Patents by Inventor Hidenobu Arimitsu

Hidenobu Arimitsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Moisture adsorbing and desorbing material
    Patent number: 6703432
    Abstract: An object of the present invention is to provide a water adsorbing/desorbing organic polymer material having excellent water adsorbing/desorbing performance and which is inexpensive and readily disposable by incineration or the like. In order to attain this object, water adsorbing/desorbing organic polymer materials of the present invention are characterized by having a polymer side chain containing a hydrophilic group on the backbone of an organic polymer base.
    Type: Grant
    Filed: August 7, 2002
    Date of Patent: March 9, 2004
    Assignee: Ebara Corporation
    Inventors: Kunio Fujiwara, Kazuyoshi Takeda, Hiroshi Yokota, Hidenobu Arimitsu
  • Gas measuring device and processing apparatus provided with the gas measuring device
    Patent number: 5294280
    Abstract: A gas measuring device includes a dissolving unit for dissolving gas to be measured in solvent medium, a measuring unit for measuring the amount of ions generated when the gas to be measured is ionized in the liquid medium, and a calculating unit for calculating the amount of the gas to be measured from a value measured by the measuring unit.
    Type: Grant
    Filed: June 26, 1992
    Date of Patent: March 15, 1994
    Assignees: Tokyo Electron Limited, Ebara Research Co., Ltd.
    Inventors: Tsuyoshi Wakabayashi, Takenobu Matsuo, Shuji Moriya, Hidenobu Arimitsu
  • Process for removing dissolved oxygen from water and system therefor
    Patent number: 5190627
    Abstract: Ultrapure water is formed by a process employing a simple system for safely and easily removing oxygen from water containing dissolved oxygen; which process comprises dissolving a reducing agent in water containing dissolved oxygen and irradiating the resulting water with ultraviolet rays. The ultrapure water is particularly utilized as a rinsing water in the electronics industry.
    Type: Grant
    Filed: April 24, 1992
    Date of Patent: March 2, 1993
    Assignees: Ebara Corporation, Ebara Research Co., Ltd.
    Inventors: Takayuki Saito, Hidenobu Arimitsu, Ken Nakajima, Yoko Iwase, Hiroyuki Shima
  • Gas absorber
    Patent number: 4826805
    Abstract: An absorber that is capable of efficient absorption of SiF.sub.4 and/or BCl.sub.3 present in gases that are discharged from semiconductor fabrication plants, ceramic producing plants and other plants is disclosed. The absorber contains an alkali agent, water and a superabsorbent as effective components. This absorber, when used to treat an effluent gas, attains as high reaction rate as in the conventional wet process and can be handled as easily as in the dry process.
    Type: Grant
    Filed: October 7, 1987
    Date of Patent: May 2, 1989
    Assignees: Ebara Research Co., Ltd., Ebara Corporation
    Inventors: Akira Fukunaga, Hidenobu Arimitsu, Yoshiharu Yasuhara, Toshihiko Shiota