Patents by Inventor Hideki Miwa

Hideki Miwa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10452368
    Abstract: A storage medium includes: converting, when a first instruction in an innermost loop of loop nests of a source code is executed, the source code such that a second instruction is executed which writes data in cache lines written by execution of the first instruction to be executed a count later in the innermost loop; calculating, when a first conversion code including the second instruction based on a first current iteration count is executed, a first value indicating a first rate; calculating, when a second conversion code including the first instruction based on a second current iteration count is executed, a second value indicating a second rate; comparing the first and second values; and converting a loop nest having the first value larger than the second value and a loop nest having the second value larger than the first value into the first and second conversion codes, respectively.
    Type: Grant
    Filed: June 5, 2018
    Date of Patent: October 22, 2019
    Assignee: FUJITSU LIMITED
    Inventors: Hideki Miwa, Yuta Mukai
  • Publication number: 20180357053
    Abstract: A storage medium includes: converting, when a first instruction in an innermost loop of loop nests of a source code, the source code in such a manner that a second instruction which writes data in cache lines written by execution of a first instruction to be executed a count later in the innermost loop; calculating, when a first conversion code including the second instruction based on a first current iteration count is executed, a first value indicating a first rate; calculating, when a second conversion code including the first instruction based on a second current iteration count is executed, a second value indicating a second rate; comparing the first value and the second value; and converting a loop nest having the first value larger than the second value and a loop nest having the second value larger than the first value into the first and second conversion codes, respectively.
    Type: Application
    Filed: June 5, 2018
    Publication date: December 13, 2018
    Applicant: FUJITSU LIMITED
    Inventors: Hideki MIWA, Yuta Mukai
  • Patent number: 9519567
    Abstract: A device for generating a performance evaluation program includes: a memory; and a processor coupled to the memory. The processor is configured to: analyze a source code of a target program that is subject to performance evaluation, translate the source code into a binary code based on an analysis result of the source code while generating execution binary that has an evaluation area to be used in the performance evaluation at a target location corresponding to a candidate location of the target program, and write an evaluation code in the evaluation area of the execution binary to evaluate performance of the target program based on an evaluation item and the target location of the target program.
    Type: Grant
    Filed: July 23, 2014
    Date of Patent: December 13, 2016
    Assignee: FUJITSU LIMITED
    Inventors: Yuta Mukai, Hideki Miwa
  • Patent number: 9465675
    Abstract: An arithmetic processing device executes a program, and gives first sequence information to a first start time when a first process included in the program starts a first interprocess communication. Then, the first start time and the first sequence information are written in a main storage device. When second sequence information given to a second start time when a second process starts a second interprocess communication is newer than the first sequence information, an operational circuit in a communication control device does not carry out an operation using the first start time. On the other hand, when the second sequence information corresponds to the first sequence information, the operational circuit carries out an operation using the first start time and the second start time and outputs the operation result.
    Type: Grant
    Filed: November 12, 2014
    Date of Patent: October 11, 2016
    Assignee: FUJITSU LIMITED
    Inventors: Hideki Miwa, Ikuo Miyoshi
  • Publication number: 20150154058
    Abstract: An arithmetic processing device executes a program, and gives first sequence information to a first start time when a first process included in the program starts a first interprocess communication. Then, the first start time and the first sequence information are written in a main storage device. When second sequence information given to a second start time when a second process starts a second interprocess communication is newer than the first sequence information, an operational circuit in a communication control device does not carry out an operation using the first start time. On the other hand, when the second sequence information corresponds to the first sequence information, the operational circuit carries out an operation using the first start time and the second start time and outputs the operation result.
    Type: Application
    Filed: November 12, 2014
    Publication date: June 4, 2015
    Inventors: Hideki MIWA, Ikuo MIYOSHI
  • Publication number: 20150089480
    Abstract: A device for generating a performance evaluation program includes: a memory; and a processor coupled to the memory. The processor is configured to: analyze a source code of a target program that is subject to performance evaluation, translate the source code into a binary code based on an analysis result of the source code while generating execution binary that has an evaluation area to be used in the performance evaluation at a target location corresponding to a candidate location of the target program, and write an evaluation code in the evaluation area of the execution binary to evaluate performance of the target program based on an evaluation item and the target location of the target program.
    Type: Application
    Filed: July 23, 2014
    Publication date: March 26, 2015
    Applicant: FUJITSU LIMITED
    Inventors: Yuta Mukai, Hideki MIWA
  • Patent number: 8042603
    Abstract: In a method of manufacturing an aluminum alloy plate for a lithographic printing plate by continuous casting which includes feeding an aluminum alloy melt through a melt feed nozzle between a pair of cooling rollers and rolling the aluminum alloy melt while solidifying between the pair of cooling rollers, a vessel for feeding the aluminum alloy melt to the melt feed nozzle contains the aluminum alloy melt which is adjusted in such a manner that a vertical amplitude at a level of the aluminum alloy melt existing within the vessel is 10 mm or less. This manufacturing method is capable of obtaining an aluminum alloy plate for a lithographic printing plate with a uniform surface composition and manufacturing a lithographic printing plate support having no surface defect.
