Patents by Inventor Hideo Fukutani

Hideo Fukutani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4083725
    Abstract: A photosensitive composition is prepared from a mixture of a cinnamic acid photosensitive resin and a halogen-substituted benzanthrone sensitizer.
    Type: Grant
    Filed: April 19, 1976
    Date of Patent: April 11, 1978
    Assignee: Mitsubishi Chemical Industries Ltd.
    Inventors: Hideo Fukutani, Konoe Miura, Chihiro Eguchi, Yoshihiro Takahashi, Kazuo Torige
  • Patent number: 4063953
    Abstract: A photosensitive composition is prepared from a mixture of a photosensitive resin containing radicals having the formula ##STR1## wherein X and Y represent hydrogen, halogen, cyano or nitro, Ar represents an aryl radical or a substituted aryl radical, and n represents 1 or 2, and a solvent having the formula ##STR2## wherein R and R" represent a lower alkyl radical and R' represents a lower alkylene radical.
    Type: Grant
    Filed: December 3, 1975
    Date of Patent: December 20, 1977
    Assignee: Mitsubishi Chemical Industries, Ltd.
    Inventors: Hideo Fukutani, Konoe Miura, Yoshihiro Takahashi, Kazuo Torige
  • Patent number: 4042391
    Abstract: A vesicular image is prepared by contacting an original with a vesicular photograhic element, wherein the element contains a decomposing photosensitive material; and irradiating said element with light containing infrared light from the element side of said contacted image and element.
    Type: Grant
    Filed: April 24, 1975
    Date of Patent: August 16, 1977
    Assignee: Mitsubishi Chemical Industries Ltd.
    Inventors: Hideo Fukutani, Hiroshi Oba, Akane Okada, Atsuko Shimizu