Patents by Inventor Hideki Komatsuda

Hideki Komatsuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10459343
    Abstract: An object is to provide an illumination apparatus that achieves illumination with a uniform illuminance distribution, while reducing a light quantity loss. An illumination apparatus for illuminating an illumination target surface has: a deflection member configured to form an illuminance distribution with a periodic pattern along a predetermined direction on a predetermined face traversing an optical path; and an optical integrator system having a plurality of wavefront division facets arrayed on the predetermined face and configured to form secondary light sources with use of a beam from the deflection member; the deflection member forms the illuminance distribution with the periodic pattern of an integer times or a unit fraction times an array period of the plurality of wavefront division facets.
    Type: Grant
    Filed: November 15, 2018
    Date of Patent: October 29, 2019
    Assignee: NIKON CORPORATION
    Inventor: Hideki Komatsuda
  • Publication number: 20190302621
    Abstract: There is provided a reflective image-forming optical system which is applicable to an exposure apparatus using, for example, EUV light and which is capable of increasing numerical aperture while enabling optical path separation of light fluxes. In a reflective imaging optical system (6) forming an image of a first plane (4) onto a second plane (7), the numerical aperture on a side of the second plane with respect to a first direction (X direction) on the second plane is greater than 1.1 times a numerical aperture on the side of the second plane with respect to a second direction (Y direction) crossing the first direction on the second plane. The reflecting imaging optical system has an aperture stop (AS) defining the numerical aperture on the side of the second plane, and the aperture stop has an elliptic-shaped opening of which size in a major axis direction (X direction) is greater than 1.1 times that in a minor axis direction (Y direction).
    Type: Application
    Filed: March 5, 2019
    Publication date: October 3, 2019
    Inventor: Hideki KOMATSUDA
  • Publication number: 20190302435
    Abstract: An optical apparatus, which illuminates a first area with light from a light source while the first area is longer in a second direction intersecting a first direction than in the first direction, includes a collector optical member which is arranged in an optical path between the light source and the first area, and condenses the light from the light source to form a second area in a predetermined plane, the second area being longer in a fourth direction intersecting a third direction than in the third direction; and a first fly's eye optical member which is provided within the predetermined plane including the second area, and has a plurality of first optical elements guiding the light of the collector optical member to the first area.
    Type: Application
    Filed: June 4, 2019
    Publication date: October 3, 2019
    Applicant: NIKON CORPORATION
    Inventors: Hideki KOMATSUDA, Yoshio KAWABE
  • Patent number: 10345708
    Abstract: An optical apparatus, which illuminates a first area with light from a light source while the first area is longer in a second direction intersecting a first direction than in the first direction, includes a collector optical member which is arranged in an optical path between the light source and the first area, and condenses the light from the light source to form a second area in a predetermined plane, the second area being longer in a fourth direction intersecting a third direction than in the third direction; and a first fly's eye optical member which is provided within the predetermined plane including the second area, and has a plurality of first optical elements guiding the light of the collector optical member to the first area.
    Type: Grant
    Filed: June 15, 2017
    Date of Patent: July 9, 2019
    Assignee: NIKON CORPORATION
    Inventors: Hideki Komatsuda, Yoshio Kawabe
  • Publication number: 20190086812
    Abstract: An object is to provide an illumination apparatus that achieves illumination with a uniform illuminance distribution, while reducing a light quantity loss. An illumination apparatus for illuminating an illumination target surface has: a deflection member configured to form an illuminance distribution with a periodic pattern along a predetermined direction on a predetermined face traversing an optical path; and an optical integrator system having a plurality of wavefront division facets arrayed on the predetermined face and configured to form secondary light sources with use of a beam from the deflection member; the deflection member forms the illuminance distribution with the periodic pattern of an integer times or a unit fraction times an array period of the plurality of wavefront division facets.