    Type: Grant
    Filed: February 18, 2009
    Date of Patent: October 25, 2011
    Assignee: FUJIFILM Corporation
    Inventors: Shinya Suzuki, Hirokazu Sawada, Hideki Miwa
  • Patent number: 7850837
    Abstract: The present invention provides a method for preparing an aluminum support for lithographic printing plate, the aluminum support for a lithographic printing plate obtained by the method and a presensitized plate using the same, characterized in that anodizing treatment is performed on an aluminum plate after hydrochloric acid electrolytic graining treatment if necessary, nitric acid electrolytic graining treatment are performed on the aluminum plate at a specified ratio of quantities of electricity, and with this method, a lower-purity aluminum plate could be used and a obtained support for a lithographic printing plate is excellent in press life and scum resistance when a lithographic printing plate is prepared.
    Type: Grant
    Filed: May 11, 2006
    Date of Patent: December 14, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Atsushi Matsuura, Akio Uesugi, Hideki Miwa, Atsuo Nishino, Hirokazu Sawada
  • Publication number: 20090226666
    Abstract: In a method of manufacturing an aluminum alloy plate for a lithographic printing plate by continuous casting which includes feeding an aluminum alloy melt through a melt feed nozzle between a pair of cooling rollers and rolling the aluminum alloy melt while solidifying between the pair of cooling rollers, a vessel for feeding the aluminum alloy melt to the melt feed nozzle contains the aluminum alloy melt which is adjusted in such a manner that a vertical amplitude at a level of the aluminum alloy melt existing within the vessel is 10 mm or less. This manufacturing method is capable of obtaining an aluminum alloy plate for a lithographic printing plate with a uniform surface composition and manufacturing a lithographic printing plate support having no surface defect.
    Type: Application
    Filed: February 18, 2009
    Publication date: September 10, 2009
    Applicant: FUJIFILM Corporation
    Inventors: Shinya Suzuki, Hirokazu Sawada, Hideki Miwa
  • Publication number: 20060201819
    Abstract: The present invention provides a method for preparing an aluminum support for lithographic printing plate, the aluminum support for a lithographic printing plate obtained by the method and a presensitized plate using the same, characterized in that anodizing treatment is performed on an aluminum plate after hydrochloric acid electrolytic graining treatment if necessary, nitric acid electrolytic graining treatment are performed on the aluminum plate at a specified ratio of quantities of electricity, and with this method, a lower-purity aluminum plate could be used and a obtained support for a lithographic printing plate is excellent in press life and scum resistance when a lithographic printing plate is prepared.
    Type: Application
    Filed: May 11, 2006
    Publication date: September 14, 2006
    Inventors: Atsushi Matsuura, Akio Uesugi, Hideki Miwa, Atsuo Nishino, Hirokazu Sawada
  • Patent number: 6805051
    Abstract: A lithographic printing plate support is provided which becomes a support of a PS plate which has excellent ability to withstand repeated printing, and in which defects in appearance, such as dirtying and the like, do not occur. Also provided are a method of manufacturing the lithographic printing plate support and a PS plate which has such merits.
    Type: Grant
    Filed: April 18, 2003
    Date of Patent: October 19, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hideki Miwa, Teruyoshi Yasutake, Atsushi Matsuura, Akio Uesugi
  • Patent number: 6716567
    Abstract: Objects of the present invention are to provide a positive working presensitized plate of a thermal type, which has damage resistance, and which is handled easily in conventional operation, high in sensitivity and excellent in press life when used as a lithographic printing plate, and to provide a support for a lithographic printing plate, which is suitably used for the same. The objects have been achieved by a support for a lithographic printing plate obtained by performing graining treatment, alkali etching treatment and anodizing treatment on an aluminum plate, wherein a ratio of a real area of a surface thereof to an apparent area of the surface set larger by 1.3 to 1.8 times, comprising a pit having an average diameter of 0.3 to 1.
    Type: Grant
    Filed: July 22, 2002
    Date of Patent: April 6, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tadashi Endo, Hisashi Hotta, Katsuyuki Teraoka, Hideki Miwa, Teruyoshi Yasutake
  • Publication number: 20040045466
    Abstract: A lithographic printing plate support is provided which becomes a support of a PS plate which has excellent ability to withstand repeated printing, and in which defects in appearance, such as dirtying and the like, do not occur. Also provided are a method of manufacturing the lithographic printing plate support and a PS plate which has such merits.
