Patents by Inventor Hidenori Ozawa

Hidenori Ozawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9355816
    Abstract: The present invention provides a non-transitory medium storing a program for correcting an irradiation position of a charged particle beam, a correction amount calculation device, a charged particle beam irradiation system, and a method for correcting an irradiation position of a charged particle beam. The medium includes instructions for causing a control unit to perform actions including replacing charging of a resist with surface charges at an interface between the resist and a work piece, and calculating a charge density distribution of the surface charges; calculating a trajectory of a charged particle based on the charge density distribution; calculating an amount of error of the irradiation position of the charged particle beam based on the trajectory and calculating an amount of correction of the irradiation position of the charged particle beam based on the error amount.
    Type: Grant
    Filed: January 22, 2014
    Date of Patent: May 31, 2016
    Assignee: DAI NIPPONI PRINTING CO., LTD.
    Inventors: Yohei Ookawa, Hidenori Ozawa
  • Publication number: 20160027611
    Abstract: The present invention provides a non-transitory medium storing a program for correcting an irradiation position of a charged particle beam, a correction amount calculation device, a charged particle beam irradiation system, and a method for correcting an irradiation position of a charged particle beam. The medium includes instructions for causing a control unit to perform actions including replacing charging of a resist with surface charges at an interface between the resist and a work piece, and calculating a charge density distribution of the surface charges; calculating a trajectory of a charged particle based on the charge density distribution; calculating an amount of error of the irradiation position of the charged particle beam based on the trajectory and calculating an amount of correction of the irradiation position of the charged particle beam based on the error amount.
    Type: Application
    Filed: January 22, 2014
    Publication date: January 28, 2016
    Inventors: Yohei Ookawa, Hidenori Ozawa
  • Patent number: 7176301
    Abstract: A promoter comprising any one selected from the group consisting of the nucleotide sequence of SEQ ID No: 7, the nucleotide sequence of SEQ ID No: 8, the nucleotide sequence of SEQ ID No: 9, the nucleotide sequence of SEQ ID No: 10, the nucleotide sequence of SEQ ID No: 11 and the nucleotide sequence of SEQ ID No: 12, which is capable of inducing the expression of a downstream gene of the promoter under the presence of nitrate.
    Type: Grant
    Filed: March 31, 2005
    Date of Patent: February 13, 2007
    Assignee: Japan Tobacco Inc.
    Inventor: Hidenori Ozawa
  • Publication number: 20060225145
    Abstract: A promoter comprising any one selected from the group consisting of the nucleotide sequence of SEQ ID No: 7, the nucleotide sequence of SEQ ID No: 8, the nucleotide sequence of SEQ ID No: 9, the nucleotide sequence of SEQ ID No: 10, the nucleotide sequence of SEQ ID No: 11 and the nucleotide sequence of SEQ ID No: 12, which is capable of inducing the expression of a downstream gene of the promoter under the presence of nitrate.
    Type: Application
    Filed: March 31, 2005
    Publication date: October 5, 2006
    Inventor: Hidenori Ozawa
  • Patent number: 5712454
    Abstract: An exhaust system in an internal combustion engine includes a flow rate regulating valve which is positioned in an intermediate portion of an exhaust gas flow passage. The flow rate regulating valve has a rotary shaft rotatably supported in a valve housing, and a rotationally biasing spring mounted between the rotary shaft and the valve housing which provides a spring force to rotationally bias the rotary shaft. In the exhaust system, an axially biasing spring is mounted separately from the rotationally biasing spring between the valve housing and the rotary shaft for biasing the rotary shaft in an axial direction. The rotary shaft is provided with an abutment surface which faces in the one axial direction, and the valve housing is provided with a limiting portion which abuts against the abutment surface to limit the axial movement of the rotary shaft.
    Type: Grant
    Filed: January 26, 1996
    Date of Patent: January 27, 1998
    Assignees: Honda Giken Kogyo Kabushiki Kaisha, Yutaka Giken Co., Ltd.
    Inventors: Hidenori Ozawa, Kazuhiro Tsuda, Isao Hirokawa, Katsunori Muramatsu, Ryoichi Matsushima