Patents by Inventor Hideki Takakuwa

Hideki Takakuwa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11333978
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition for forming a pattern used as a mask in an ion implanting, including a resin including a repeating unit having an acid-decomposable group, a photoacid generator, and an additive having a melting point or glass transition temperature of lower than 25° C. and a molecular weight of 180 or more, in which a content of the additive is 1% by mass or more with respect to a total solid content in the composition.
    Type: Grant
    Filed: December 30, 2019
    Date of Patent: May 17, 2022
    Assignee: FUJIFILM Corporation
    Inventors: Kohei Higashi, Hideki Takakuwa
  • Publication number: 20220082941
    Abstract: Provided are a laminate that includes a base, an organic layer, a protective layer and a photo-sensitive layer arranged in this order, the photo-sensitive layer containing a resin that contains a repeating unit having an acid-decomposable group represented by Formula (A1) below, the resin containing less than 10% by mass, relative to the total mass of the resin, of a repeating unit having a polar group, the photo-sensitive layer being intended for development with use of a developing solution, and the protective layer being intended for stripping with use of a stripping solution; a composition intended for use in forming the protective layer or the photo-sensitive layer contained in the laminate; and a laminate forming kit intended for use in forming the laminate:
    Type: Application
    Filed: September 20, 2021
    Publication date: March 17, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Atsushi Nakamura, Hideki Takakuwa
  • Publication number: 20220066323
    Abstract: Provided is a laminate that includes a base, an organic layer, a protective layer and a photo-sensitive layer in this order, the photo-sensitive layer contains an onium salt-type photo-acid generator that contains an anion moiety having a group with at least one ring structure selected from the group consisting of condensed ring structure, bridged ring structure and spiro ring structure, the photo-sensitive layer is intended for development with use of a developing solution, and the protective layer is intended for stripping with use of a stripping solution; and also provided are a composition used for forming the protective layer or the photo-sensitive layer contained in the laminate; and a laminate forming kit used for forming the laminate.
    Type: Application
    Filed: September 10, 2021
    Publication date: March 3, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Atsushi NAKAMURA, Hideki Takakuwa
  • Publication number: 20220011485
    Abstract: An object of the present invention is to provide a curable composition capable of forming a cured film having excellent linearity of a pattern, and a light-shielding film, a color filter, a solid-state imaging device, and an infrared sensor, each formed using the curable composition. Another object of the present invention is to provide a pattern forming method and a method for manufacturing a color filter, each using the curable composition.
    Type: Application
    Filed: September 15, 2021
    Publication date: January 13, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Junichi Ito, Hideki Takakuwa, Daisuke Hamada, Yushi Kaneko
  • Patent number: 11156754
    Abstract: An object of the present invention is to provide a curable composition capable of forming a cured film having excellent linearity of a pattern, and a light-shielding film, a color filter, a solid-state imaging device, and an infrared sensor, each formed using the curable composition. Another object of the present invention is to provide a pattern forming method and a method for manufacturing a color filter, each using the curable composition.
    Type: Grant
    Filed: September 14, 2018
    Date of Patent: October 26, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Junichi Ito, Hideki Takakuwa, Daisuke Hamada, Yushi Kaneko
  • Patent number: 10795260
    Abstract: An object of the present invention is to provide a curable composition satisfying both of excellent low reflectivity and excellent developability, a method for producing a cured film, an infrared color filter provided with a light-shielding film, and a solid-state imaging device. The curable composition of the present invention includes a fluorine-containing polymer including a repeating unit represented by Formula (A) and a repeating unit represented by Formula (B), a polymerizable compound, and a coloring agent. In Formula (A), R1 represents a hydrogen atom or an alkyl group, and L1 represents a divalent chained linking group having 3 or more carbon atoms in total, which may include an ester bond. In Formula (B), R2 represents a hydrogen atom or an alkyl group, L2 represents a single bond or a divalent linking group, and Rf represents a monovalent organic group including an fluorine atom.
