Patents by Inventor Hideki Amii

Hideki Amii has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200377434
    Abstract: An object of the present invention is to provide a simple, low-cost, and industrial method of producing a compound having a polyene skeleton containing hydrogen and fluorine and/or chlorine. A method of producing a. halogenated diene represented by formula (1): A1A2C=CA3-CA4=CA5A6 [A1, A2, A5, and A6 are each independently hydrogen, fluorine, chlorine, a (perfluoro)alkyl group having 1 to 3 carbon atoms, or a (perfluoro)alkenyl group; A3 and A4 are each independently hydrogen, fluorine, or chlorine; at least one of A1 to A6 is hydrogen; at least one of A1 to A6 is fluorine or chlorine] comprises a step of subjecting the same or different halogenated olefin(s) represented by for (2): A7A8C=CA9X [A7 and A8 are each independently hydrogen, fluorine, chlorine, a (perfluoro)alkyl group having 1 to 3 carbon atoms, or a (perfluoro)alkenyl group; A9 is each independently hydrogen, fluorine, or chlorine; X is bromine or iodine] to a coupling reaction in the presence of a zero-valent metal.
    Type: Application
    Filed: April 26, 2018
    Publication date: December 3, 2020
    Inventors: Hideki AMII, Mitsuharu SHIMODA, Yoshihiko IKETANI, Ryo KIMURA
  • Patent number: 10450253
    Abstract: A simple production process is provided of a perfluoroalkyl compound that uses monohydroperfluoroalkane as a starting material, the perfluoroalkyl compound being an important intermediate of organic electronic materials, medicine, agricultural chemicals, functional polymer materials and the like. With monohydroperfluoroalkane is reacted a base and then a carbonyl compound to produce an alcohol having a perfluoroalkyl group. For example, potassium hydroxide is made to interact with trifluoromethane, and a reaction with a carbonyl compound is induced to produce an alcohol having a trifluoromethyl group.
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: October 22, 2019
    Assignees: KANTO DENKA KOGYO CO., LTD., NATIONAL UNIVERSITY CORPORATION GUNMA UNIVERSITY
    Inventors: Hideki Amii, Kazuki Komoda, Masafumi Kobayashi, Yutaka Nakamura, Ryusuke Obinata, Akinori Harada
  • Publication number: 20190169107
    Abstract: A simple production process is provided of a perfluoroalkyl compound that uses monohydroperfluoroalkane as a starting material, the perfluoroalkyl compound being an important intermediate of organic electronic materials, medicine, agricultural chemicals, functional polymer materials and the like. With monohydroperfluoroalkane is reacted a base and then a carbonyl compound to produce an alcohol having a perfluoroalkyl group. For example, potassium hydroxide is made to interact with trifluoromethane, and a reaction with a carbonyl compound is induced to produce an alcohol having a trifluoromethyl group.
    Type: Application
    Filed: February 16, 2017
    Publication date: June 6, 2019
    Inventors: Hideki AMII, Kazuki KOMODA, Masafumi KOBAYASHI, Yutaka NAKAMURA, Ryusuke OBINATA, Akinori HARADA
  • Patent number: 8802886
    Abstract: Disclosed is a method for producing a compound having a difluoromethylene group at an even lower cost and with excellent yield. The production method of the present invention is a method for producing an aromatic difluoroacetic acid ester, which comprises reacting an iodobenzene containing an electro attracting group and an ?-silyl difluoroacetic acid ester in the presence of a metal halide.
    Type: Grant
    Filed: October 26, 2010
    Date of Patent: August 12, 2014
    Assignee: Central Glass Company, Limited
    Inventors: Hideki Amii, Kenichi Fujikawa, Yasutaka Fujioka, Makoto Matsuura
  • Patent number: 8729320
    Abstract: Provided is a method for producing a difluorocyclopropane compound under milder reaction conditions and with high selectivity and high yield. The method for producing a difluorocyclopropane compound of the present invention is characterized by using sodium bromodifluoroacetate as a difluorocyclopropanation agent. With the disclosed method, a difluorocyclopropane compound can be produced under milder reaction conditions and with a higher conversion rate and a higher yield compared to conventional art. Further, by-products can be reduced significantly, thus allowing waste to be greatly reduced. Accordingly, the production method of the present invention is easy to implement industrially (can be employed on an industrial scale) and is thus extremely practical and useful.
    Type: Grant
    Filed: October 26, 2010
    Date of Patent: May 20, 2014
    Assignee: Central Glass Company, Limited
    Inventors: Hideki Amii, Kojun Oshiro, Yoshimichi Morimoto, Makoto Matsuura
  • Publication number: 20120277458
    Abstract: Provided is a method for producing a difluorocyclopropane compound under milder reaction conditions and with high selectivity and high yield. The method for producing a difluorocyclopropane compound of the present invention is characterized by using sodium bromodifluoroacetate as a difluorocyclopropanation agent. With the disclosed method, a difluorocyclopropane compound can be produced under milder reaction conditions and with a higher conversion rate and a higher yield compared to conventional art. Further, by-products can be reduced significantly, thus allowing waste to be greatly reduced. Accordingly, the production method of the present invention is easy to implement industrially (can be employed on an industrial scale) and is thus extremely practical and useful.
    Type: Application
    Filed: October 26, 2010
    Publication date: November 1, 2012
    Inventors: Hideki Amii, Kojun Oshiro, Yoshimichi Morimoto, Makoto Matsuura
  • Publication number: 20120220795
    Abstract: Disclosed is a method for producing a compound having a difluoromethylene group at an even lower cost and with excellent yield. The production method of the present invention is a method for producing an aromatic difluoroacetic acid ester, which comprises reacting an iodobenzene containing an electro attracting group and an ?-silyl difluoroacetic acid ester in the presence of a metal halide.
    Type: Application
    Filed: October 26, 2010
    Publication date: August 30, 2012
    Inventors: Hideki Amii, Kenichi Fujikawa, Yasutaka Fujioka, Makoto Matsuura
  • Patent number: 6380415
    Abstract: A process for producing an octafluoro[2,2]paracyclophane includes the steps of (a) reacting 1,4-bis(trifluoromethyl)benzene with a halogenated silane represented by the general formula (1), in the presence of a low valence metal, thereby obtaining a novel compound (precursor) represented by the general formula (2); and (b) conducting in the presence of a fluoride ion a dimerization of the compound into the octafluoro[2,2]paracyclophane, R3SiX  (1) where each R is independently an alkyl group or aryl group, and X is a halogen atom, where R is defined as above. It is possible to produce octafluoro[2,2]paracyclophane with a high yield from 1,4-bis(trifluoromethyl)benzene, which is easily available, via the above compound.
    Type: Grant
    Filed: February 14, 2001
    Date of Patent: April 30, 2002
    Assignee: Central Glass Company, Limited
    Inventors: Kenji Uneyama, Hideki Amii
  • Publication number: 20010044561
    Abstract: A process for producing an octafluoro[2,2]paracyclophane includes the steps of (a) reacting 1,4-bis(trifluoromethyl)benzene with a halogenated silane represented by the general formula (1), in the presence of a low valence metal, thereby obtaining a novel compound (precursor) represented by the general formula (2); and (b) conducting in the presence of a fluoride ion a dimerization of the compound into the octafluoro[2,2]paracyclophane,
    Type: Application
    Filed: February 14, 2001
    Publication date: November 22, 2001
    Inventors: Kenji Uneyama, Hideki Amii