    Type: Application
    Filed: April 18, 2003
    Publication date: March 11, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Hideki Miwa, Teruyoshi Yasutake, Atsushi Matsuura, Akio Uesugi
  • Publication number: 20030221572
    Abstract: The present invention provides a method for preparing an aluminum support for lithographic printing plate, the aluminum support for a lithographic printing plate obtained by the method and a presensitized plate using the same, characterized in that anodizing treatment is performed on an aluminum plate after hydrochloric acid electrolytic graining treatment if necessary, nitric acid electrolytic graining treatment are performed on the aluminum plate at a specified ratio of quantities of electricity, and with this method, a lower-purity aluminum plate could be used and a obtained support for a lithographic printing plate is excellent in press life and scum resistance when a lithographic printing plate is prepared.
    Type: Application
    Filed: February 26, 2003
    Publication date: December 4, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Atsushi Matsuura, Akio Uesugi, Hideki Miwa, Atsuo Nishino, Hirokazu Sawada
  • Publication number: 20030145748
    Abstract: Objects of the present invention are to provide a positive working presensitized plate of a thermal type, which has damage resistance, and which is handled easily in conventional operation, high in sensitivity and excellent in press life when used as a lithographic printing plate, and to provide a support for a lithographic printing plate, which is suitably used for the same. The objects have been achieved by a support for a lithographic printing plate obtained by performing graining treatment, alkali etching treatment and anodizing treatment on an aluminum plate, wherein a ratio of a real area of a surface thereof to an apparent area of the surface set larger by 1.3 to 1.8 times, comprising a pit having an average diameter of 0.3 to 1.
    Type: Application
    Filed: July 22, 2002
    Publication date: August 7, 2003
    Inventors: Tadashi Endo, Hisashi Hotta, Katsuyuki Teraoka, Hideki Miwa, Teruyoshi Yasutake
  • Patent number: 6575094
    Abstract: A lithographic printing plate support is provided which becomes a support of a PS plate which has excellent ability to withstand repeated printing, and in which defects in appearance, such as dirtying and the like, do not occur. Also provided are a method of manufacturing the lithographic printing plate support and a PS plate which has such merits.
    Type: Grant
    Filed: June 11, 2001
    Date of Patent: June 10, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hideki Miwa, Teruyoshi Yasutake, Atsushi Matsuura, Akio Uesugi
  • Publication number: 20020011168
    Abstract: A lithographic printing plate support is provided which becomes a support of a PS plate which has excellent ability to withstand repeated printing, and in which defects in appearance, such as dirtying and the like, do not occur. Also provided are a method of manufacturing the lithographic printing plate support and a PS plate which has such merits.
    Type: Application
    Filed: June 11, 2001
    Publication date: January 31, 2002
    Applicant: FUJI PHOTO FILM CO.,LTD.
    Inventors: Hideki Miwa, Teruyoshi Yasutake, Atsushi Matsuura, Akio Uesugi
  • Publication number: 20020008081
    Abstract: Disclosed is a process for the surface treatment of an aluminum support for printing plate which comprises a step of brush-graining with an abrasive brush and an abrasive slurry, characterized in that as the abrasive there is used aluminum hydroxide, the aluminum hydroxide which has been used in graining is dissolved in a sodium aluminate solution and the sodium aluminate solution having a raised supersaturation degree, the aluminum hydroxide which has been left undissolved and seed crystal aluminum hydroxide undergo hydrolysis reaction to produce crystalline aluminum hydroxide which is then purified and recovered.
    Type: Application
    Filed: August 18, 1998
    Publication date: January 24, 2002
    Inventors: HIROSHI FUKUTA, HIDEKI MIWA
  • Patent number: 5985165
    Abstract: The present invention allows the reproduction of a crystalline aluminum hydroxide having a high particle strength and a high purity which can find wide application such as abrasive from a supersaturated sodium aluminate solution which is being recycled in the production of aluminum hydroxide or lithographic printing plate. In a process for the purification of aluminum hydroxide which comprises the hydrolysis reaction of a supersaturated solution of sodium aluminate to crystallize aluminum hydroxide, the improvement which comprises the steps of keeping the temperature of a suspension formed by mixing a mother liquor having a total caustic soda concentration of from 50 to 700 g/l and an aluminum concentration or from 0 to 300 g/l with crystalline aluminum hydroxide at a range of from 10.degree. C. to 200.degree. C. for at least 1 to 48 hours, mixing the suspension with the supersaturated solution of sodium aluminate, and then causing the crystallization reaction at the crystallization reaction temperature.
    Type: Grant
    Filed: October 31, 1996
    Date of Patent: November 16, 1999
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiroshi Fukuta, Tsutomu Kakei, Tadabumi Tomita, Hideki Miwa