Abstract: An irradiation treatment device is provided in which uniform irradiation treatment with high speed can be achieved without damaging a substrate, even in the case in which the substrate to be treated is enlarged and exceeds the length of the rod-shaped dielectric barrier discharge lamp. The object is achieved in a substrate treatment device using dielectric barrier discharge lamps in which the dielectric barrier discharge lamps and the substrate are transported relative to one another and in which the surface of this substrate is irradiated with UV light from the dielectric barrier discharge lamps, in that the length for the above described dielectric barrier discharge lamps in the lengthwise direction is less than the length in the direction perpendicular to the transport direction of the substrate.

Abstract: An irradiation treatment device is provided in which uniform irradiation treatment with high speed can be achieved without damaging a substrate, even in the case in which the substrate to be treated is enlarged and exceeds the length of the rod-shaped dielectric barrier discharge lamp. The object is achieved in a substrate treatment device using dielectric barrier discharge lamps in which the dielectric barrier discharge lamps and the substrate are transported relative to one another and in which the surface of this substrate is irradiated with UV light from the dielectric barrier discharge lamps, in that the length for the above described dielectric barrier discharge lamps in the lengthwise direction is less than the length in the direction perpendicular to the transport direction of the substrate.