Patents by Inventor Hideki Koitabashi

Hideki Koitabashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6141082
    Abstract: In order to provide a search alignment method capable of high-speed alignment without a relative movement between an alignment system and a substrate, an alignment mark is constituted by a plurality of element marks having shapes different from each other, the plurality of element marks are provided in such a manner that each two of them has a gap a little shorter than the size of the field of view of the alignment system therebetween, and if even one of the element marks constituting the alignment mark comes into the field of view of the alignment system, said element mark is identified out of all of said element marks, whereby the position of the entire alignment is measured from the position of said one element mark. Therefore, if the alignment mark is moved in a range wider than the field of view of the alignment system, it is possible to detect the position of the alignment mark by one measurement.
    Type: Grant
    Filed: October 14, 1998
    Date of Patent: October 31, 2000
    Assignee: Nikon Corporation
    Inventors: Kei Nara, Seiji Miyazaki, Hideki Koitabashi
  • Patent number: 5999244
    Abstract: Positional discrepancies of images of segmental areas, which are caused by stretching of a substrate in the Y direction, are corrected by changing magnifications of respective projection optical systems and inclinations of parallel plane glass pieces with respect optical axes. After that, positional discrepancies of the images after the correction are accurately detected by using a calibration system for the projection optical systems. Thus it is possible to confirm whether or not the positional discrepancies are accurately corrected. If the correction is insufficient as a result of the confirmation, at least one of correction of the magnifications of the respective projection optical systems and shift of the images projected through the respective projection optical systems onto the substrate is executed again so that amounts of the positional discrepancies are sufficiently small.
    Type: Grant
    Filed: November 4, 1996
    Date of Patent: December 7, 1999
    Assignee: Nikon Corporation
    Inventors: Masamitsu Yanagihara, Kei Hara, Seiji Miyazaki, Hideki Koitabashi, Yoichi Hamashima, Hiroshi Kitano, Yoshiyuki Katamata
  • Patent number: 5849441
    Abstract: In order to provide a search alignment method capable of high-speed alignment without a relative movement between an alignment system and a substrate, an alignment mark is constituted by a plurality of element marks having shapes different from each other, the plurality of element marks are provided in such a manner that each two of them has a gap a little shorter than the size of the field of view of the alignment system therebetween, and if even one of the element marks constituting the alignment mark comes into the field of view of the alignment system, said element mark is identified out of all of said element marks, whereby the position of the entire alignment is measured from the position of said one element mark. Therefore, if the alignment mark is moved in a range wider than the field of view of the alignment system, it is possible to detect the position of the alignment mark by one measurement.
    Type: Grant
    Filed: February 3, 1997
    Date of Patent: December 15, 1998
    Assignee: Nikon Corporation
    Inventors: Kei Nara, Seiji Miyazaki, Hideki Koitabashi
  • Patent number: 5640243
    Abstract: An image in which a feature corresponding to a reference mark formed at a predetermined position in an exposure apparatus is formed at a predetermined position in an arbitrary area is stored as a reference image, and a reference image including an image corresponding to the reference mark is detected from an image to be processed obtained by picking up an image near the reference mark to detect the position of the reference mark in the image to be processed, thus enabling detection of the positional relationship between a reference in the exposure apparatus and substrate alignment means.
    Type: Grant
    Filed: April 26, 1995
    Date of Patent: June 17, 1997
    Assignee: Nikon Corporation
    Inventors: Hideki Koitabashi, Masamitsu Yanagihara, Junji Hazama
  • Patent number: 5500736
    Abstract: A position detecting method detects each position of a photosensitive substrate when executing shots of circuit patterns so that the circuit patterns are further superposed on the photosensitive substrate already formed with the circuit patterns. The method comprises the steps of performing a shot of a circuit pattern of a reticle in superposition on liquid crystal pixel segments already formed on a glass plate, registering, in a memory, a circuit pattern as a reference image in the liquid crystal pixel segment and performing pattern matching with other fields of the liquid crystal pixel segments by use of this reference image. An alignment is conducted based on a position of circuit pattern extracted thereby.
    Type: Grant
    Filed: November 7, 1994
    Date of Patent: March 19, 1996
    Assignee: Nikon Corporation
    Inventors: Hideki Koitabashi, Masamitsu Yanagihara, Junji Hazama