    Type: Application
    Filed: November 15, 2018
    Publication date: March 21, 2019
    Applicant: NIKON CORPORATION
    Inventor: Hideki KOMATSUDA
  • Patent number: 10228623
    Abstract: There is provided a reflective image-forming optical system which is applicable to an exposure apparatus using, for example, EUV light and which is capable of increasing numerical aperture while enabling optical path separation of light fluxes. In a reflective imaging optical system (6) forming an image of a first plane (4) onto a second plane (7), the numerical aperture on a side of the second plane with respect to a first direction (X direction) on the second plane is greater than 1.1 times a numerical aperture on the side of the second plane with respect to a second direction (Y direction) crossing the first direction on the second plane. The reflecting imaging optical system has an aperture stop (AS) defining the numerical aperture on the side of the second plane, and the aperture stop has an elliptic-shaped opening of which size in a major axis direction (X direction) is greater than 1.1 times that in a minor axis direction (Y direction).
    Type: Grant
    Filed: March 16, 2018
    Date of Patent: March 12, 2019
    Assignee: Nikon Corporation
    Inventor: Hideki Komatsuda
  • Patent number: 10162269
    Abstract: An object is to provide an illumination apparatus that achieves illumination with a uniform illuminance distribution, while reducing a light quantity loss. An illumination apparatus for illuminating an illumination target surface has: a deflection member configured to form an illuminance distribution with a periodic pattern along a predetermined direction on a predetermined face traversing an optical path; and an optical integrator system having a plurality of wavefront division facets arrayed on the predetermined face and configured to form secondary light sources with use of a beam from the deflection member; the deflection member forms the illuminance distribution with the periodic pattern of an integer times or a unit fraction times an array period of the plurality of wavefront division facets.
    Type: Grant
    Filed: August 11, 2017
    Date of Patent: December 25, 2018
    Assignee: NIKON CORPORATION
    Inventor: Hideki Komatsuda
  • Publication number: 20180210347
    Abstract: There is provided a reflective image-forming optical system which is applicable to an exposure apparatus using, for example, EUV light and which is capable of increasing numerical aperture while enabling optical path separation of light fluxes. In a reflective imaging optical system (6) forming an image of a first plane (4) onto a second plane (7), the numerical aperture on a side of the second plane with respect to a first direction (X direction) on the second plane is greater than 1.1 times a numerical aperture on the side of the second plane with respect to a second direction (Y direction) crossing the first direction on the second plane. The reflecting imaging optical system has an aperture stop (AS) defining the numerical aperture on the side of the second plane, and the aperture stop has an elliptic-shaped opening of which size in a major axis direction (X direction) is greater than 1.1 times that in a minor axis direction (Y direction).
    Type: Application
    Filed: March 16, 2018
    Publication date: July 26, 2018
    Inventor: Hideki KOMATSUDA
  • Patent number: 9939733
    Abstract: There is provided a reflective imaging optical system forming an image of a first plane onto a second plane, wherein the numerical aperture with respect to a first direction on the second plane is greater than 1.1 times a numerical aperture with respect to a second direction crossing the first direction on the second plane. The reflecting imaging optical system has an aperture stop defining the numerical aperture on the side of the second plane, and the aperture stop has an elliptic-shaped opening of which size in a major axis direction is greater than 1.1 times that in a minor axis direction. The reflective image-forming optical system is applicable to an exposure apparatus using, for example, EUV light and capable of increasing numerical aperture while enabling optical path separation of light fluxes.
    Type: Grant
    Filed: December 31, 2016
    Date of Patent: April 10, 2018
    Assignee: Nikon Corporation
    Inventor: Hideki Komatsuda
  • Publication number: 20170343902
    Abstract: An object is to provide an illumination apparatus that achieves illumination with a uniform illuminance distribution, while reducing a light quantity loss. An illumination apparatus for illuminating an illumination target surface has: a deflection member configured to form an illuminance distribution with a periodic pattern along a predetermined direction on a predetermined face traversing an optical path; and an optical integrator system having a plurality of wavefront division facets arrayed on the predetermined face and configured to form secondary light sources with use of a beam from the deflection member; the deflection member forms the illuminance distribution with the periodic pattern of an integer times or a unit fraction times an array period of the plurality of wavefront division facets.
