side, and a writing unit to write a first pattern on the first mask substrate and a second pattern, which complements the first pattern, on the second mask substrate, by using charged particle beams.Type: ApplicationFiled: May 21, 2008Publication date: December 4, 2008Applicant: NuFlare Technology, Inc.Inventor: Hidekazu TAKEKOSHI
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Patent number: 6812472Abstract: In the context of charged-particle-beam (CPB) microlithography systems, robotic manipulators are disclosed for conveying objects such as reticles and substrates simultaneously with performing exposures without causing significant perturbation of the charged particle beam. To such end, the subject manipulators comprise moving members that are made of substantially non-magnetic materials. As the moving members move in the vicinity of a magnetic field controlling exposure-beam trajectory, the beam trajectory is less affected by stray magnetic fields that otherwise would be generated if the moving members were made of magnetic materials. Hence, for better throughput, reticle and/or substrate conveyance can be conducted while exposures are being performed, without adversely affecting exposure accuracy.Type: GrantFiled: July 1, 2003Date of Patent: November 2, 2004Assignee: Nikon CorporationInventor: Hidekazu Takekoshi
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Publication number: 20040007677Abstract: In the context of charged-particle-beam (CPB) microlithography systems, robotic manipulators are disclosed for conveying objects such as reticles and substrates simultaneously with performing exposures without causing significant perturbation of the charged particle beam. To such end, the subject manipulators comprise moving members that are made of substantially non-magnetic materials. As the moving members move in the vicinity of a magnetic field controlling exposure-beam trajectory, the beam trajectory is less affected by stray magnetic fields that otherwise would be generated if the moving members were made of magnetic materials. Hence, for better throughput, reticle and/or substrate conveyance can be conducted while exposures are being performed, without adversely affecting exposure accuracy.Type: ApplicationFiled: July 1, 2003Publication date: January 15, 2004Applicant: Nikon CorporationInventor: Hidekazu Takekoshi
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Patent number: 6011262Abstract: The present invention discloses an object observing apparatus comprising a stage for mounting a sample to be observed; a primary optical system, having an electron gun, for emitting a primary irradiation beam to the stage; and a secondary optical system, having an inlet facing the stage, for receiving an electron generated when the sample is irradiated with the primary irradiation beam and forming an image thereof; wherein the secondary optical system comprises an imaging optical system for forming an image of the electron incident thereon, and a field aperture having a plurality of optical patterns and being adapted to selectively attach and detach each optical pattern at a predetermined position or an aperture stop having at least one aperture size and being selectively attachable and detachable.Type: GrantFiled: March 25, 1998Date of Patent: January 4, 2000Assignee: Nikon CorporationInventors: Muneki Hamashima, Hidekazu Takekoshi