Abstract: A processing system has: a housing in which an object is housed and that has a part through which light is allowed to pass; an irradiation apparatus that emits a processing beam for processing the object; a first member which an energy beam from the irradiation apparatus that propagates toward an outside of the housing through the part enters; and a second member which the energy beam through the first member enters, the first member reduces an intensity of the energy beam that enter the first member, the second member reduces an intensity of the energy beam that enters the second member from the first member.

Abstract: A processing system is provided with: a support apparatus that is configured to support a processing target; a processing apparatus that performs an additive processing by irradiating a processed area on the processing target with an energy beam and by supplying materials to an area that is irradiated with the energy beam; and a position change apparatus that changes a positional relationship between the support apparatus and an irradiation area of the energy beam from the processing apparatus, wherein the processing system forms a fiducial build object by performing the additive processing on at least one of a first area that is a part of the support apparatus and a second area that is a part of the processing target, and the processing system controls at least one of the processing apparatus and the position change apparatus by using an information relating to the fiducial build object.

Abstract: In an immersion lithography apparatus, a projection optics having a final surface projects a pattern image onto a workpiece through a liquid immersion area between the final surface and an upper surface of the workpiece during an immersion lithography process in which the immersion liquid is supplied from above the workpiece via the liquid supply port and the supplied immersion liquid is collected from above the workpiece via the liquid recovery port. During a cleanup process, an object different from the workpiece is placed instead of the workpiece, a cleaning liquid is supplied onto the object from above the object via the liquid supply port, and the supplied cleaning liquid is collected from above the object via the recovery port. The cleaning liquid is not allowed to be used for projecting the pattern image.

Abstract: An immersion lithography apparatus and method places an object for a cleanup process on a holder of a movable stage of the immersion lithography apparatus, a wafer being held on the holder of the stage and exposed during a liquid immersion lithography process. During the liquid immersion lithography process, device pattern projection is performed and a device pattern image is projected onto the wafer held on the holder to fabricate semiconductor devices. During the cleanup process, a liquid is supplied via a supply port from above the stage holding the object on the holder. During the cleanup process, the object is held on the holder in place of the wafer and the object is used without performing device pattern projection.

Abstract: An immersion lithography apparatus and method places an object for a cleanup process on a holder of a movable stage of the immersion lithography apparatus, a wafer being held on the holder of the stage and exposed during a liquid immersion lithography process. During the liquid immersion lithography process, device pattern projection is performed and a device pattern image is projected onto the wafer held on the holder to fabricate semiconductor devices. During the cleanup process, a liquid is supplied via a supply port from above the stage holding the object on the holder. During the cleanup process, the object is held on the holder in place of the wafer and the object is used without performing device pattern projection.

Abstract: A liquid immersion exposure apparatus includes an optical system via which a substrate is exposed with an exposure beam, and a cleaning device which performs a cleaning operation by filling a space adjacent the optical system with a liquid including bubbles.

Abstract: An immersion lithography apparatus and a cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied from a liquid supply member to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided such that the surface of the object and the optical element are opposite to each other. During a cleanup process, a cleaning liquid is supplied from the liquid supply member onto the surface of the object.

Abstract: An immersion lithography apparatus and cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided below the optical element, a supply port and a recovery port. During a cleanup process, a cleaning liquid is supplied onto the object such that the cleaning liquid covers only a portion of the surface of the object.

Abstract: A lithographic apparatus includes a substrate table on which a substrate is held, a projection system including a final optical element, the projection system projecting a patterned beam of radiation through an immersion liquid onto the substrate adjacent the final optical element to expose the substrate during an immersion lithography process, and a liquid supply system including an inlet. The liquid supply system supplies the immersion liquid during the immersion lithography process and supplies a cleaning liquid, which is different from the immersion liquid, during a cleanup process. The cleanup process and the immersion lithography process are performed at different times.