    Type: Application
    Filed: August 11, 2017
    Publication date: November 30, 2017
    Applicant: NIKON CORPORATION
    Inventor: Hideki KOMATSUDA
  • Publication number: 20170285314
    Abstract: An optical apparatus, which illuminates a first area with light from a light source while the first area is longer in a second direction intersecting a first direction than in the first direction, includes a collector optical member which is arranged in an optical path between the light source and the first area, and condenses the light from the light source to form a second area in a predetermined plane, the second area being longer in a fourth direction intersecting a third direction than in the third direction; and a first fly's eye optical member which is provided within the predetermined plane including the second area, and has a plurality of first optical elements guiding the light of the collector optical member to the first area.
    Type: Application
    Filed: June 15, 2017
    Publication date: October 5, 2017
    Applicant: NIKON CORPORATION
    Inventors: Hideki KOMATSUDA, Yoshio KAWABE
  • Patent number: 9760012
    Abstract: An illumination optical system that illuminates a target surface includes a first deflector, a second deflector, and an optical integrator. The first deflector is arranged on a first face crossing an optical path of light from a light source and has a period in a first direction defined on the first face. The second deflector is arranged on a second face crossing an optical path of light from the first deflector and has a period in a second direction defined on the second face. The optical integrator has a plurality of wavefront division facets arrayed on a third face crossing an optical axis of light from the second deflector. At least one of the first and second deflectors rotates about an optical axis of the illumination optical system or about an axis parallel to the optical axis in order to adjust a pattern of an illumination distribution.
    Type: Grant
    Filed: July 31, 2012
    Date of Patent: September 12, 2017
    Assignee: NIKON CORPORATION
    Inventor: Hideki Komatsuda
  • Patent number: 9703204
    Abstract: An optical apparatus capable of illuminating an irradiation surface under a required illumination condition capable of achieving a high light efficiency while keeping a small light loss due to, for example, the overlap error of illuminating fields. The optical apparatus, which illuminates a first area with light from a light source while the first area is longer in a second direction intersecting a first direction than in the first direction, includes a collector optical member which is arranged in an optical path between the light source and the first area, and condenses the light from the light source to form a second area in a predetermined plane, the second area being longer in a fourth direction intersecting a third direction than in the third direction; and a first fly's eye optical member which is provided within the predetermined plane including the second area, and has a plurality of first optical elements guiding the light of the collector optical member to the first area.
    Type: Grant
    Filed: March 31, 2011
    Date of Patent: July 11, 2017
    Assignee: NIKON CORPORATION
    Inventors: Hideki Komatsuda, Yoshio Kawabe
  • Publication number: 20170146911
    Abstract: There is provided a reflective imaging optical system forming an image of a first plane onto a second plane, wherein the numerical aperture with respect to a first direction on the second plane is greater than 1.1 times a numerical aperture with respect to a second direction crossing the first direction on the second plane. The reflecting imaging optical system has an aperture stop defining the numerical aperture on the side of the second plane, and the aperture stop has an elliptic-shaped opening of which size in a major axis direction is greater than 1.1 times that in a minor axis direction. The reflective image-forming optical system is applicable to an exposure apparatus using, for example, EUV light and capable of increasing numerical aperture while enabling optical path separation of light fluxes.
    Type: Application
    Filed: December 31, 2016
    Publication date: May 25, 2017
    Inventor: Hideki Komatsuda
  • Patent number: 9557548
    Abstract: There is provided a reflective imaging optical system forming an image of a first plane onto a second plane, wherein the numerical aperture with respect to a first direction on the second plane is greater than 1.1 times a numerical aperture with respect to a second direction crossing the first direction on the second plane. The reflecting imaging optical system has an aperture stop defining the numerical aperture on the side of the second plane, and the aperture stop has an elliptic-shaped opening of which size in a major axis direction is greater than 1.1 times that in a minor axis direction. The reflective image-forming optical system is applicable to an exposure apparatus using, for example, EUV light and capable of increasing numerical aperture while enabling optical path separation of light fluxes.
    Type: Grant
    Filed: November 24, 2010
    Date of Patent: January 31, 2017
    Assignee: Nikon Corporation
    Inventor: Hideki Komatsuda
  • Patent number: 9477156
    Abstract: An exit-side fly-eye mirror is provided with a first mirror block having a mirror element as one of a plurality of mirror elements, and a second mirror block having a mirror element as one of the plurality of mirror elements. The first mirror block has a connecting part that protrudes from an area other than the mirror surface of the mirror element, the connecting part providing a connection to the second mirror block. With the connecting part of the first mirror block, a plurality of mirror elements that includes the mirror element of the second mirror block is positioned relative to the mirror element of the first mirror block.
    Type: Grant
    Filed: November 9, 2011
    Date of Patent: October 25, 2016
    Assignee: NIKON CORPORATION
    Inventors: Hideo Takino, Tetsuya Tomofuji, Hideki Komatsuda, Kohtaro Kasashima
  • Patent number: 9195069
    Abstract: An illumination optical apparatus has a beam splitting member which splits an incident beam into a first light beam and a second light beam to form a first illumination region and a second illumination region, a first light-guide optical system which guides the first light beam to the first illumination region, and a second light-guide optical system which guides the second light beam to the second illumination region locate apart from the first illumination region.
    Type: Grant
    Filed: April 10, 2007
    Date of Patent: November 24, 2015
    Assignee: NIKON CORPORATION
    Inventors: Hirohisa Tanaka, Hideki Komatsuda
  • Publication number: 20140293254
    Abstract: An illumination device for illuminating a reticle surface as an illumination target surface with illumination light supplied from a light source is provided with a first polarization beam splitter for separating the illumination light into a first beam and a second beam with respective polarization directions orthogonal to each other; a deformable mirror which is arranged in an optical path of the second beam and a shape of a reflecting surface of which is variable for changing a phase difference distribution between the first beam and the second beam; and a second polarization beam splitter for combining the first beam and the second beam between which the phase difference distribution has been established. The illumination target surface can be illuminated with light having a distribution of various polarization states.
    Type: Application
    Filed: March 12, 2014
    Publication date: October 2, 2014
    Inventor: Hideki KOMATSUDA
  • Publication number: 20140218705
    Abstract: An object is to provide an illumination apparatus that achieves illumination with a uniform illuminance distribution, while reducing a light quantity loss. An illumination apparatus for illuminating an illumination target surface has: a deflection member configured to form an illuminance distribution with a periodic pattern along a predetermined direction on a predetermined face traversing an optical path; and an optical integrator system having a plurality of wavefront division facets arrayed on the predetermined face and configured to form secondary light sources with use of a beam from the deflection member; the deflection member forms the illuminance distribution with the periodic pattern of an integer times or a unit fraction times an array period of the plurality of wavefront division facets.
    Type: Application
    Filed: July 31, 2012
    Publication date: August 7, 2014
    Applicant: NIKON CORPORATION
    Inventor: Hideki Komatsuda
  • Patent number: 8780328
    Abstract: There is disclosed a illumination optical apparatus for illuminating a second surface optically conjugate with a first surface via a reflection type original plate which can be arranged on the first surface, the illumination optical apparatus comprising: a first partial field stop arranged to define a first outer edge of a illumination region which is to be formed on the second surface, in order to limit a light beam traveling toward the first surface; and a second partial field stop arranged to define a second outer edge of the illumination region, in order to limit a light beam reflecting from the reflection type original plate which can be arranged on the first surface, wherein a first distance between the first partial field stop and the first surface is set to be larger than a second distance between the second partial field stop and the first surface.
    Type: Grant
    Filed: February 10, 2010
    Date of Patent: July 15, 2014
    Assignee: Nikon Corporation
    Inventor: Hideki Komatsuda