    Type: Grant
    Filed: February 27, 2018
    Date of Patent: October 6, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Michihiro Ogawa, Hideki Takakuwa, Hisamitsu Tomeba
  • Publication number: 20200142306
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition for forming a pattern used as a mask in an ion implanting, including a resin including a repeating unit having an acid-decomposable group, a photoacid generator, and an additive having a melting point or glass transition temperature of lower than 25° C. and a molecular weight of 180 or more, in which a content of the additive is 1% by mass or more with respect to a total solid content in the composition.
    Type: Application
    Filed: December 30, 2019
    Publication date: May 7, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Kohei HIGASHI, Hideki TAKAKUWA
  • Patent number: 10287422
    Abstract: There is provided a dispersion composition capable of forming a film being excellent in surface conditions, the dispersion composition containing metal oxide particles (A) having a primary particle diameter of 1 nm to 100 nm, a polymer compound (B) having an acid value of less than 120 mgKOH/g, which is represented by the following Formula (1), and a solvent (C).
    Type: Grant
    Filed: August 5, 2016
    Date of Patent: May 14, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Kyouhei Arayama, Hiroaki Idei, Makoto Kubota, Hideki Takakuwa
  • Publication number: 20190018174
    Abstract: An object of the present invention is to provide a curable composition capable of forming a cured film having excellent linearity of a pattern, and a light-shielding film, a color filter, a solid-state imaging device, and an infrared sensor, each formed using the curable composition. Another object of the present invention is to provide a pattern forming method and a method for manufacturing a color filter, each using the curable composition.
    Type: Application
    Filed: September 14, 2018
    Publication date: January 17, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Junichi ITO, Hideki TAKAKUWA, Daisuke HAMADA, Yushi KANEKO
  • Publication number: 20180188650
    Abstract: An object of the present invention is to provide a curable composition satisfying both of excellent low reflectivity and excellent developability, a method for producing a cured film, an infrared color filter provided with a light-shielding film, and a solid-state imaging device. The curable composition of the present invention includes a fluorine-containing polymer including a repeating unit represented by Formula (A) and a repeating unit represented by Formula (B), a polymerizable compound, and a coloring agent. In Formula (A), R1 represents a hydrogen atom or an alkyl group, and L1 represents a divalent chained linking group having 3 or more carbon atoms in total, which may include an ester bond. In Formula (B), R2 represents a hydrogen atom or an alkyl group, L2 represents a single bond or a divalent linking group, and Rf represents a monovalent organic group including an fluorine atom.
    Type: Application
    Filed: February 27, 2018
    Publication date: July 5, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Michihiro OGAWA, Hideki TAKAKUWA, Hisamitsu TOMEBA
  • Publication number: 20170283587
    Abstract: The present invention provides a curable composition which is suitably used for the production of a light-shielding film which has excellent light-shielding properties, exhibits low reflectivity, has excellent pattern linearity, and is not susceptible to chipping; an infrared cut filter with a light-shielding film; and a solid-state imaging device. The curable composition according to the present invention includes a curable compound which has at least one selected from the group consisting of a fluorine atom, a silicon atom, a linear alkyl group having 8 or more carbon atoms, and a branched alkyl group having 3 or more carbon atoms, and a curable functional group; a silane coupling agent; and a black pigment.
    Type: Application
    Filed: June 22, 2017
    Publication date: October 5, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Daisuke HAMADA, Satoru MURAYAMA, Hideki TAKAKUWA, Makoto KUBOTA
  • Publication number: 20170114245
    Abstract: There is provided a dispersion composition having a high dispersion stability, and containing metal oxide particles having a primary particle diameter of 1 nm to 100 nm (A), a polymer compound having an acid value of 120 mgKOH/g or more, which is represented by the following Formula (1) (B), and a solvent (C).
    Type: Application
    Filed: January 6, 2017
    Publication date: April 27, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Kyouhei ARAYAMA, Hiroaki IDEI, Makoto KUBOTA, Hideki TAKAKUWA
  • Patent number: 9625618
    Abstract: An optical member set which has a first optical member formed by curing a composition of curable resins, and a second optical member which is covered by the first optical member, in which the contact angle with water on a surface, which comes into contact with a first optical member, of the second optical member is 70 to 97° and the contact angle with the water on a surface of the opposite side to the side, which comes into contact with the second optical member, of the first optical member is 80 to 115°.