Abstract: A megasonic immersion lithography exposure apparatus includes an optical transfer chamber for containing an exposure liquid, at least one megasonic plate operably engaging said optical transfer chamber for propagating sonic waves through the exposure liquid, and an optical system provided adjacent to said optical transfer chamber for projecting light through a mask and said exposure liquid and onto a wafer.

Abstract: The present invention provides a calcium absorption enhancer that places no burden on the body of a human or a domestic animal to which a calcium compound is administered and can increase the efficiency with which a calcium content is absorbed into the body by supplying calcium ions in the stomach or the like of the human or the domestic animal in a sustained-release manner after administration of the calcium compound. The calcium absorption enhancer of the present invention contains, as an active ingredient, water-soluble calcium particles that can release calcium ions in an aqueous solution in a sustained-release manner.

Abstract: An immersion lithography apparatus and a cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied from a liquid supply member to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided such that the surface of the object and the optical element are opposite to each other. During a cleanup process, a cleaning liquid is supplied from the liquid supply member onto the surface of the object.

Abstract: An immersion lithography apparatus and cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided below the optical element, a supply port and a recovery port. During a cleanup process, a cleaning liquid is supplied onto the object such that the cleaning liquid covers only a portion of the surface of the object.

Abstract: A lithographic apparatus includes a substrate table on which a substrate is held, a projection system including a final optical element, the projection system projecting a patterned beam of radiation through an immersion liquid onto the substrate adjacent the final optical element to expose the substrate during an immersion lithography process, and a liquid supply system including an inlet. The liquid supply system supplies the immersion liquid during the immersion lithography process and supplies a cleaning liquid, which is different from the immersion liquid, during a cleanup process. The cleanup process and the immersion lithography process are performed at different times.

Abstract: An immersion lithography apparatus has a reticle stage arranged to retain a reticle, a working stage arranged to retain a workpiece, and an optical system including an illumination source and an optical element opposite the workpiece for having an image pattern of the reticle projected by radiation from the illumination source. A gap is defined between the optical element and the workpiece, and a fluid-supplying device serves to supply an immersion liquid into this gap such that the supplied immersion liquid contacts both the optical element and the workpiece during an immersion lithography process. A cleaning device is incorporated for removing absorbed liquid from the optical element during a cleanup process. The cleaning device may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid.

Abstract: A liquid immersion exposure apparatus includes an optical system via which a substrate is exposed with an exposure beam, and a cleaning device which performs a cleaning operation by filling a space adjacent the optical system with a liquid including bubbles.

Abstract: An immersion lithography apparatus has a reticle stage arranged to retain a reticle, a working stage arranged to retain a workpiece, and an optical system including an illumination source and an optical element opposite the workpiece for having an image pattern of the reticle projected by radiation from the illumination source. A gap is defined between the optical element and the workpiece, and a fluid-supplying device serves to supply an immersion liquid into this gap such that the supplied immersion liquid contacts both the optical element and the workpiece during an immersion lithography process. A cleaning device is incorporated for removing absorbed liquid from the optical element during a cleanup process. The cleaning device may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid.

Abstract: A lens cleaning module is provided for a lithography system having an exposure apparatus including an objective lens. The system includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module coupling with the lithography system is provided for cleaning the objective lens in a non-manual cleaning process.

Abstract: A megasonic immersion lithography exposure apparatus includes an optical transfer chamber for containing an exposure liquid, at least one megasonic plate operably engaging said optical transfer chamber for propagating sonic waves through the exposure liquid, and an optical system provided adjacent to said optical transfer chamber for projecting light through a mask and said exposure liquid and onto a wafer.

Abstract: An immersion lithography apparatus has a reticle stage arranged to retain a reticle, a working stage arranged to retain a workpiece, and an optical system including an illumination source and an optical element opposite the workpiece for having an image pattern of the reticle projected by radiation from the illumination source. A gap is defined between the optical element and the workpiece, and a fluid-supplying device serves to supply an immersion liquid into this gap such that the supplied immersion liquid contacts both the optical element and the workpiece during an immersion lithography process. A cleaning device is incorporated for removing absorbed liquid from the optical element during a cleanup process. The cleaning device may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid.