Abstract: A technology for placing spacers free from the occurrence of streaks is provided. Random numbers are generated by a computer, and made in one-by-one association with discharge positions of an object for discharging every generation, and stored in a memory unit of the computer. Coefficient values are determined for the respective discharge positions based on the stored random numbers, and individual voltage values to be required for the respective discharge positions are calculated through the multiplication of voltages set for respective nozzle holes N1 to Nn by the coefficient values. When the respective voltages corresponding to the discharge positions are applied to piezoelectric elements inside a discharge head and a discharge liquid containing the spacers are discharged through the plural nozzles N1 to Nn provided in the discharge head, the spacers are placed on the object for discharging by numbers according to the random numbers.

Abstract: A technology for placing spacers free from the occurrence of streaks is provided. Random numbers are generated by a computer, and made in one-by-one association with discharge positions of an object for discharging every generation, and stored in a memory unit of the computer. Coefficient values are determined for the respective discharge positions based on the stored random numbers, and individual voltage values to be required for the respective discharge positions are calculated through the multiplication of voltages set for respective nozzle holes N1 to Nn by the coefficient values. When the respective voltages corresponding to the discharge positions are applied to piezoelectric elements inside a discharge head and a discharge liquid containing the spacers are discharged through the plural nozzles N1 to Nn provided in the discharge head, the spacers are placed on the object for discharging by numbers according to the random numbers.

Abstract: A vacuum display device for enabling the manufacture of high quality plasma display device with high throughput. A front panel 6 constituting a plasma display device is carried into a film deposition chamber 22; and a MgO thin film is deposited in a vacuum atmosphere. The front panel 6 is then carried into an alignment chamber 11 without being exposed to the atmosphere and aligned with a rear panel 7 that has been subjected to degassing in a vacuum atmosphere. There is no absorption of gas, such as moisture; and the quality of the thin film is not degraded. After alignment, aging processing is carried out without exposure to the atmosphere, followed by gas encapsulation and hermetic sealing, which further increases throughput.

Abstract: Components of apparatus for film making and method for manufacturing the same include components made from aluminum alloy or aluminum without or with uneven surface of unenenness size of up to several mm, which are immersed in any one of sulfuric acid, phosphoric acid, oxalic acid, and chromic acid, and then washed and dried. Such components prevent the deposit of film forming materials on the components form peeling off during film making operation.

Abstract: Components of apparatus for film making and method for manufacturing the same include components made from aluminum alloy or aluminum without or with uneven surface of unevenness size of up to several mm, which are immersed in any one of sulfuric acid, phosphoric acid, oxalic acid, and chromic acid, and then washed and dried. Such components prevent the deposit of film forming materials on the components form peeling off during film making operation.

Abstract: A loading and unloading airlock apparatus for a vacuum treatment chamber which includes an airlock chamber, a transport mechanism inside the chamber to transport a substrate holder arranged to have substrates detachably mounted thereon, an exhaust port to evacuate the chamber to a vacuum, a gas inlet port to introduce a gas to bring the evacuated chamber back to atmospheric pressure, a rectifying plate provided in the chamber adjacent to and at a predetermined distance away from the substrate holder on that side of the substrate holder upon which the substrates are detachably mounted, and a gas introduction pipe having a gas ejection outlet in said chamber for introducing additional gas in a space defined by the predetermined distance to flow along the surfaces of the substrates and the substrate holder.

Abstract: An apparatus and method for controlling an electromagnet for a magnetron sputtering source controls electric currents flowing through a central coil and an inner peripheral coil of the electromagnet to flow in the same direction. Further, the direction of the electric current flowing through an outer peripheral coil is made to flow in the same direction as, and in the opposite direction to, the electric currents through the central coil and the inner peripheral coil. Therefore, the magnetic field to be generated in a space near the surface of the target moves between the central portion and the peripheral portion thereof each time the direction of the electric current flowing through the outer peripheral coil is reversed. Since the of high density plasma also moves in accordance with the magnetic field, the area of the target which is sputtered becomes wider and the efficiency of utilization of the target is improved.