    Type: Grant
    Filed: June 9, 2014
    Date of Patent: April 18, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Keiji Yamamoto, Kazuto Shimada, Hideki Takakuwa, Makoto Kubota
  • Publication number: 20170090083
    Abstract: A laminate includes a first area formed by applying a first composition and a second area formed by applying a second composition on a surface of the first area, and a difference between refractive indexes of the first area and the second area is 0.5 or greater, and the first areas and the second areas are alternately laminated.
    Type: Application
    Filed: December 9, 2016
    Publication date: March 30, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Hirotaka TAKISHITA, Keiji YAMAMOTO, Hideki TAKAKUWA, Keisuke ARIMURA, Kazuto SHIMADA
  • Publication number: 20170029599
    Abstract: There is provided a dispersion composition capable of forming a film being excellent in surface conditions, the dispersion composition containing metal oxide particles (A) having a primary particle diameter of 1 nm to 100 nm, a polymer compound (B) having an acid value of less than 120 mgKOH/g, which is represented by the following Formula (1), and a solvent (C).
    Type: Application
    Filed: August 5, 2016
    Publication date: February 2, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Kyouhei ARAYAMA, Hiroaki IDEI, Makoto KUBOTA, Hideki TAKAKUWA
  • Patent number: 9465142
    Abstract: Provided is a near-infrared absorptive compositions capable of reducing unevenness in the coated surface profile and variation in near-infrared absorptive ability when the near-infrared absorptive compositions are formed into films. The near-infrared absorptive composition comprises a copper complex and a solvent, wherein the near-infrared absorptive composition has a solid content of 10 to 90% by mass and the solvent has a boiling point of 90 to 200° C.
    Type: Grant
    Filed: January 23, 2015
    Date of Patent: October 11, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Naotsugu Muro, Hideki Takakuwa, Seongmu Bak
  • Patent number: 9447270
    Abstract: There is provided a dispersion composition containing (A) a metal oxide particle having a primary particle diameter of 1 nm to 100 nm, (B) a polymer compound represented by the specific formula having a weight average molecular weight of 5,000 to 8,000 and an acid value of 70 to 90 mgKOH/g, and (C) a solvent, and a curable composition containing the dispersion composition and (D) a polymerizable compound.
    Type: Grant
    Filed: February 25, 2015
    Date of Patent: September 20, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Kyouhei Arayama, Hiroaki Idei, Makoto Kubota, Hideki Takakuwa
  • Publication number: 20160011336
    Abstract: Provided are infrared absorbing compositions that allow for preparing infrared absorption patterns having good adhesiveness to substrates on which the infrared absorbing composition is applied. The infrared absorbing composition contains an infrared absorbing material, and a polymerizable compound containing a partial structure represented by formula (1) below: wherein R1 represents a hydrogen atom or an organic group; the asterisk (*) indicates a point of attachment to another atom.
    Type: Application
    Filed: September 22, 2015
    Publication date: January 14, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Hideki TAKAKUWA, Toshihide EZOE, Hidenori TAKAHASHI, Kazuto SHIMADA
  • Publication number: 20150329735
    Abstract: A composition for forming a transparent resin layer of the present invention includes a polymerization initiator having a molar absorption coefficient (?) at a wavelength of 365 nm of 1000 mol?1·L·cm?1 or less; a polymerizable compound; a polymer; and a solvent. The polymerization initiator is preferably at least one selected from the group consisting of an ?-hydroxyacetophenone-based compound and a phosphine-based compound.
    Type: Application
    Filed: July 30, 2015
    Publication date: November 19, 2015
    Applicant: FUJIFILM Corporation
    Inventors: Shoichi NAKAMURA, Hideki TAKAKUWA, Kazuto SHIMADA
  • Publication number: 20150166783
    Abstract: There is provided a dispersion composition having a high dispersion stability, and containing metal oxide particles having a primary particle diameter of 1 nm to 100 nm (A), a polymer compound having an acid value of 120 mgKOH/g or more, which is represented by the following formula (1) (B), and a solvent (C).
    Type: Application
    Filed: February 27, 2015
    Publication date: June 18, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Kyouhei ARAYAMA, Hiroaki IDEI, Makoto KUBOTA, Hideki TAKAKUWA